US5024733A
Expired / Lapsed
US
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Palladium alloy electroplating process
Assignee: Nokia Bell Labs
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Filing: 1990-05-11
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Granted: 1991-06-18
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Expires: 2010-05-11
Abstract
Abstract An electroplating process is described for electroplating alloys of palladium and arsenic. The resulting electrodeposits are bright, ductile and remain ductile and crack-free even when the electrodeposits are quite thick. The deposits are quite hard and suitable for contact surfaces particularly in situations where wear characteristics require thick deposits. The electroplating process is also useful for making articles such as bellows by electroform procedures particularly since the electroplated material has extraordinary physical properties (good resilience, low stress and ductility) as well as good corrosion resistance.
Inventors
- 👤 Joseph A. Abys
- 👤 Heinrich K. Straschil
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-10 01:09
CPC Classifications
C; C25; C25D; C25D3/00; C25D3/02; C25D3/56; C25D3/567
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
186 words
A process of electroplating a metallic substance onto a surface, said metallic substance comprising palladium and arsenic, said process comprising the step of passing current through a cathode, an electroplating bath and an anode, said electroplating bath comprising a source of palladium and a source of arsenic and having an electrical conductivity greater than 10 -3 mho-cm and pH greater than 7, said source of palladium comprises a palladium complex ion with a complexing agent selected from the group consisting of ammonia, diaminopropane, 1,4-diamino butane, 1,6-diaminohexane, and 2-hydroxyl-1,3-diaminopropane, said source of arsenic is selected from the group consisting of As 2 O 3 , As 2 O 5 , KH 2 AsO 4 , K 2 HAsO 4 , K 3 AsO 4 , NaH 2 AsO 4 , Na 2 HAsO 4 , Na 3 AsO 4 , K 3 AsO 3 , KAsO 2 , Na 3 AsO 3 , NaAsO 2 and Na 4 As 2 O 7 , said electroplating bath having a palladium concentration of from 0.005 to 1.0 molar, and an arsenic concentration of from 0.01 molar to 0.1 molar.
Claim 2
Dependent Claim
186 words
A process of electroplating a metallic substance onto a surface, said metallic substance comprising palladium and arsenic, said process comprising the step of passing current through a cathode, an electroplating bath and an anode, said electroplating bath comprising a source of palladium and a source of arsenic and having an electrical conductivity greater than 10 -3 mho-cm and pH greater than 7, said source of palladium comprises a palladium complex ion with a complexing agent selected from the group consisting of ammonia, diaminopropane, 1,4-diamino butane, 1,6-diaminohexane, and 2-hydroxyl-1,3-diaminopropane, said source of arsenic is selected from the group consisting of As 2 O 3 , As 2 O 5 , KH 2 AsO 4 , K 2 HAsO 4 , K 3 AsO 4 , NaH 2 AsO 4 , Na 2 HAsO 4 , Na 3 AsO 4 , K 3 AsO 3 , KAsO 2 , Na 3 AsO 3 , NaAsO 2 and Na 4 As 2 O 7 , said electroplating bath having a palladium concentration of from 0.005 to 1.0 molar, and an arsenic concentration of from 0.01 molar to 0.1 molar.
Claim 3
Dependent Claim
11 words
The process of claim 1 in which said diaminopropane is 1,3-diaminopropane.
Claim 4
Dependent Claim
28 words
The process of claim 1 in which the source of arsenic is selected from the group consisting of As 2 O 3 and As 2 O 5 .
Claim 5
Dependent Claim
17 words
The process of claim 1 in which the electroplating bath further comprises a surfactant and a brightener.
Claim 6
Dependent Claim
15 words
The process of claim 1 in which the electroplating bath further comprises a phosphate buffer.
Claim 7
Dependent Claim
11 words
The process of claim 5 in which the buffer comprises phosphate.
Claim 8
Dependent Claim
21 words
The process of claim 1, in which the concentration of palladium in the electroplating bath ranges from 0.05 to 0.3 molar.
Claim 9
Dependent Claim
138 words
A process of electroplating a metallic substance on a surface, said metallic substance comprising palladium and arsenic, said process comprising the step of passing current through a cathode, an electroplating bath and an anode with cathode potential great enough to electroplate the metallic substance, said electroplating bath comprising a source of palladium and a source of arsenic and having an electrical conductivity greater than 10 -3 mho-cm and pH greater than 7, said source of palladium comprises a palladium complex ion with complexing agent selected from the group consisting of ammonia and 1,3-diaminopropane, said source of arsenic is selected from the group consisting of As 2 O 3 and As 2 O 5 , said electroplating bath having a palladium concentration of from 0.005 to 1.0 molar and an arsenic concentration of from 0.01 molar to 0.1 molar.
Claim 10
Dependent Claim
138 words
A process of electroplating a metallic substance on a surface, said metallic substance comprising palladium and arsenic, said process comprising the step of passing current through a cathode, an electroplating bath and an anode with cathode potential great enough to electroplate the metallic substance, said electroplating bath comprising a source of palladium and a source of arsenic and having an electrical conductivity greater than 10 -3 mho-cm and pH greater than 7, said source of palladium comprises a palladium complex ion with complexing agent selected from the group consisting of ammonia and 1,3-diaminopropane, said source of arsenic is selected from the group consisting of As 2 O 3 and As 2 O 5 , said electroplating bath having a palladium concentration of from 0.005 to 1.0 molar and an arsenic concentration of from 0.01 molar to 0.1 molar.
Claim 11
Dependent Claim
21 words
The process of claim 1, in which the concentration of palladium in the electroplating bath ranges from 0.05 to 0.3 molar.
Claim 12
Dependent Claim
17 words
The process of claim 1 in which the electroplating bath further comprises a surfactant and a brightener.
Claim 13
Dependent Claim
15 words
The process of claim 1 in which the electroplating bath further comprises a phosphate buffer.
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1994-06-17 | 1994-12-17 | 1995-06-18 | $2000.00 | Window Closed / Lapsed |
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