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US4066517A Expired / Lapsed US ⏱️ 0.0 years remaining

Electrodeposition of palladium

Assignee: Oxy Metal Industries Corp
•
Filing: 1976-03-11
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Granted: 1978-01-03
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Expires: 1996-03-11
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Abstract

Abstract Disclosed is a palladium electroplating bath and a method of plating therewith. The bath contains palladium as the palladosammine chloride and a phosphonic compound which is an alkylene diamine phosphonate derivative. The bath may be employed to plate palladium or its alloys. In a preferred embodiment, a pure palladium deposit may be obtained which exhibits very low porosity even after subsequent cold forming of the article on which it is deposited.

Inventors

  • 👤 Peter Stevens
  • 👤 John M. Deuber

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 22:07
CPC Classifications
C; C25; C25D; C25D3/00; C25D3/02; C25D3/50; C25D3/52; C25D3/56; C25D3/567

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 92 words
A stable aqueous electroplating bath useful for the electrodeposition of palladium or palladium base alloys comprising palladosammine chloride in an amount of 0.1 to 50 g/l palladium, sulfonic acid in an amount of about 1.0 to 100 g/l, and at least 5 g/l of a phosphonic compound of the formula: ##STR3## wherein R is an alkylene group of 2 - 6 carbon atoms, each R' is an alkylene group of 1 to 4 carbon atoms, and each M is a non-deleterious cationic moiety, said bath exhibiting a pH value of from 7.0-10.0.
Claim 2
Dependent Claim 92 words
A stable aqueous electroplating bath useful for the electrodeposition of palladium or palladium base alloys comprising palladosammine chloride in an amount of 0.1 to 50 g/l palladium, sulfonic acid in an amount of about 1.0 to 100 g/l, and at least 5 g/l of a phosphonic compound of the formula: ##STR3## wherein R is an alkylene group of 2 - 6 carbon atoms, each R' is an alkylene group of 1 to 4 carbon atoms, and each M is a non-deleterious cationic moiety, said bath exhibiting a pH value of from 7.0-10.0.
Claim 3
Dependent Claim 38 words
The bath of claim 1 wherein R is ethylene, each R' is methylene and each M is independently selected from the cation group consisting of H, ammonium, alkali metal and alkyl groups of up to 4 carbon atoms.
Claim 4
Dependent Claim 14 words
The bath of claim 1 additionally containing at least one conducting or buffering salt.
Claim 5
Dependent Claim 11 words
The bath of claim 3 containing chloride salts to improve conductivity.
Claim 6
Dependent Claim 13 words
The bath of claim 4 containing NH 4 Cl as a conductive salt.
Claim 7
Dependent Claim 11 words
The bath of claim 5 additionally containing an ammonium phosphate compound.
Claim 8
Dependent Claim 17 words
The bath of claim 1 additionally containing sulfamic acid, or an alkali metal or ammonium salt thereof.
Claim 9
Dependent Claim 9 words
The bath of claim 1 additionally containing ammonium hydroxide.
Claim 10
Dependent Claim 20 words
The bath of claim 1 additionally containing an additive selected from the alloying metals and organic or inorganic brightening agents.
Claim 11
Dependent Claim 29 words
A process for obtaining a palladium containing deposit on a conductive surface in contact with the bath of claim 1 comprising electrolyzing said bath with the surface as cathode.
Claim 12
Dependent Claim 57 words
An aqueous electroplating bath for the electrodeposition of palladium, comprising: ______________________________________ Component Concentration ______________________________________ Ethylene diamine tetra- (methylphosphonic acid) 5 g/l to solubility limit Pd(NH.sub.3).sub.2 Cl.sub.2 0.1 to 50 g/l Sulfamic acid 1 to 100 g/l Ammonium chloride 1 to 200 g/l Ammonium monohydrogen phosphate 1 to 100 g/l Ammonium hydroxide to pH 4.5 to 12. ______________________________________
Claim 13
Dependent Claim 57 words
An aqueous electroplating bath for the electrodeposition of palladium, comprising: ______________________________________ Component Concentration ______________________________________ Ethylene diamine tetra- (methylphosphonic acid) 5 g/l to solubility limit Pd(NH.sub.3).sub.2 Cl.sub.2 0.1 to 50 g/l Sulfamic acid 1 to 100 g/l Ammonium chloride 1 to 200 g/l Ammonium monohydrogen phosphate 1 to 100 g/l Ammonium hydroxide to pH 4.5 to 12. ______________________________________
Claim 14
Dependent Claim 48 words
The bath of claim 11 comprising: ______________________________________ Component Concentration ______________________________________ Ethylene diamine tetra- (methylphosphonic acid) 45 g/l Pd(NH.sub.3).sub.2 Cl.sub.2 1 to 10 g/l Sulfamic acid 40 g/l Ammonium chloride 50 to 150 g/l Ammonium monohydrogen phosphate 25 to 75 g/l Ammonium hydroxide to pH 6.5 to 10. ______________________________________

References Cited (Backward Citations)

US3933602A Cited
US3925170A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1981-01-02 1981-07-04 1982-01-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1985-01-02 1985-07-04 1986-01-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1989-01-02 1989-07-04 1990-01-03 $7700.00 Window Closed / Lapsed

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