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US5021360A
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Method of farbicating highly lattice mismatched quantum well structures
Assignee: Verizon Laboratories Inc
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Filing: 1989-09-25
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Granted: 1991-06-04
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Expires: 2009-09-25
Abstract
Abstract A method of fabricating a semiconductor heterostructure includes the growth of a quantum well active region that is highly lattice-mismatched relative to a substrate. A buffer layer having a thickness above a critical value is grown on the substrate whereby the stress due to a lattice constant mismatch between the buffer layer and substrate is relieved through the formation of misfit dislocations. A strained superlattice structure is grown on the buffer layer in order to terminate any upwardly-propagating dislocations. An unstrained barrier layer is subsequently grown on the superlattice structure. The fabrication method concludes with the growth of a quantum well structure on the unstrained layer wherein a lattice constant mismatch between the quantum well structure and the unstrained barrier layer is smaller than the lattice constant mismatch between the quantum well structure and the substrate. As a result, only a fraction of the stress due to the large lattice mismatch between the quantum well structure and the substrate is accommodated by coherent strain in the quantum well structure, while the remainder of the stress is relieved through the formation of misfit dislocations spatially separated from the quantum well structure.
Inventors
- 👤 Paul Melman
- 👤 Boris S. Elman
- 👤 Emil S. Koteles
- 👤 Chirravuri Jagannath
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 09:15
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/20; H10P14/29; H10P14/2901; H10P14/2907; H10P14/2911; B; B82; B82Y; B82Y20/00; H01; H01S; H01S5/00; H01S5/30; H01S5/34; H10P14/32; H10P14/3202; H10P14/3214; H10P14/3221; H10P14/3242; H10P14/3244; H10P14/3251; H10P14/3252; H10P14/34; H10P14/3402; H10P14/3414; H10P14/3421; H01S5/3403; H01S5/3406; Y; Y10; Y10S; Y10S148/00; Y10S148/06; Y10S148/097; Y10S148/16; Y10S438/00; Y10S438/936; Y10S438/938
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
179 words
A method of fabricating a semiconductor heterostructure, comprising the steps of: providing a substrate; growing a buffer layer of semiconducting material on said substrate wherein said layer is lattice-mismatched relative to said substrate and has a thickness greater than a critical thickness; growing a strained superlattice structure on said buffer layer wherein said provided substrate, said buffer layer, and said superlattice structure together form an effective substrate; growing an unstrained barrier layer on said superlattice structure; and forming on said unstrained barrier layer a quantum well structure serving as an active region wherein a lattice constant mismatch between said quantum well structure and said barrier layer is smaller than the lattice constant mismatch between said quantum well structure and said provided substrate; whereby only a fraction of the stress due to the large lattice mismatch between said quantum well structure and said provided substrate is accommodated by coherent strain in said quantum well structure, while the remainder of said stress is relieved in said effective substrate through the formation of misfit dislocations spatially separated from said quantum well structure.
Claim 2
Independent Claim
179 words
A method of fabricating a semiconductor heterostructure, comprising the steps of: providing a substrate; growing a buffer layer of semiconducting material on said substrate wherein said layer is lattice-mismatched relative to said substrate and has a thickness greater than a critical thickness; growing a strained superlattice structure on said buffer layer wherein said provided substrate, said buffer layer, and said superlattice structure together form an effective substrate; growing an unstrained barrier layer on said superlattice structure; and forming on said unstrained barrier layer a quantum well structure serving as an active region wherein a lattice constant mismatch between said quantum well structure and said barrier layer is smaller than the lattice constant mismatch between said quantum well structure and said provided substrate; whereby only a fraction of the stress due to the large lattice mismatch between said quantum well structure and said provided substrate is accommodated by coherent strain in said quantum well structure, while the remainder of said stress is relieved in said effective substrate through the formation of misfit dislocations spatially separated from said quantum well structure.
Claim 3
Dependent Claim
45 words
The method of growing a semiconductor heterostructure as recited in claim 1 wherein the step of growing an unstrained barrier layer includes the steps of: growing a layer of uniform composition; and growing a superlattice structure having a graded composition on said uniform compositional layer.
Claim 4
Dependent Claim
38 words
The method of growing a semiconductor heterostructure as recited in claim 1 further includes the steps of: growing an upper barrier layer on said quantum well structure; and growing an upper superlattice structure on said upper barrier layer.
Claim 5
Dependent Claim
26 words
The method of growing a semiconductor heterostructure as recited in claim 3 further includes the step of: growing a cap layer on said upper superlattice structure.
Claim 6
Dependent Claim
19 words
The method of growing a semiconductor heterostructure as recited in claim 1 wherein: said superlattice structure is strain symmetrized.
Claim 7
Independent Claim
219 words
A method of fabricating a bandgap tunable semiconductor heterostructure, comprising the steps of: providing a substrate; growing a buffer layer of semiconducting material on said substrate wherein said buffer layer is lattice-mismatched relative to said substrate and has a thickness greater than a critical thickness; growing a strained superlattice structure on said buffer layer wherein said provided substrate, said buffer layer, and said superlattice structure together form an effective substrate; growing an unstrained barrier layer on said superlattice structure; forming on said unstrained barrier layer a quantum well structure serving as an active region wherein said quantum well structure has an alloy composition, and wherein a lattice constant mismatch between said quantum well structure and said barrier layer is smaller than the lattice constant mismatch between said quantum well structure and said provided substrate so that only a fraction of the stress due to the large mismatch between said quantum well structure and said provided substrate is accommodated by coherent strain in said quantum well structure, while the remainder of said stress is relieved in said effective substrate through the formation of misfit dislocations spatially separated from said quantum well structure; and prior to the step of forming said quantum well structure, selecting an appropriate alloy composition for said quantum well structure which corresponds to a desired bandgap value.
Claim 8
Independent Claim
219 words
A method of fabricating a bandgap tunable semiconductor heterostructure, comprising the steps of: providing a substrate; growing a buffer layer of semiconducting material on said substrate wherein said buffer layer is lattice-mismatched relative to said substrate and has a thickness greater than a critical thickness; growing a strained superlattice structure on said buffer layer wherein said provided substrate, said buffer layer, and said superlattice structure together form an effective substrate; growing an unstrained barrier layer on said superlattice structure; forming on said unstrained barrier layer a quantum well structure serving as an active region wherein said quantum well structure has an alloy composition, and wherein a lattice constant mismatch between said quantum well structure and said barrier layer is smaller than the lattice constant mismatch between said quantum well structure and said provided substrate so that only a fraction of the stress due to the large mismatch between said quantum well structure and said provided substrate is accommodated by coherent strain in said quantum well structure, while the remainder of said stress is relieved in said effective substrate through the formation of misfit dislocations spatially separated from said quantum well structure; and prior to the step of forming said quantum well structure, selecting an appropriate alloy composition for said quantum well structure which corresponds to a desired bandgap value.
References Cited (Backward Citations)
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