Patent US5021114A successfully refreshed from Google Patents.
US5021114A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for treating material by using plasma
Assignee: Hitachi Ltd
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Filing: 1988-07-19
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Granted: 1991-06-04
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Expires: 2008-07-19
Abstract
Abstract A sputter etching apparatus including a vacuum chamber provided with a gas supply system and an evacuator, a sputter etching electrode disposed within the vacuum chamber on which a substrate is disposed, a plasma generator for generating plasma by applying microwave energy and disposed in opposition to the sputter etching electrode, a voltage applying stud provided in association with the sputter etching electrode for causing ions in the plasma to impact against the substrate, a first power supply source provided in association with the plasma generator for generating the plasma, and a second power supply source provided independent of the first power supply source for supplying the voltage for causing the ions to impact against the substrate. A magnetic field generating magnet or coil assembly can be incorporated in the apparatus for generating a magnetic field in such a manner in which the plasma produced within a space defined between the substrate and the microwave inlet window is peripherally surrounded by the magnetic lines of forces. Further disclosed in a plasma treatment apparatus which includes an activating chamber equipped with plasma generator and a first raw gas supplying system, a reaction chamber spatially coupled to the activating chamber and containing an electrode for supporting thereon a substrate to be treated, an evacuator for evacuating the activating chamber and the reaction chamber down to a predetermined pressure. The activating chamber is directly connected to the reaction chamber for shortening the distance between the activating chamber and the substrate to be treated. A second raw gas supplying system for supplying a raw gas to the reaction chamber is provided in the connecting portion between the activating chamber and the reacting chamber.
Inventors
- 👤 Hiroshi Saito
- 👤 Yasumichi Suzuki
- 👤 Shunji Sasabe
- 👤 Kazuhiro Nakajima
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 19:41
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; H01J37/32211; H01J37/32247; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/517; H01J37/32431; H01J37/3266
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
198 words
A plasma treatment apparatus comprising: a microwave generating source generating a microwave; a waveguide feeding the microwave; a cavity resonator resonating the microwave fed along the waveguide so that an electric field of the microwave is intensified; a gas supply source; an evacuator; a vacuum chamber connected to said gas supply source and said evacuator, said vacuum chamber providing a plasma treatment electrode supporting a substrate thereon; a microwave injection window supplying a microwave energy resonated in said cavity resonator so as to generate plasma by the microwave energy, wherein the plasma is disposed against the substrate in the vacuum chamber, the microwave injection window being interposed between said cavity resonator and said vacuum chamber so that the microwave injection window is provided in opposition to said substrate; a first voltage supply provided in association with said plasma treatment electrode causing ions in said plasma to impact against said substrate; and magnetic field generator generating a magnetic field in such a manner that said plasma produced within a space defined between said substrate and said microwave injection window is peripherally surrounded by a magnetic line of force so as to prevent said plasma from diffusing radially and outwardly.
Claim 2
Dependent Claim
198 words
A plasma treatment apparatus comprising: a microwave generating source generating a microwave; a waveguide feeding the microwave; a cavity resonator resonating the microwave fed along the waveguide so that an electric field of the microwave is intensified; a gas supply source; an evacuator; a vacuum chamber connected to said gas supply source and said evacuator, said vacuum chamber providing a plasma treatment electrode supporting a substrate thereon; a microwave injection window supplying a microwave energy resonated in said cavity resonator so as to generate plasma by the microwave energy, wherein the plasma is disposed against the substrate in the vacuum chamber, the microwave injection window being interposed between said cavity resonator and said vacuum chamber so that the microwave injection window is provided in opposition to said substrate; a first voltage supply provided in association with said plasma treatment electrode causing ions in said plasma to impact against said substrate; and magnetic field generator generating a magnetic field in such a manner that said plasma produced within a space defined between said substrate and said microwave injection window is peripherally surrounded by a magnetic line of force so as to prevent said plasma from diffusing radially and outwardly.
Claim 3
Dependent Claim
29 words
A plasma treatment apparatus according to claim 1 wherein said first voltage supply comprises a high-frequency power source for applying a high-frequency electric power to said plasma treatment electrode.
Claim 4
Dependent Claim
31 words
A plasma treating apparatus according to claim 1 wherein said magnetic field generator is provided adjacently along a circumference of said microwave injection window on a side facing said vacuum chamber.
Claim 5
Dependent Claim
25 words
A plasma treatment apparatus according to claim 3 wherein said magnetic field generator is arrayed in a ring-like form with divisions in the circumferential direction.
Claim 6
Dependent Claim
27 words
A plasma treatment apparatus according to claim 1 wherein said cavity resonator is further provided with matching means for serving as the cavity resonator for said microwave.
Claim 7
Dependent Claim
19 words
A plasma treatment apparatus according to claim 1 wherein said magnetic field generator is formed by a magnet ring.
Claim 8
Dependent Claim
19 words
A plasma treatment apparatus according to claim 1 wherein said magnetic field generator is formed by a magnet coil.
Claim 9
Dependent Claim
18 words
A plasma treatment apparatus according to claim 1 wherein said cavity resonator is formed in a coaxial structure.
Claim 10
Dependent Claim
36 words
A plasma treatment apparatus according to claim 1 wherein said magnetic field generator is formed by at least a pair of magnetic field generating devices so as to form a magnetic field having a cusp-like profile.
Claim 11
Dependent Claim
46 words
A plasma treatment apparatus according to claim 9 wherein said at least a pair of magnetic field generating devices are provided adjacently on a circumference of said microwave injection window on a side facing said vacuum chamber and on a circumference of said plasma treatment electrode.
Claim 12
Dependent Claim
22 words
A plasma treatment apparatus according to claim 1 wherein said cavity resonator is so dimensioned that said microwave exhibits an axis-symmetrical mode.
Claim 13
Dependent Claim
47 words
A plasma treatment apparatus according to claim 1 wherein said microwave injection window is formed of an electrically insulating material less susceptible to absorption of the microwave to serve as a partition wall to define said vacuum chamber and to transmit the microwave into said vacuum chamber.
Claim 14
Dependent Claim
23 words
A plasma treatment apparatus according to claim 12 wherein said electrically insulating material is selected from a group consisting of quartz and ceramics.
Claim 15
Dependent Claim
170 words
A plasma treatment apparatus comprising: a gas supply; an evacuator; a vacuum chamber connected to said gas supply and said evacuator; a plasma treatment electrode disposed within said vacuum chamber for supporting thereon a substrate, plasma generator generating plasma by applying microwave energy, said plasma generator being disposed on said vacuum chamber in opposition to said substrate with a microwave injection window interposed between said plasma generator and said vacuum chamber, said plasma generator being provided in association with a first power supply; a second power supply provided in association with said plasma treatment electrode causing ions in said plasma to impact against said substrate, the second power supply being provided independently of said first power supply; and a magnetic field generator generating a magnetic field in such a manner that said plasma produced by said plasma generator within a space defined between said substrate and said microwave injection window is peripherally surrounded by a magnetic line of force so as to prevent said plasma from diffusing radially and outwardly.
Claim 16
Dependent Claim
170 words
A plasma treatment apparatus comprising: a gas supply; an evacuator; a vacuum chamber connected to said gas supply and said evacuator; a plasma treatment electrode disposed within said vacuum chamber for supporting thereon a substrate, plasma generator generating plasma by applying microwave energy, said plasma generator being disposed on said vacuum chamber in opposition to said substrate with a microwave injection window interposed between said plasma generator and said vacuum chamber, said plasma generator being provided in association with a first power supply; a second power supply provided in association with said plasma treatment electrode causing ions in said plasma to impact against said substrate, the second power supply being provided independently of said first power supply; and a magnetic field generator generating a magnetic field in such a manner that said plasma produced by said plasma generator within a space defined between said substrate and said microwave injection window is peripherally surrounded by a magnetic line of force so as to prevent said plasma from diffusing radially and outwardly.
Claim 17
Dependent Claim
28 words
A plasma treatment apparatus according to claim 14 wherein said second power supply comprises a high-frequency power source applying a high-frequency electric power to said plasma treatment electrode.
Claim 18
Dependent Claim
30 words
A plasma treatment apparatus according to claim 14 wherein said plasma generator comprises a microwave generating source as said first power supply means, a cavity resonator and a microwave guide.
Claim 19
Dependent Claim
31 words
A plasma treatment apparatus according to claim 16 wherein said cavity resonator is provided with matching means for allowing said cavity resonator to serve as the cavity resonator for said microwave.
Claim 20
Dependent Claim
18 words
A plasma treatment apparatus according to claim 16 wherein said cavity resonator is formed in a coaxial structure.
Claim 21
Dependent Claim
22 words
A plasma treatment apparatus according to claim 16 wherein said cavity resonator is so dimensioned that said microwave exhibits an axis-symmetrical mode.
Claim 22
Dependent Claim
47 words
A plasma treatment apparatus according to claim 14, wherein said microwave injecting window is formed of an electrically insulating material less susceptible to absorption of the microwave to serve as a partition wall to define said vacuum chamber and to transmit the microwave into said vacuum chamber.
References Cited (Backward Citations)
DE2837594A1
Cited
JPS5726441A
Cited
US4609428A
Cited
US4745337A
Cited
US4776918A
Cited
US4816113A
Cited
US4926791A
Cited
US4819118A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1994-06-03 | 1994-12-03 | 1995-06-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-06-03 | 1998-12-03 | 1999-06-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-06-03 | 2002-12-03 | 2003-06-04 | $7700.00 | Window Closed / Lapsed |