US4926791A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Microwave plasma apparatus employing helmholtz coils and ioffe bars
Assignee: Semiconductor Energy Laboratory Co Ltd
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Filing: 1988-04-26
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Granted: 1990-05-22
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Expires: 2008-04-26
Abstract
Abstract A plasma processing apparatus and method is equipped with a vacuum chamber, helmholtz coils, a microwave generator and gas feeding systems. An auxiliary magnet is further provided in order to strengthen the magnetic field in the vacuum chamber to produce centrifugal drifting force which confine the plasma gas about the center position of the vacuum chamber.
Inventors
- 👤 Naoki Hirose
- 👤 Takashi Inujima
- 👤 Toru Takayama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 10:31
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/511; H01J37/32431; H01J37/32623; H01J37/3266; H01J37/32678; Y; Y10; Y10S; Y10S427/00; Y10S427/103; Y10S427/104
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
87 words
A plasma deposition apparatus comprising: a vacuum chamber in which a deposition space is defined; a substrate holder provided in said deposition space for supporting a substrate to be coated; Helmholtz coils within which said deposition space is located; Ioffe bars arranged in parallel with the axial direction of said Helmholtz coils; a vacuum pump for evacuating said vacuum chamber; a gas feeding means for inputting a reactive gas to said deposition space; and an energy supplying means for initiating the deposition reaction of said reactive gas.
Claim 2
Dependent Claim
87 words
A plasma deposition apparatus comprising: a vacuum chamber in which a deposition space is defined; a substrate holder provided in said deposition space for supporting a substrate to be coated; Helmholtz coils within which said deposition space is located; Ioffe bars arranged in parallel with the axial direction of said Helmholtz coils; a vacuum pump for evacuating said vacuum chamber; a gas feeding means for inputting a reactive gas to said deposition space; and an energy supplying means for initiating the deposition reaction of said reactive gas.
Claim 3
Dependent Claim
19 words
The apparatus of claim 1 where said Ioffe bars comprise a plurality of coils arranged around said deposition space.
Claim 4
Dependent Claim
43 words
The apparatus of claim 1 wherein said supplying means comprising a microwave generator for emitting a microwave into said vacuum chmaber and said Helmholtz coils inducing a magnetic field substantially parallel with the propagating direction of the magnetic field emitted from said generator.
Claim 5
Dependent Claim
29 words
The apparatus of claim 1 wherein said Ioffe bars are a plurality of permanent magnet rods, each having its magnetic moment along the circumferential direction of said helmholtz coils.
Claim 6
Dependent Claim
19 words
The apparatus of claim 4 wherein said the senses of the magnetic moments of the Ioffe bars are alternating.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-05-21 | 1993-11-20 | 1994-05-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-05-21 | 1997-11-20 | 1998-05-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-05-21 | 2001-11-20 | 2002-05-22 | $7700.00 | Window Closed / Lapsed |