US5019485A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process of using an electrically conductive layer-providing composition for formation of resist patterns
Assignee: Fujitsu Ltd
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Filing: 1989-10-12
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Granted: 1991-05-28
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Expires: 2009-10-12
Abstract
Abstract Electrically conductive layer-providing compositions comprising a conducting or semiconducting polymer and/or a non-conducting precursor thereof and a photo-acid generator having a sensitivity to an ultraviolet radiation having a wavelength of 300 nm or less. The electrically conductive layer, when an electron beam resist layer adjacent thereto is exposed to a pattern of the electron beam, can effectively prevent an accumulation of an electrical charge on the resist layer and accordingly a misalignment of the resist pattern. In addition, the compositions and electrically conductive layer resulting therefrom can be stably stored if not exposed to ultraviolet radiation. Pattern formation processes using the electrically conductive layer-providing compositions are also provided.
Inventors
- 👤 Yuko Nakamura
- 👤 Satoshi Takechi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 05:09
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/0045; G03F7/09; G03F7/093; H; H10; H10P; H10P50/00; H10P50/71
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
175 words
A process for the formation of resist patterns in an electron beam lithographic process, comprising the steps of: forming an electrically conductive layer, from a composition comprising a conducting or semiconducting polymer having a good solubility in solvents and/or a non-conducting precursor thereof and a photo-acid generator which, upon exposure to an ultraviolet radiation having a wavelength of 300 nm or less, release a proton acid and cause a proton doping to the polymer to thereby increase an electrical conductivity of the polymer to a level sufficient to cause a discharge an accumulated electrical charge in the electrically conductive layer and/or one or more layers adjacent thereto in the electron beam lithographic process, in the electron beam lithographic process, in a selected layer position of an electron beam resist structure, exposing the electrically conductive layer to the ultraviolet radiation to cause an increase of the conductivity of the polymer thereof, and pattern-wise exposing an electron beam-sensitive resist layer to an electron beam, in the presence of the electrically conductive layer adjacent to the resist layer.
Claim 2
Dependent Claim
175 words
A process for the formation of resist patterns in an electron beam lithographic process, comprising the steps of: forming an electrically conductive layer, from a composition comprising a conducting or semiconducting polymer having a good solubility in solvents and/or a non-conducting precursor thereof and a photo-acid generator which, upon exposure to an ultraviolet radiation having a wavelength of 300 nm or less, release a proton acid and cause a proton doping to the polymer to thereby increase an electrical conductivity of the polymer to a level sufficient to cause a discharge an accumulated electrical charge in the electrically conductive layer and/or one or more layers adjacent thereto in the electron beam lithographic process, in the electron beam lithographic process, in a selected layer position of an electron beam resist structure, exposing the electrically conductive layer to the ultraviolet radiation to cause an increase of the conductivity of the polymer thereof, and pattern-wise exposing an electron beam-sensitive resist layer to an electron beam, in the presence of the electrically conductive layer adjacent to the resist layer.
Claim 3
Dependent Claim
29 words
A process according to claim 1, in which the solvent-soluble polymer is a conjugated polymer selected from the group consisting of substituted acetylene polymers, acetylene copolymers and acrylonitrile polymers.
Claim 4
Dependent Claim
109 words
A process according to claim 1, in which a precursor of the solvent-soluble polymer is of the formula: ##STR12## in which R 1 and R 2 may be the same or different and each represents a lower alkyl group which is unsubstituted or substituted by one or more halogen atoms, or R 1 and R 2 , taken together, represent atoms necessary to complete an aromatic ring, R 3 , R 4 and R 5 may be the same or different and each represents a lower alkyl group, X represents a halogen atom, and n denotes a polymerization degree necessary to obtain a molecular weight of less than 100,000.
Claim 5
Dependent Claim
51 words
A process according to claim 1, in which the photo-acid generator is a triarylsulfonium salt of the formula: ##STR13## in which Ar may be the same or different and represents a substituted or unsubstituted aromatic group, and Y represents BF 4 , SbF 6 , PF 6 or AsF 6 .
Claim 6
Dependent Claim
30 words
A process according to claim 1, in which the photo-acid generator is a diaryliodonium slat of the formula: Ar--I.sup.+ --Ar Y.sup.- in which Ar and Y are as defined above.
Claim 7
Dependent Claim
23 words
A process according to claim 1 in which the photo-acid generator is used in an amount of 0.05 to 2.0 moles per liter.
Claim 8
Dependent Claim
25 words
A process according to claim 1, in which the electrical conductive layer is provided by coating a solution of the composition on an under layer.
Claim 9
Dependent Claim
38 words
A process according to claim 1, in which the electrical conductive layer is provided by coating a solution of the photo-acid generator on a coating of the solvent-soluble polymer and/or precursor thereof previously formed on an underlying layer.
Claim 10
Dependent Claim
27 words
A process according to claim 1, in which the electrically conductive layer is formed as an overcoat over an electron beam resist of a single layer structure.
Claim 11
Dependent Claim
70 words
A process according to claim 9, which comprises the steps of: forming a layer of the electron beam resist on an underlying layer, further forming the electrically conductive layer over the electron beam resist layer, exposing the electrically conductive layer to the ultraviolet radiation, pattern-wise exposing the electron beam resist layer through the electrically conductive layer to the electron beam, and developing the exposed resist layer with an developing solution.
Claim 12
Dependent Claim
28 words
A process according to claim 1, in which the electrically conductive layer is formed as a lower resist layer in an electron beam resist of a two-layered structure.
Claim 13
Dependent Claim
103 words
A process according to claim 11, which comprises the steps of: forming the electrically conductive layer, also as a lower resist layer, on an underlying layer, exposing the electrically conductive layer to the ultraviolet radiation, further forming a layer of the electron beam resist, as an upper resist layer, over the electrically conductive layer, pattern-wise exposing the electron beam resist layer to the electron beam, developing the exposed resist layer with a developing solution, and dry etching the electrically conductive layer through the developed resist layer as a mask to thereby transfer a pattern of the resist layer to the electrically conductive layer.
Claim 14
Dependent Claim
15 words
A process according to claim 1, which is used in the production of semiconductor devices.
Claim 15
Dependent Claim
29 words
A process according to claim 12, in which an underlying layer is etched through the patterned resist layer as a mask to form a part of the semiconductor devices.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-05-27 | 1994-11-26 | 1995-05-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-05-27 | 1998-11-26 | 1999-05-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-05-27 | 2002-11-26 | 2003-05-28 | $7700.00 | Window Closed / Lapsed |