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US5017985A Expired / Lapsed US ⏱️ 0.0 years remaining

Input protection arrangement for VLSI integrated circuit devices

Assignee: Hewlett Packard Development Co LP
•
Filing: 1989-11-17
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Granted: 1991-05-21
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Expires: 2009-11-17
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Abstract

Abstract An input protection arrangement for diverting current from high voltages due to, for example electrostatic discharges into a bonding pad of an integrated circuit chip. The chip has a bonding pad connected to a conducting path and to a source or drain region of an insulated gate field effect transistor, the other region being connected to a power bus on the chip. The conducting path runs between the source and drain regions and operates as the gate terminal of the transistor. The conducting path is insulated from the surface of the chip by a field oxide insulating layer of a substantially uniform thickness to prevent rupture of the oxide between the gate and the source and drain regions in the event of high-voltages. The source and drain regions include regions of conventional doping levels having depths corresponding to the depths of the other corresponding regions on the chip, surrounded by large wells of lower doping levels. The input pad is separated from the chip substrate by an insulating oxide layer and by a doped well of the same conductivity type as the source and drain regions of the transistor to reduce the input capacitance and prevent punch through from the pad to the substrate.

Inventors

  • 👤 Chong M. Lin

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 06:31
CPC Classifications
H; H10; H10W; H10W72/00; H10D; H10D89/00; H10D89/60; H10D89/601; H10D89/811; H10W72/90

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 217 words
An input protection arrangement for an integrated circuit device on a semiconductor substrate of a first conductivity type having a bonding pad for forming an external electrical connection, said bonding pad being supported by an insulating layer and said insulating layer being supported by a doped region comprising a relatively deep well of a second conductivity type, said bonding pad being connected to a conducting path on said substrate for electrically connecting said pad to internal circuitry on said integrated circuit device, said integrated circuit device further including a reference voltage path, said input protection arrangement comprising two regions of the second conductivity type on opposing sides of at least a portion of said conducting path, said two regions and the area therebetween being covered with a layer of insulating material having a substantially uniform thickness corresponding to the thickness of field oxide, apertures in said layer of insulating material for connecting one of said two regions to said pad and means for connecting the other region to said reference voltage path, whereby said two regions define source and drain regions and the conducting path defines the gate terminal of an insulated gate field effect transistor which conducts input current associated with voltages in excess of a selected level between said pad and said reference voltage path.
Claim 2
Dependent Claim 217 words
An input protection arrangement for an integrated circuit device on a semiconductor substrate of a first conductivity type having a bonding pad for forming an external electrical connection, said bonding pad being supported by an insulating layer and said insulating layer being supported by a doped region comprising a relatively deep well of a second conductivity type, said bonding pad being connected to a conducting path on said substrate for electrically connecting said pad to internal circuitry on said integrated circuit device, said integrated circuit device further including a reference voltage path, said input protection arrangement comprising two regions of the second conductivity type on opposing sides of at least a portion of said conducting path, said two regions and the area therebetween being covered with a layer of insulating material having a substantially uniform thickness corresponding to the thickness of field oxide, apertures in said layer of insulating material for connecting one of said two regions to said pad and means for connecting the other region to said reference voltage path, whereby said two regions define source and drain regions and the conducting path defines the gate terminal of an insulated gate field effect transistor which conducts input current associated with voltages in excess of a selected level between said pad and said reference voltage path.
Claim 3
Dependent Claim 39 words
An input protection arrangement as defined in claim 1 wherein each of said two regions comprises a shallow portion of enhanced second conductivity type separated from said substrate by a relatively deep well portion of said second conductivity type.
Claim 4
Dependent Claim 15 words
An input protection arrangement as defined in claim 1 wherein said conducting path is polysilicon.
Claim 5
Dependent Claim 15 words
An input protection arrangement as defined in claim 1 wherein said conducting path is metal.
Claim 6
Dependent Claim 65 words
An input protection arrangement as defined in claim 1 wherein said bonding pad comprises a metal layer situated adjacent to the region connected thereto, said metal layer extending to said adjacent region and connecting thereto to provide an electrical path between said adjacent region and said conducting path to thereby interconnect said adjacent region and said gate terminal of said insulated gate field effect transistor.
Claim 7
Dependent Claim 28 words
An input protection arrangement as defined in claim 2 wherein said conducting path covers at least a portion of the deep well portions without covering the shallow portions.

References Cited (Backward Citations)

US3400310A Cited
US3395290A Cited
JPS54136278A Cited
JPS54137286A Cited
JPS5586159A Cited
JPS5667962A Cited
US4400711A Cited
GB2113468A Cited
US4730208A Cited
EP0106417A2 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-05-20 1994-11-19 1995-05-21 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-05-20 1998-11-19 1999-05-21 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-05-20 2002-11-19 2003-05-21 $7700.00 Window Closed / Lapsed

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