US5002858A
Expired / Lapsed
US
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Process for the formation of an image
Assignee: Huntsman Advanced Materials Americas LLC
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Filing: 1989-11-07
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Granted: 1991-03-26
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Expires: 2009-11-07
Abstract
Abstract A process for the formation of an image comprises (i) electrodepositing on a conductive surface a layer of a quinone diazide positive photoresist, (ii) subjecting the layer to radiation in a predetermined pattern, (iii) heating the layer such that areas thereof exposed in stage (ii) are rendered insoluble in an aqueous base developer, (iv) subjecting the layer to radiation such that the areas not exposed in stage (ii) are rendered more soluble in an aqueous base developer than the areas rendered insoluble in stage (iii) and (v) removing the areas not exposed in stage (ii) by treatment with an aqueous base developer. The process is useful in the production of printing plates and printed circuits.
Inventors
- 👤 Christopher G. Demmer
- 👤 Edward Irving
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 03:54
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/2022; G03F7/16; G03F7/164; H; H05; H05K; H05K3/00; H05K3/02; H05K3/06; H05K3/061; H05K3/064; Y; Y10; Y10S; Y10S430/00; Y10S430/136
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
103 words
A process for the formation of an image which comprises (i) electrodepositing on a conductive surface a layer of a 1,2 naphthoquinone-2-diazide-5-sulphonyl ester positive photoresist, (ii) subjecting the layer to radiation in a predetermined pattern, (iii) heating the layer such that areas thereof exposed in stage (ii) are rendered insoluble in an aqueous base developer, (iv) subjecting the layer to radiation such that areas not exposed in stage (ii) are rendered more soluble in an aqueous base developer than the areas rendered insoluble in stage (iii) and (v) removing the areas not exposed in stage (ii) by treatment with an aqueous base developer.
Claim 2
Dependent Claim
103 words
A process for the formation of an image which comprises (i) electrodepositing on a conductive surface a layer of a 1,2 naphthoquinone-2-diazide-5-sulphonyl ester positive photoresist, (ii) subjecting the layer to radiation in a predetermined pattern, (iii) heating the layer such that areas thereof exposed in stage (ii) are rendered insoluble in an aqueous base developer, (iv) subjecting the layer to radiation such that areas not exposed in stage (ii) are rendered more soluble in an aqueous base developer than the areas rendered insoluble in stage (iii) and (v) removing the areas not exposed in stage (ii) by treatment with an aqueous base developer.
Claim 3
Dependent Claim
69 words
A process according to claim 1, in which the photoresist layer is formed by electrodeposition from a solution or dispersion in an aqueous medium of (A) a film-forming electrodepositable resin having a photosensitive 1,2-naphthoquinone-2-diazide-5-sulphonyl ester moiety; or a mixture of (B) a photosensitive 1,2-naphthoquinone-2-diazide-5-sulphonyl ester compound and (C) a film-forming electrodepositable resin; or a mixture of (A) with (B) or (C); or a mixture of (A), (B) and (C).
Claim 4
Dependent Claim
18 words
A process according to claim 2, in which resin (A) or resin (C) has a cationic amino group.
Claim 5
Dependent Claim
39 words
A process according to claim 3, in which (A) is an of a film-forming phenolic hydroxyl group-containing resin, said ester having at least one amino group which is present in at least partially ionized form in the aqueous medium.
Claim 6
Dependent Claim
25 words
A process according to claim 4, in which the phenolic hydroxyl group-containing resin is a novolak resin or a polymer of an ethylenically unsaturated phenol.
Claim 7
Dependent Claim
174 words
A process according to claim 5, in which the amino group is present in a group of formula --CH(R 1 )--N(R 3 )--R 2 --X attached to an aromatic ring in (A), where R 1 denotes a hydrogen atom or an alkyl, aryl or carboxylic acid group, R 2 denotes a divalent aliphatic, aromatic or araliphatic group, R 3 denotes a hydrogen atom, an alkyl group or an alkyl group substituted by a carboxyl or esterified carboxyl group or by a hydroxyl or etherified hydroxyl group, or R 2 and R 3 together form an alkylene chain of 2 to 5 carbon atoms or said alkylene chain containing an additional oxygen or nitrogen atom in the chain, X denotes a hydrogen atom, a carboxyl group, a hydroxyl group or an amino group of formula --N (R 4 )R 5 , and R 4 and R 5 , which are the same or different, each denote a hydrogen atom, an alkyl, aryl, aralkyl or alkenyl group or a hydroxy-substituted alkyl, aryl, aralkyl or alkenyl group.
Claim 8
Dependent Claim
150 words
A process according to claim 6, in which R 1 denotes a hydrogen atom or a methyl, ethyl, phenyl or carboxyl group, R 2 denotes an alkylene group of 1 to 6 carbon atoms, or said alkylene group substituted by a carboxyl group, or a phenylene group, R 3 denotes a hydrogen atom or an alkyl group of 1 to 6 carbon atoms, or said alkyl group substituted by a carboxyl or hydroxyl group, or R 2 and R 3 together form an alkylene chain of 4 carbon atoms containing an oxygen atom or an additional nitrogen atom in the chain, or an alkylene chain of 5 carbon atoms, X denotes a hydrogen atom, a carboxyl or hydroxyl group or an amino group of formula --N(R 4 )R 5 where R 4 and R 5 each denote a hydrogen atom or an alkyl group of 1 to 6 carbon atoms.
Claim 9
Dependent Claim
36 words
A process according to claim 5, in which the phenolic hydroxyl group-containing resin is a novolak resin derived from formaldehyde and an alkyl substituted phenol or a mixture thereof with phenol; or a polymer of p-vinylphenol.
Claim 10
Dependent Claim
59 words
A process according to claim 3, in which resin (C) has an amino group present in the aqueous medium in at least partially ionized form and is a reaction product of a novolak resin, an aldehyde and a primary or secondary amine or an aminocarboxylic acid; or a polymer of an acrylate or methacrylate containing a tertiary amino group.
Claim 11
Dependent Claim
47 words
A process according to claim 2, in which resin (A) or resin (C) has no cationic amino group and the aqueous medium contains a material (D) which interacts with material produced in exposed areas in stage (ii) to produce aqueous base-insoluble material on heating in stage (iii).
Claim 12
Dependent Claim
40 words
A process according to claim 10, in which (A) is an ester of a film-forming phenolic hydroxyl group-containing resin, said ester having at least one carboxyl group which is present in at least partially ionized form in the aqueous medium.
Claim 13
Dependent Claim
25 words
A process according to claim 11, in which the phenolic hydroxyl group-containing resin is a novolak resin or a polymer of an ethylenically unsaturated phenol.
Claim 14
Dependent Claim
38 words
A process according to claim 12, in which (A) is a resin obtained by reacting the phenolic hydroxyl group-containing resin partially with an o-naphthoquinone diazide 5-sulfonic acid or esterifying derivative thereof and partially with a polycarboxylic acid anhydride.
Claim 15
Dependent Claim
35 words
A process according to claim 11, in which the phenolic hydroxyl group-containing resin is a novolak resin derived from formaldehyde and an alkyl substituted phenol or mixture thereof with phenol; or a polymer of p-vinylphenol.
Claim 16
Dependent Claim
51 words
A process according to claim 10, in which (C) has a carboxyl group present in the aqueous medium in at least partially ionized form and is a carboxyl-terminated diene polymer, a polymer of an ethylenically unsaturated carboxylic acid or a reaction product of a hydroxyl-containing resin with a polycarboxylic acid anhydride.
Claim 17
Dependent Claim
13 words
A process according to claim 10, in which (D) is an organic base.
Claim 18
Dependent Claim
24 words
A process according to claim 1, in which the layer is heated at a temperature of 80° C. to 120° C. in stage (iii).
Claim 19
Dependent Claim
25 words
A process according to claim 1, in which irradiation in stages (ii) and (iv) is effected using electromagnetic radiation having a wavelength of 200-600 nm.
Claim 20
Dependent Claim
31 words
A process according to claim 1, in which development in stage (v) is effected using an aqueous solution containing 0.5 to 5.0% by weight of sodium or potassium hydroxide or carbonate.
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