Low leakage silicon-on-insulator CMOS structure and method of making same

Claim 1

A complimentary metal oxide semiconductor (CMOS) device comprising: a substrate of a semiconductor material having a lower portion of a first conductivity type; a layer of a dielectric material over the lower portion of said substrate; a first island of a semiconductor material of a first conductivity type over a first portion of said dielectric layer, spaced regions of the second conductivity type in said first island forming the source and drain regions of a first MOS transistor of a second conductivity type over a first portion of said dielectric layer; a region of a second conductivity type in said substrate immediately below a second portion of said dielectric layer remote from said first portion to provide a field shield; a second island of a semiconductor material of said second conductivity type over said second portion of said dielectric layer, spaced region of the first conductivity type in said second island forming the source and drain regions of a second MOS transistor of said first conductivity type over said second portion of said dielectric layer; said second island being located wholly within a vertical projection of said field shield region through said second portion of said dielectric layer; a first electrode of a conductive material electrically connected to said substrate for receiving a first bias voltage for compensating for any charge in said dielectric layer below said first MOS transistor; and a second electrode of a conductive material electrically connected only to said field shield region for receiving a second bias voltage compensating for any charge in said dielectric layer below said second MOS transistor.