US4988601A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photosensitive resin composition with o-quinone diazide and novolac resins prepared from mixed phenolic reactants to include 3,5-xylenol and 2,5-xylenol
Assignee: Toshiba Corp
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Filing: 1988-11-25
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Granted: 1991-01-29
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Expires: 2008-11-25
Abstract
Abstract A photosensitive resin composition having high heat resistance, sensitivity, and resolution performance, including a novolak resin prepared by condensing 2,5-xylenol with m-cresol and/or p-cresol using a carbonyl compound, a novolak resin prepared by condensing 3,5-xylenol with m-cresol and/or p-cresol, and a photosensitive reagent. In addition, four other types of photosensitive resin compositions are disclosed.
Inventors
- 👤 Toru Ushirogouchi
- 👤 Shuji Hayase
- 👤 Yasunobu Onishi
- 👤 Rumiko Horiguchi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 03:53
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/025; G03F7/022; G03F7/023; G03F7/0233; G03F7/0236; G03F7/20; G03F7/22
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
83 words
A photosensitive resin composition comprising: an admixture of a novolak resin (a) prepared by condensing 2,5-xylenol, m-cresol and/or p-cresol with a carbonyl compound; a novolak resin (b) prepared by condensing 3,5-xylenol, m-cresol and/or p-cresol with a carbonyl compound; and an o-quinonediazide photosensitive reagent in a photosensitizing amount, wherein the amount of resin (a) is 30 to 70 wt % and the amount of resin (b) is 70 to 30 wt % as based on the total amount of resin present in the composition.
Claim 2
Dependent Claim
83 words
A photosensitive resin composition comprising: an admixture of a novolak resin (a) prepared by condensing 2,5-xylenol, m-cresol and/or p-cresol with a carbonyl compound; a novolak resin (b) prepared by condensing 3,5-xylenol, m-cresol and/or p-cresol with a carbonyl compound; and an o-quinonediazide photosensitive reagent in a photosensitizing amount, wherein the amount of resin (a) is 30 to 70 wt % and the amount of resin (b) is 70 to 30 wt % as based on the total amount of resin present in the composition.
Claim 3
Dependent Claim
23 words
A composition according to claim 1, wherein said carbonyl compound is selected from the group consisting of formaldehyde, acetaldehyde, benzaldehyde, benzylaldehyde and acetone.
Claim 4
Dependent Claim
19 words
A composition according to claim 1, wherein said photosensitive reagent is an ester of 2,3,4-trihydroxbenzophenone and 1,2-naphthoquinonediazide sulfonic acid.
Claim 5
Dependent Claim
19 words
A composition according to claim 1, wherein said photosensitive reagent is an ester of 2,3,4,4'-tetrahydroxybenzophenone and 1,2-naphthoquinonediazide sulfonic acid.
Claim 6
Dependent Claim
12 words
A composition according to claim 1, further comprising polyvinyl phenol and/or pyrogallol.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-01-28 | 1994-07-30 | 1995-01-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-01-28 | 1998-07-30 | 1999-01-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-01-28 | 2002-07-30 | 2003-01-29 | $7700.00 | Window Closed / Lapsed |