US4719167A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Positive photoresist composition with 1,2 naphthoquinone diazide and novolak resin condensed from mixture of m-cresol, p-cresol, and 2,5-xylenol with formaldehyde
Assignee: Mitsubishi Chemical Corp
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Filing: 1986-02-04
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Granted: 1988-01-12
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Expires: 2006-02-04
Abstract
Abstract Disclosed herein is a positive photoresist composition containing (a) a photosensitizer of 1,2-naphthoquinone diazides photosensitive-material comprising an ester of 2,3,4,4'-tetrahydroxybenzophenone in which on the average, not less than two hydroxy groups of 2,3,4,4'-tetrahydroxybenzophenone have been esterified by 1,2-naphthoquinonediazide-5-sulfonic acid and (b) a novolak resin obtained by condensing a mixture of m-cresol, p-cresol and 2,5-xylenol with formaldehyde.
Inventors
- 👤 Konoe Miura
- 👤 Tameichi Ochiai
- 👤 Yasuhiro Kameyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 18:41
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233; G03F7/0236
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
94 words
A positive photoresist composition consisting essentially of an admixture of (a) a photosensitizer of 1,2-naphthoquinone diazides photosensitive-material comprising an ester of 2,3,4,4'-tetrahydroxybenzophenone in which on the average, not less than two hydroxy groups of 2,3,4,4'-tetrahydroxybenzophenone have been esterified by 1,2-naphthoguinonediazide-5-sulfonic acid in a photosensitizing amount, and (b) a novolak resin obtained by condensing a mixture of about 10 to 80 mol percent m-cresol, about 10 to 80 mol percent p-cresol and about 10 to 80 mol percent 2,5-xylenol with formaldehyde, wherein the weight ratio of (a) to (b) is 15-35 parts to 100 parts.
Claim 2
Dependent Claim
94 words
A positive photoresist composition consisting essentially of an admixture of (a) a photosensitizer of 1,2-naphthoquinone diazides photosensitive-material comprising an ester of 2,3,4,4'-tetrahydroxybenzophenone in which on the average, not less than two hydroxy groups of 2,3,4,4'-tetrahydroxybenzophenone have been esterified by 1,2-naphthoguinonediazide-5-sulfonic acid in a photosensitizing amount, and (b) a novolak resin obtained by condensing a mixture of about 10 to 80 mol percent m-cresol, about 10 to 80 mol percent p-cresol and about 10 to 80 mol percent 2,5-xylenol with formaldehyde, wherein the weight ratio of (a) to (b) is 15-35 parts to 100 parts.
Claim 3
Dependent Claim
25 words
A positive photoresist composition according to claim 1, wherein the weight-average molecular weight of said novolak resin is in the range of 1,000 to 30,000.
Claim 4
Dependent Claim
37 words
A positive photoresist composition according to claim 1, wherein said 1,2-naphthoquinone diazides photosensitive-material is an esterified 2,3,4,4'-tetrahydroxybenzophenone by 1,2- naphthoquinonediazide-5-sulfonicacid in which on the average, 2.5 to 3.5 of the hydroxy group of 2,3,4,4'-tetrahydroxybenzophenone have been esterified.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-01-11 | 1991-07-13 | 1992-01-12 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-01-11 | 1995-07-13 | 1996-01-12 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-01-11 | 1999-07-13 | 2000-01-12 | $7700.00 | Window Closed / Lapsed |