Surface-modified adsorbent comprising metal oxide/hydroxide particles reacted with one or more perfluorinated organic acids

Claim 2

An active material comprising a metal oxide/hydroxide particle material reacted with a perfluorinated organic acid to bond a substantially monomolecular layer thereof to a surface of said oxide/hydroxide, said organic acid selected from the class consisting of perfluorinated phosphonic acid having the formula RPO(OH) 2 , and perfluorinated phosphinic acid having the formula RR'PO(OH), perfluorinated carboxylic acid having the formula RCOOH, and mixtures thereof, where R comprises a perfluorinated carbon-containing group and R' comprises a perfluorinated carbon-containing group, each perfluorinated carbon-containing group of said perfluorinated organic acid being oriented away from said metal oxide/hydroxide surface said element selected from the class consisting of Sc, Y, Ti, Zr, Hf, V, Nb, Ta, Cr, W, Mn, Tc, Re, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Hg, B, Al, Ga, In, Tl, Ge, Sn, Pb, As, Sb and Bi, elements in the lanthanide series and the actinide series, mixtures thereof, and mixtures of Be, Mg, Ca, Sr, Ba, Ra, Se, Te and Po.

Claim 3

The active material of claim 1 wherein said metal oxide/hydroxide comprises an oxide/hydroxide of a metal selected from the class consisting of aluminum, magnesium, titanium, zirconium, iron, chromium, zinc, vanadium, and combinations of these metals.

Claim 4

The active material of claim 1 wherein said metal oxide/hydroxide is selected from the class consisting of alumina, iron oxide, zeolitic materials, zirconia, zinc oxide, magnesia, apatites, hydrotalcites, and mixtures thereof.

Claim 5

The active material of claim 1 wherein said metal oxide/hydroxide comprises alumina.

Claim 6

The active material of claim 1 wherein said alumina has a particle size in the range of 50 Angstroms to 12 millimeters.

Claim 7

The active material of claim 1 wherein the thickness of said monomolecular layer of perfluorinated organic material chemically bonded to said metal oxide/hydroxide particles is in the range of 2 to 5,000 Angstroms.

Claim 8

The active material of claim 6 wherein the thickness of said monomolecular layer of perfluorinated organic material chemically bonded to said metal oxide/hydroxide particles is in the range of 3 to 500 Angstroms.

Claim 9

The active material of claim 1 wherein said R group of said perfluorinated organic molecule contains at least 5 carbon atoms.

Claim 10

The active material of claim 1 wherein said perfluorinated organic acid comprises a perfluorinated phosphonic acid having the formula RPO(OH) 2 where R comprises a perfluorinated 1-30 carbon-containing aliphatic group.

Claim 11

The active material of claim 1 wherein said perfluorinated organic acid comprises perfluorinated phosphinic acid having the formula RR'PO(OH) where R and R' each comprises a perfluorinated 1-30 carbon-containing aliphatic group.

Claim 12

The active material of claim 1 wherein said perfluorinated organic acid comprises perfluorinated carboxylic acid having the formula RCOOH where R comprises a perfluorinated 1-30 carbon-containing aliphatic group.

Claim 13

An active material of claim 1 comprising a metal oxide/ hydroxide particle having a surface and having chemically bonded to reactive sites thereon a substantially monomolecular layer of a mixture of about 80 to 99 wt. % of said perfluorinated organic acids and the balance perhalogenated organic acids selected from the class consisting of perchlorinated and perbrominated organic acids and mixtures, said bond being formed by reaction of the acid group of said perfluorinated and perhalogenated organic acids with said metal oxide/hydroxide surface, whereby the perfluorinated or perhalogenated carbon-containing group of said organic acids are oriented away from said metal oxide/hydroxide surface.

Claim 14

A process for bonding a layer of perfluorinated organic material to a metal oxide/ hydroxide particle having a surface, the bonding to the surface to form an active material having good chemical stability over a pH range of from 1 to 14 which comprises: (a) providing a liquid containing a perfluorinated organic acid therein selected from the class consisting of: (i) perfluorinated phosphonic acid having the formula RPO(OH) 2 ; (ii) perfluorinated phosphonic acid having the formula RR'PO(OH); (iii) perfluorinated carboxylic acid having the formula RCOOH; and (iv) mixtures thereof; where R comprises a perfluorinated 1-30 carbon-containing group and R' comprises a perfluorinated 1-30 carbon-containing group; and (b) contacting said metal oxide/hydroxide surface with said liquid to bond said perfluorinated organic acid material to at least 90% of the reactive sites on said metal oxide/hydroxide surface to form a substantially monomolecular layer of said perfluorinated organic material thereon forming said active material.

Claim 15

A process for bonding a layer of perfluorinated organic material to a metal oxide/ hydroxide particle having a surface, the bonding to the surface to form an active material having good chemical stability over a pH range of from 1 to 14 which comprises: (a) providing a liquid containing a perfluorinated organic acid therein selected from the class consisting of: (i) perfluorinated phosphonic acid having the formula RPO(OH) 2 ; (ii) perfluorinated phosphonic acid having the formula RR'PO(OH); (iii) perfluorinated carboxylic acid having the formula RCOOH; and (iv) mixtures thereof; where R comprises a perfluorinated 1-30 carbon-containing group and R' comprises a perfluorinated 1-30 carbon-containing group; and (b) contacting said metal oxide/hydroxide surface with said liquid to bond said perfluorinated organic acid material to at least 90% of the reactive sites on said metal oxide/hydroxide surface to form a substantially monomolecular layer of said perfluorinated organic material thereon forming said active material.

Claim 16

The process of claim 13 wherein said step of providing a liquid containing said perfluorinated organic acid therein having further comprises maintaining a concentration of said perfluorinated organic acid in said liquid of at least about 0.0001 molar.

Claim 17

The process of claim 13 wherein said step of contacting said metal oxide/hydroxide surface with said liquid containing said perfluorinated organic acid further comprises maintaining said contact for from about 1 second to about 20 hours.

Claim 18

The process of claim 15 wherein said step of contacting said metal oxide/hydroxide surface with said liquid containing said perfluorinated organic acid further comprises maintaining said contact for from about 0.5 to about 4 hours.

Claim 19

The process of claim 13 wherein said step of contacting said metal oxide/hydroxide surface with said liquid containing said perfluorinated organic acid further comprises maintaining the temperature of the reactants at from above the freezing point up to the boiling point of the solution during said contacting step.

Claim 20

The process of claim 13 including the further step of washing said active material after said contacting step to remove excess perfluorinated organic acid thereon not chemically bonded to said metal oxide/hydroxide surface to ensure formation of a monomolecular layer of said perfluorinated organic material on said metal oxide/hydroxide surface.

Claim 21

A process for chemically bonding a substantially monomolecular layer of perfluorinated organic material to a metal oxide/hydroxide particle to form an active material having good chemical stability over a pH range of from 1 to 14 which comprises: (a) providing a liquid containing a perfluorinated organic acid therein selected from the class consisting of: (i) perfluorinated phosphinic acid having the formula RPO(OH) 2 ; (ii) perfluorinated phosphinic acid having the formula RR'PO(OH); III) perfluorinated carboxylic acid having the formula RCOOH; and (iv) mixtures thereof; where R comprises a perfluorinated 1-30 carbon-containing group and R' comprises a perfluorinated 1-30 carbon-containing group; (b) maintaining said liquid containing said perfluorinated organic acid at a concentration of at least 0.0001 molar; (c) contacting the metal oxide/hydroxide with said liquid within a temperature range of from about 25° to 90° C. for a period of from at least 1 second to about 20 hours to chemically bond said perfluorinated organic acid to at least 90% of the reactive sites on the surface of said metal oxide/hydroxide particle to form a substantially monomolecular layer of said organic material thereon comprising said active material; and (d) washing said active material after said contacting step to remove excess perfluorinated organic acid thereon not chemically bonded to said metal oxide/ hydroxide surface to ensure formation of a monomolecular layer of said perfluorinated organic material on the surface of said metal oxide/hydroxide.

Claim 22

A process for chemically bonding a substantially monomolecular layer of perfluorinated organic material to a metal oxide/hydroxide particle to form an active material having good chemical stability over a pH range of from 1 to 14 which comprises: (a) providing a liquid containing a perfluorinated organic acid therein selected from the class consisting of: (i) perfluorinated phosphinic acid having the formula RPO(OH) 2 ; (ii) perfluorinated phosphinic acid having the formula RR'PO(OH); III) perfluorinated carboxylic acid having the formula RCOOH; and (iv) mixtures thereof; where R comprises a perfluorinated 1-30 carbon-containing group and R' comprises a perfluorinated 1-30 carbon-containing group; (b) maintaining said liquid containing said perfluorinated organic acid at a concentration of at least 0.0001 molar; (c) contacting the metal oxide/hydroxide with said liquid within a temperature range of from about 25° to 90° C. for a period of from at least 1 second to about 20 hours to chemically bond said perfluorinated organic acid to at least 90% of the reactive sites on the surface of said metal oxide/hydroxide particle to form a substantially monomolecular layer of said organic material thereon comprising said active material; and (d) washing said active material after said contacting step to remove excess perfluorinated organic acid thereon not chemically bonded to said metal oxide/ hydroxide surface to ensure formation of a monomolecular layer of said perfluorinated organic material on the surface of said metal oxide/hydroxide.