Patent US4956611A successfully refreshed from Google Patents.
US4956611A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Electrical measurements of properties of semiconductor devices during their manufacturing process
Assignee: Individual
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Filing: 1989-04-26
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Granted: 1990-09-11
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Expires: 2009-04-26
Abstract
Abstract A method for measuring the width of structures in a semiconductor wafer comprises the step of constructing test structures on the wafer shaped to function as moats for confining electrically conductive liquid. The moats have an elongated shape. By measuring the electrical resistance exhibited by the liquid within the moat, the dimensions of the moat and, thus, the other structures on the wafer can be measured.
Inventors
- 👤 Ron Maltiel
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 18:06
CPC Classifications
G; G01; G01B; G01B7/00; G01B7/14
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
72 words
A method comprising the steps of: constructing a structure on a substrate, said structure serving as the walls of a moat; introducing an electrically conductive liquid into said moat so that said liquid is confined by said structure; and measuring the electrical resistance exhibited by said liquid between a first location within said moat and a second location within said moat, said second location being laterally displaced relative to said first location.
Claim 2
Independent Claim
72 words
A method comprising the steps of: constructing a structure on a substrate, said structure serving as the walls of a moat; introducing an electrically conductive liquid into said moat so that said liquid is confined by said structure; and measuring the electrical resistance exhibited by said liquid between a first location within said moat and a second location within said moat, said second location being laterally displaced relative to said first location.
Claim 3
Dependent Claim
26 words
Method of claim 1 further comprising the step of calculating the width of lines formed on the surface of said substrate from said measured electrical resistance.
Claim 4
Dependent Claim
26 words
Method of claim 1 further comprising the step of calculating the distance between lines formed on the surface of said substrate from said measured electrical resistance.
Claim 5
Dependent Claim
16 words
Method of claim 1 wherein said substrate is a semiconductor wafer and said structure comprises photoresist.
Claim 6
Independent Claim
75 words
A method comprising the steps of: constructing a structure on a substrate, said structure serving as the walls of a moat; introducing an electrically conductive liquid into said moat; and measuring the electrical resistance exhibited by said liquid, wherein said structure is electrically conductive, said method further comprising the step of covering said structure with a non-conductive liquid prior to depositing said conductive liquid, so that said structure does not electrically contact said conductive liquid.
Claim 7
Independent Claim
75 words
A method comprising the steps of: constructing a structure on a substrate, said structure serving as the walls of a moat; introducing an electrically conductive liquid into said moat; and measuring the electrical resistance exhibited by said liquid, wherein said structure is electrically conductive, said method further comprising the step of covering said structure with a non-conductive liquid prior to depositing said conductive liquid, so that said structure does not electrically contact said conductive liquid.
Claim 8
Independent Claim
90 words
A method comprising the steps of: constructing a structure on a substrate, said structure serving as the walls of a moat; introducing an electrically conductive liquid into said moat; and measuring the electrical resistance exhibited by said liquid, wherein said structure is electrically conductive, and wherein said step of introducing comprises the step of applying a mixture of said conductive liquid and a non-conductive liquid to said structure and allowing said non-conductive liquid to settle so that said non-conductive liquid prevents said electrically conductive liquid from electrically contacting said structure.
Claim 9
Independent Claim
90 words
A method comprising the steps of: constructing a structure on a substrate, said structure serving as the walls of a moat; introducing an electrically conductive liquid into said moat; and measuring the electrical resistance exhibited by said liquid, wherein said structure is electrically conductive, and wherein said step of introducing comprises the step of applying a mixture of said conductive liquid and a non-conductive liquid to said structure and allowing said non-conductive liquid to settle so that said non-conductive liquid prevents said electrically conductive liquid from electrically contacting said structure.
Claim 10
Dependent Claim
61 words
Method for electrically contacting a structure in an integrated circuit, said structure including an opening, said method comprising the steps of: introducing an electrically conductive liquid into said opening, said electrically conductive liquid electrically contacting the side of said structure; and introducing an electrical probe into said conductive liquid to thereby permit electrical contact to said structure via said conductive liquid.
Claim 11
Dependent Claim
61 words
Method for electrically contacting a structure in an integrated circuit, said structure including an opening, said method comprising the steps of: introducing an electrically conductive liquid into said opening, said electrically conductive liquid electrically contacting the side of said structure; and introducing an electrical probe into said conductive liquid to thereby permit electrical contact to said structure via said conductive liquid.
Claim 12
Dependent Claim
16 words
Method of claim 7 wherein the top surface of said structure is covered by nonconductive material.
Claim 13
Dependent Claim
56 words
Method for testing electrical characteristics of a dielectric layer in an integrated circuit comprising the steps of: introducing an electrically conductive liquid on top of said dielectric layer, wherein said dielectric layer extends over electrically conductive material; applying a signal to said conductive liquid; and measuring the capacitance between said conductive liquid and said conductive material.
Claim 14
Dependent Claim
56 words
Method for testing electrical characteristics of a dielectric layer in an integrated circuit comprising the steps of: introducing an electrically conductive liquid on top of said dielectric layer, wherein said dielectric layer extends over electrically conductive material; applying a signal to said conductive liquid; and measuring the capacitance between said conductive liquid and said conductive material.
Claim 15
Dependent Claim
27 words
Method of claim 9 further comprising the steps of: removing said conductive liquid; and applying a solid conductive layer over said dielectric layer, thereby forming a capacitor.
Claim 16
Independent Claim
69 words
A method comprising the steps of: constructing a structure on a substrate, said structure serving as the walls of a moat; introducing an electrically conductive liquid into said moat; introducing a plurality of probes into said conductive liquid; and measuring the electrical resistance exhibited by said liquid between at least a first one of said probes within said plurality and a second one of said probes within said plurality.
Claim 17
Independent Claim
69 words
A method comprising the steps of: constructing a structure on a substrate, said structure serving as the walls of a moat; introducing an electrically conductive liquid into said moat; introducing a plurality of probes into said conductive liquid; and measuring the electrical resistance exhibited by said liquid between at least a first one of said probes within said plurality and a second one of said probes within said plurality.
Claim 18
Dependent Claim
11 words
Method of claim 11 wherein said substrate is a semiconductor wafer.
Claim 19
Independent Claim
96 words
A method comprising the steps of: constructing a structure on a substrate, said structure serving as the walls of a moat; introducing an electrically conductive liquid into said moat; and measuring the electrical resistance exhibited by said liquid, wherein at least a portion of the top surface of said substrate underneath said conductive liquid is electrically conductive, said method further comprising the step of covering said portion of said top surface with a non-conductive liquid prior to depositing said conductive liquid, so that said portion of said top surface does not electrically contact said conductive liquid.
Claim 20
Independent Claim
96 words
A method comprising the steps of: constructing a structure on a substrate, said structure serving as the walls of a moat; introducing an electrically conductive liquid into said moat; and measuring the electrical resistance exhibited by said liquid, wherein at least a portion of the top surface of said substrate underneath said conductive liquid is electrically conductive, said method further comprising the step of covering said portion of said top surface with a non-conductive liquid prior to depositing said conductive liquid, so that said portion of said top surface does not electrically contact said conductive liquid.
Claim 21
Independent Claim
87 words
A method comprising the steps of: constructing a structure on a substrate, said structure serving as the walls of a moat wherein at least a portion of the top surface of said substrate is electrically conductive; introducing a mixture of an electrically conductive liquid and a non-conductive liquid into said moat; allowing said non-conductive liquid to settle so that said non-conductive liquid prevents said electrically conductive liquid from electrically contacting said portion of said top surface; and measuring the electrical resistance exhibited by said electrically conductive liquid.
Claim 22
Independent Claim
87 words
A method comprising the steps of: constructing a structure on a substrate, said structure serving as the walls of a moat wherein at least a portion of the top surface of said substrate is electrically conductive; introducing a mixture of an electrically conductive liquid and a non-conductive liquid into said moat; allowing said non-conductive liquid to settle so that said non-conductive liquid prevents said electrically conductive liquid from electrically contacting said portion of said top surface; and measuring the electrical resistance exhibited by said electrically conductive liquid.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-09-10 | 1994-03-12 | 1994-09-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-09-10 | 1998-03-12 | 1998-09-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-09-10 | 2002-03-12 | 2002-09-11 | $7700.00 | Window Closed / Lapsed |