US4946537A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma reactor
Assignee: Tokyo Ohka Kogyo Co Ltd
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Filing: 1989-06-26
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Granted: 1990-08-07
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Expires: 2009-06-26
Abstract
Abstract A plasma reactor includes a chamber, a specimen such as a wafer or the like supported in the chamber, a device for generating a plasma in the chamber, and at least one electromagnetic coil disposed coaxially around the chamber. The specimen is supported parallel to a magnetic field generated by the electromagnetic coil. High-density and high-energy charged particles in the plasma collide perpendicularly with the surface of the specimen to treat the specimen by way of etching or the like.
Inventors
- 👤 Isamu Hijikata
- 👤 Akira Uehara
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 12:46
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; H01J37/32431; H01J37/3266; H05; H05H; H05H1/00; H05H1/24; H05H1/46
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
78 words
A plasma reactor comprising: a chamber; means for generating a plasma in said chamber; means for generating a magnetic field in said chamber; support means disposed in said chamber for supporting a specimen to be treated, parallel to the generated magnetic field; a waveguide which houses said chamber and associated with a microwave oscillator; a vacuum source and a reaction gas source which are connected to said chamber; and a high-frequency power supply connected to said support means.
Claim 2
Dependent Claim
78 words
A plasma reactor comprising: a chamber; means for generating a plasma in said chamber; means for generating a magnetic field in said chamber; support means disposed in said chamber for supporting a specimen to be treated, parallel to the generated magnetic field; a waveguide which houses said chamber and associated with a microwave oscillator; a vacuum source and a reaction gas source which are connected to said chamber; and a high-frequency power supply connected to said support means.
Claim 3
Dependent Claim
21 words
A plasma reactor according to claim 1, wherein said means for generating a magnetic field comprises at least one electromagnetic coil.
Claim 4
Dependent Claim
17 words
A plasma reactor according to claim 2, wherein said electromagnetic coil is disposed coaxially around said chamber.
Claim 5
Dependent Claim
36 words
A plasma reactor according to claim 1, wherein said means for generating a plasma comprises an electrode connected to ground and an electrode connected to a high-frequency power supply, said electrodes being disposed in said chamber.
Claim 6
Dependent Claim
59 words
A plasma reactor comprising: a chamber; means for generating a plasma in said chamber; means for generating a static magnetic field in said chamber; said means for generating a static magnetic field comprises at least one electromagnetic coil; and support means disposed in said chamber for supporting a specimen to be treated parallel to the generated static magnetic field.
Claim 7
Dependent Claim
59 words
A plasma reactor comprising: a chamber; means for generating a plasma in said chamber; means for generating a static magnetic field in said chamber; said means for generating a static magnetic field comprises at least one electromagnetic coil; and support means disposed in said chamber for supporting a specimen to be treated parallel to the generated static magnetic field.
Claim 8
Dependent Claim
29 words
A plasma reactor according to claim 5, wherein said support means is adapted to supported a specimen to be treated directly within a central opening of said electromagnetic coil.
Claim 9
Dependent Claim
48 words
A plasma reactor according to claim 5, including: a head which closes an open side of said chamber, said head having a central opening defined therein; and said support means is adapted to move horizontally into and out of said chamber through said central opening of said head.
Claim 10
Dependent Claim
18 words
A plasma reactor according to claim 7, wherein said head also closes an open side of said waveguide.
Claim 11
Dependent Claim
24 words
Apparatus according to claim 7, further including a vacuum source and a reaction gas source which are connected to said chamber through said head.
References Cited (Backward Citations)
JPS509545A
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JPS5334462A
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JPS5344795A
Cited
JPS5939508A
Cited
US4559100A
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US4829215A
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US4668338A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-08-06 | 1994-02-05 | 1994-08-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-08-06 | 1998-02-05 | 1998-08-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-08-06 | 2002-02-05 | 2002-08-07 | $7700.00 | Window Closed / Lapsed |