US4931137A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for producing mutually spaced conductor elements on a substrate
Assignee: Commissariat à l'Énergie Atomique et Aux Énergies Alternatives
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Filing: 1987-11-17
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Granted: 1990-06-05
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Expires: 2007-11-17
Abstract
Abstract The invention relates to a process for producing on a substrate conductor elements which are mutually spaced by a submicron dimension. This process comprises the stages of producing on substrate (1) spacers, whose dimensions and spacing are a function of the dimensions and spacing of the elements (11a) to be produced, anisotropic deposition on the substrate and perpendicular thereto of the material (11a) constituting the spacers and elimination of said spacers. The invention applies to the production of any random elements and particularly to the production of slightly mutually spaced electric conductors.
Inventors
- 👤 Henri Sibuet
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 01:12
CPC Classifications
G; G11; G11B; G11B5/00; G11B5/127; G11B5/31; G11B5/3163; H; H01; H01F; H01F41/00; H01F41/32; H01F41/34; H10; H10D; H10D64/00; H10D64/01; H10D64/011; H10P; H10P76/00; H10P76/40; H10P76/408; H10P76/4085; H05; H05K; H05K3/00; H05K3/10; H05K3/14; H05K3/143; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/947; Y10S438/948; Y10S438/951
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
180 words
Process for the production of mutually spaced elements (11a, 13a) on a substrate (1), comprising a first stage of producing on the substrate spacers (10), which are perpendicular to the substrate and whereof the dimensions and spacings are a function of the dimensions and spacings of the elements (11a, 13a) to be produced, said spacers (10) having parallel side walls and a width less than 1 micrometer, a second stage of depositing anisotropically a first material forming elements (11a) on said substrate (1) in a direction perpendicular to its surface, wherein a deposit (11b) is produced on the heads of spacers (10) which prevents the deposit of said first material on the walls of the spacers, a third stage of depositing anisotropically perpendicular to the surface of the substrate a second material on the deposited first material so that said second material covers the upper surface of the first deposited material, and, using the second material as a mask, selectively etching the first material to remove it at least from the bases of the spacers and thereafter removing the spacers.
Claim 2
Dependent Claim
180 words
Process for the production of mutually spaced elements (11a, 13a) on a substrate (1), comprising a first stage of producing on the substrate spacers (10), which are perpendicular to the substrate and whereof the dimensions and spacings are a function of the dimensions and spacings of the elements (11a, 13a) to be produced, said spacers (10) having parallel side walls and a width less than 1 micrometer, a second stage of depositing anisotropically a first material forming elements (11a) on said substrate (1) in a direction perpendicular to its surface, wherein a deposit (11b) is produced on the heads of spacers (10) which prevents the deposit of said first material on the walls of the spacers, a third stage of depositing anisotropically perpendicular to the surface of the substrate a second material on the deposited first material so that said second material covers the upper surface of the first deposited material, and, using the second material as a mask, selectively etching the first material to remove it at least from the bases of the spacers and thereafter removing the spacers.
Claim 3
Dependent Claim
23 words
Process for the production of elements (11a, 13a) on a substrate (1) according to claim 1 characterized in that the elements are conductors.
Claim 4
Dependent Claim
16 words
Process according to claim 1 or 2, characterized in that the spacers are made from silica.
Claim 5
Dependent Claim
17 words
Process according to claim 3, characterized in that the spacers are removed by etching with hydrofluoric acid.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-06-04 | 1993-12-04 | 1994-06-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-06-04 | 1997-12-04 | 1998-06-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-06-04 | 2001-12-04 | 2002-06-05 | $7700.00 | Window Closed / Lapsed |