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Method of forming light-trapping surface for photovoltaic cell and resulting structure

Assignee: Electric Power Research Institute
•
Filing: 1989-03-31
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Granted: 1990-04-17
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Expires: 2009-03-31
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Abstract

Abstract An improved textured surface of a photovoltaic device is provided by an anisotropic etching process in which pyramidal structures are formed on a silicon surface having a (100) crystallographic orientation. An aqueous solution of an alkali metal hydroxide is heated to approximately 85° C. whereupon isopropyl alcohol is added. Separated silicon wafers are immersed in the solution for approximately 45 minutes. The wafers can be agitated for a limited time in the solution, and preferably the wafers and solution are covered during the etching step. The resulting pyramids are on the order of 14 microns high and 20 microns on each side of the base. The overlap of the pyramids provides desired random locations for the pyramids.

Inventors

  • 👤 Walter R. Lamb
  • 👤 John E. Lawrence

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 17:08
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/60; H10P50/64; H10P50/642; H10P50/644; H10F; H10F77/00; H10F77/70; H10F77/703; Y; Y02; Y02E; Y02E10/00; Y02E10/50

Claims Analysis

Total Claims: 12
Claim 1
Independent Claim 91 words
A method of fabricating a light-trapping textured surface of a photovoltaic cell comprising the steps of (a) providing silicon wafers having surfaces with (100) crystallographic orientation, (b) providing an aqueous solution of an alkali metal hydroxide, (c) heating said aqueous solution to approximately 85° C., (d) adding isopropyl alcohol to the heated aqueous solution, (e) immersing said silicon wafers in said heated aqueous solution for sufficient time to etch surfaces of said wafers and form pyramidal shapes on said surfaces, and (f) removing and rinsing said silicon wafers in deionized water.
Claim 2
Independent Claim 91 words
A method of fabricating a light-trapping textured surface of a photovoltaic cell comprising the steps of (a) providing silicon wafers having surfaces with (100) crystallographic orientation, (b) providing an aqueous solution of an alkali metal hydroxide, (c) heating said aqueous solution to approximately 85° C., (d) adding isopropyl alcohol to the heated aqueous solution, (e) immersing said silicon wafers in said heated aqueous solution for sufficient time to etch surfaces of said wafers and form pyramidal shapes on said surfaces, and (f) removing and rinsing said silicon wafers in deionized water.
Claim 3
Dependent Claim 14 words
The method as defined by claim 1 wherein step (b) includes providing potassium hydroxide.
Claim 4
Dependent Claim 40 words
The method as defined by claim 2 wherein step (b) includes providing 100 ml of deionized water for every gram of potassium hydroxide, and step (d) includes providing 60 ml of isopropyl alcohol for every 8 grams of potassium hydroxide.
Claim 5
Dependent Claim 32 words
The method as defined by claim 3 wherein step (e) includes immersing said silicon wafers for approximately 45 minutes with the temperature of said aqueous solution being maintained at approximately 85° C.
Claim 6
Dependent Claim 21 words
The method as defined by claim 4 wherein the temperature of said aqueous solution is maintained at 85° C. +1° C.
Claim 7
Dependent Claim 27 words
The method as defined by claim 4 and further including the step of agitating said silicon wafers in said aqueous solution for a limited period of time.
Claim 8
Dependent Claim 17 words
The method as defined by claim 6 wherein said limited period of time is approximately 5 minutes.
Claim 9
Dependent Claim 24 words
The method as defined by claim 7 and further including the step of covering said silicon wafers and said aqueous solution during step (e).
Claim 10
Dependent Claim 27 words
The method as defined by claim 1 and further including the step of agitating said silicon wafers in said aqueous solution for a limited period of time.
Claim 11
Dependent Claim 17 words
The method as defined by claim 9 wherein said limited period of time is approximately 5 minutes.
Claim 12
Dependent Claim 24 words
The method as defined by claim 1 and further including the step of covering said silicon wafers and said aqueous solution during step (e).

References Cited (Backward Citations)

US3266961A Cited
US3506509A Cited
US3765969A Cited
US3738881A Cited
US4137123A Cited
US4758368A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1993-04-16 1993-10-16 1994-04-17 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1997-04-16 1997-10-16 1998-04-17 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2001-04-16 2001-10-16 2002-04-17 $7700.00 Window Closed / Lapsed

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