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Method of forming a diamond film

Assignee: Nissin Electric Co Ltd
•
Filing: 1988-02-25
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Granted: 1990-04-10
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Expires: 2008-02-25
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Abstract

Abstract A method of forming a diamond film on a substrate wherein hydrogen, a hydrocarbon series gas, an inert gas, an organic compound series gas or a mixture of such gases is introduced into a vacuum vessel to contact a substrate and carbon is evaporated by are discharge at a carbon cathode while applying a voltage to the substrate to deposit carbon on the substrate thus forming a diamond film on the substrate. A silicon series gas, a germanium series gas or a mixture thereof may be also introduced into the vessel with the foregoing gas or gases. While the carbon is being deposited on the substrate, thermoelectrons may also be supplied onto the substrate, and, further, high frequency discharge may be generated in a space between the substrate and the cathodes.

Inventors

  • 👤 Koji Okamoto
  • 👤 Masayasu Tanjo
  • 👤 Eiji Kamijo

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 21:30
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/06; C23C14/0605; C23C14/0611; C30; C30B; C30B23/00; C30B23/02; C30B29/00; C30B29/02; C30B29/04

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 93 words
A method of forming a diamond film on a substrate comprising the steps of: introducing a gas selected from the group consisting of inert gases, hydrocarbon series gases, organic compound series gases and mixtures thereof into a vacuum vessel to contact a substrate housed in said vessel; and evaporating carbon onto said substrate by arc discharge at a carbon cathode housed in said vacuum vessel, while applying a negative bias voltage to said substrate or to a holder for holding said substrate to deposit carbon on said substrate thereby forming said diamond film.
Claim 2
Independent Claim 93 words
A method of forming a diamond film on a substrate comprising the steps of: introducing a gas selected from the group consisting of inert gases, hydrocarbon series gases, organic compound series gases and mixtures thereof into a vacuum vessel to contact a substrate housed in said vessel; and evaporating carbon onto said substrate by arc discharge at a carbon cathode housed in said vacuum vessel, while applying a negative bias voltage to said substrate or to a holder for holding said substrate to deposit carbon on said substrate thereby forming said diamond film.
Claim 3
Dependent Claim 24 words
A diamond film forming method according to claim 1, wherein carbon is deposited onto said substrate while thermoelectrons are being supplied onto said substrate.
Claim 4
Dependent Claim 32 words
A diamond film forming method according to claim 1, wherein carbon is deposited onto said substrate while high frequency discharge is being generated in a space between said substrate and said cathode.
Claim 5
Independent Claim 117 words
A method of forming a diamond film on a substrate comprising the steps of: introducing a combination of (1) a gas selected from the group consisting of inert gases, hydrocarbon series gases, organic compound series gases and mixtures thereof and (b 2) a gas selected from the group consisting of silicon series gases, germanium series gases and mixtures thereof into a vacuum vessel to contact a substrate housed in said vessel; and evaporating carbon onto said substrate by arc discharge at a carbon cathode housed in said vacuum vessel, while applying a negative bias voltage to said substrate or to a holder for holding said substrate to deposit carbon on said substrate thereby forming said diamond film.
Claim 6
Independent Claim 117 words
A method of forming a diamond film on a substrate comprising the steps of: introducing a combination of (1) a gas selected from the group consisting of inert gases, hydrocarbon series gases, organic compound series gases and mixtures thereof and (b 2) a gas selected from the group consisting of silicon series gases, germanium series gases and mixtures thereof into a vacuum vessel to contact a substrate housed in said vessel; and evaporating carbon onto said substrate by arc discharge at a carbon cathode housed in said vacuum vessel, while applying a negative bias voltage to said substrate or to a holder for holding said substrate to deposit carbon on said substrate thereby forming said diamond film.
Claim 7
Dependent Claim 24 words
A diamond film forming method according to claim 4, wherein carbon is deposited onto said substrate while thermoelectrons are being supplied onto said substrate.
Claim 8
Dependent Claim 33 words
A diamond film forming method according to claim 4, wherein carbon is deposited onto said substrate while a high frequency discharge is being generated in a space between said substrate and said cathode.
Claim 9
Independent Claim 93 words
A method of forming a diamond film on a substrate comprising the steps of: introducing a gas selected from the group consisting of inert gases, hydrocarbon series gases, organic compound series gases and mixtures thereof into a vacuum vessel to contact a substrate housed in said vessel; and evaporating carbon onto said substrate by arc discharge at a carbon cathode housed in said vacuum vessel, while applying an AC bias voltage to said substrate or to a holder for holding said substrate to deposit carbon on said substrate thereby forming said diamond film.
Claim 10
Independent Claim 93 words
A method of forming a diamond film on a substrate comprising the steps of: introducing a gas selected from the group consisting of inert gases, hydrocarbon series gases, organic compound series gases and mixtures thereof into a vacuum vessel to contact a substrate housed in said vessel; and evaporating carbon onto said substrate by arc discharge at a carbon cathode housed in said vacuum vessel, while applying an AC bias voltage to said substrate or to a holder for holding said substrate to deposit carbon on said substrate thereby forming said diamond film.
Claim 11
Dependent Claim 32 words
A diamond film forming method according to claim 7, wherein carbon is deposited onto said substrate while high frequency discharge is being generated in a space between said substrate and said cathode.
Claim 12
Independent Claim 116 words
A method of forming a diamond film on a substrate comprising the steps of: introducing a combination of (1) a gas selected from the group consisting of inert gases, hydrocarbon series gases, organic compound series gases and mixtures thereof and (2) a gas selected from the group consisting of silicon series gases, germanium series gases and mixtures thereof into a vacuum vessel to contact a substrate housed in said vessel; and evaporating carbon onto said substrate by arc discharge at a carbon cathode housed in said vacuum vessel, while applying an AC bias voltage to said substrate or to a holder for holding said substrate to deposit carbon on said substrate thereby forming said diamond film.
Claim 13
Independent Claim 116 words
A method of forming a diamond film on a substrate comprising the steps of: introducing a combination of (1) a gas selected from the group consisting of inert gases, hydrocarbon series gases, organic compound series gases and mixtures thereof and (2) a gas selected from the group consisting of silicon series gases, germanium series gases and mixtures thereof into a vacuum vessel to contact a substrate housed in said vessel; and evaporating carbon onto said substrate by arc discharge at a carbon cathode housed in said vacuum vessel, while applying an AC bias voltage to said substrate or to a holder for holding said substrate to deposit carbon on said substrate thereby forming said diamond film.
Claim 14
Dependent Claim 32 words
A diamond film forming method according to claim 9, wherein carbon is deposited onto said substrate while high frequency discharge is being generated in a space between said substrate and said cathode.

References Cited (Backward Citations)

GB1395648A Cited
US3961103A Cited
US4228142A Cited
JPS60118693A Cited
JPS60171294A Cited
US4490229A Cited
US4725345A Cited
US4767608A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1993-04-09 1993-10-09 1994-04-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1997-04-09 1997-10-09 1998-04-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2001-04-09 2001-10-09 2002-04-10 $7700.00 Window Closed / Lapsed

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