US4913790A
Expired / Lapsed
US
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Treating method
Assignee: Tokyo Electron Ltd
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Filing: 1989-03-21
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Granted: 1990-04-03
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Expires: 2009-03-21
Abstract
Abstract A workpiece treating method includes a temperature rise step in which first temperature control is performed and a treatment step in which second temperature control is performed and is adapted to treat a workpiece whose emissivity of infrared rays in the temperature rise step is different from that in the treatment step. In the temperature rise step, the temperature of the workpiece is detected by a non-contact type temperature detecting means so as to perform the first temperature control. In the treatment step, the temperature of the workpiece is detected by a contact type temperature detecting means so as to perform the second temperature control.
Inventors
- 👤 Tomonori Narita
- 👤 Kimihiro Matsuse
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 16:54
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/52; H; H01; H01J; H01J37/00; H01J37/32; H01J37/32917; H01J37/32935; C23C14/00; C23C14/02; C23C14/22; C23C14/54; C23C14/541; C23C16/02; C23C16/0209; C23C16/48; C23C16/481
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
104 words
A workpiece treating method comprising a temperature rise step in which first temperature control is performed and a treatment step in which second temperature control is performed and adapted to treat a workpiece whose emissivity of infrared rays in the temperature rise step is different from that in the treatment step, wherein a temperature of the workpiece is detected by non-contact type temperature detecting means in the temperature rise step so as to perform the first temperature control, and the temperature of the workpiece is detected by contact type temperature detecting means in the treatment step so as to perform the second temperature control.
Claim 2
Dependent Claim
104 words
A workpiece treating method comprising a temperature rise step in which first temperature control is performed and a treatment step in which second temperature control is performed and adapted to treat a workpiece whose emissivity of infrared rays in the temperature rise step is different from that in the treatment step, wherein a temperature of the workpiece is detected by non-contact type temperature detecting means in the temperature rise step so as to perform the first temperature control, and the temperature of the workpiece is detected by contact type temperature detecting means in the treatment step so as to perform the second temperature control.
Claim 3
Dependent Claim
13 words
A method according to claim 1, wherein said workpiece is a semiconductor substrate.
Claim 4
Dependent Claim
22 words
A method according to claim 1, wherein a temperature rise speed in the temperature rise step is not less than 5° C./sec.
Claim 5
Dependent Claim
24 words
A method according to claim 1, wherein the workpiece is heated by radiation of an infrared ray lamp, halogen lamp or an electric heater.
Claim 6
Dependent Claim
16 words
A method according to claim 1, wherein said non-contact type temperature detecting means comprises a pyrometer.
Claim 7
Dependent Claim
16 words
A method according to claim 1, wherein said contact type temperature detecting means comprises a thermocouple.
Claim 8
Dependent Claim
31 words
A method according to claim 1, wherein said method comprises a method selected from the group consisting of evaporation, sputtering, thermal CVD, plasma etching, sputter etching, ozone ashing, and plasma ashing.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-04-02 | 1993-10-02 | 1994-04-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-04-02 | 1997-10-02 | 1998-04-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-04-02 | 2001-10-02 | 2002-04-03 | $7700.00 | Window Closed / Lapsed |