US4904569A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of forming pattern and projection aligner for carrying out the same
Assignee: Hitachi Ltd
•
Filing: 1988-01-15
•
Granted: 1990-02-27
•
Expires: 2008-01-15
Abstract
Abstract An area on a photoresist film which is formed on a substrate surface having a topography, is exposed a plurality of times in such a manner that the image plane of a mask pattern is formed at a plurality of positions which are spaced apart from a reference plane in the substrate in the direction of an optical axis, and then the photoresist film is developed to form a resist pattern. According to the above method, the effective focal depth of the projection aligner used is enhanced, and moreover the reduction of the image contrast at the photoresist film is made very small by the plural exposure operations. Accordingly, a fine pattern can be formed accurately on the substrate surface having the topography.
Inventors
- 👤 Hiroshi Fukuda
- 👤 Norio Hasegawa
- 👤 Toshihiko Tanaka
- 👤 Toshiei Kurosaki
- 👤 Saburo Nonogaki
- 👤 Yoshio Taniguchi
- 👤 Toshiharu Matsuzawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 13:08
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/7055; G03F7/70575; G03F7/20; G03F7/2022; G03F7/70216; G03F7/70241; G03F7/70325; G03F7/70333; G03F7/708; G03F7/70858
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
142 words
A method of forming a pattern comprising the steps of: exposing a desired portion of a photoresist film in accordance with a mask pattern by a reduction projection aligner to change the solubility of the exposed portion, the photoresist film being formed on a surface of a semiconductor substrate, the surface of the substrate having a topography, an exposure operation for exposing the desired portion of the photoresist film being performed in such a manner that a plurality of reduced images of the same mask pattern are formed at a plurality of different positions spaced apart from each other in the direction of the optical axis of the reduction projection aligner; and developing the photoresist film to form a pattern of the photoresist film; wherein the exposure operation is performed after a reversible transmission film has been formed on the photoresist film.
Claim 2
Independent Claim
142 words
A method of forming a pattern comprising the steps of: exposing a desired portion of a photoresist film in accordance with a mask pattern by a reduction projection aligner to change the solubility of the exposed portion, the photoresist film being formed on a surface of a semiconductor substrate, the surface of the substrate having a topography, an exposure operation for exposing the desired portion of the photoresist film being performed in such a manner that a plurality of reduced images of the same mask pattern are formed at a plurality of different positions spaced apart from each other in the direction of the optical axis of the reduction projection aligner; and developing the photoresist film to form a pattern of the photoresist film; wherein the exposure operation is performed after a reversible transmission film has been formed on the photoresist film.
Claim 3
Dependent Claim
44 words
A method of forming a pattern as claimed in claim 1, wherein the exposure operation is performed twice, and the second exposure operation is performed after the reversible transmission film which was subjected to the first exposure operation, has returned to an original state.
Claim 4
Dependent Claim
34 words
A method of forming a pattern as claimed in claim 1, wherein the reversible transmission film contains at least one coloring material selected from a group consisting of 4-dimethylamino-4'-nitroazobenzene, 3-methylamino-4-nitroazobenzene, 4-nitroazobenzene, 4-dimethylaminoazobenzene, and 3-methyl-4-dimethylamino-4'-nitroazobenzene.
Claim 5
Dependent Claim
57 words
A method of forming a pattern as claimed in claim 3, wherein the coloring material is dissolved in one solvent selected from a group consisting of a mixed solution of water and polyvinyl alcohol, a mixed solution of water and propanol, propanol, a mixed solution of methylcyclohexane and toluene, and a mixed solution of methylcyclopentane and methylcyclohexane.
Claim 6
Dependent Claim
27 words
A method of forming a pattern as claimed in claim 1, wherein the reversible transmission film is formed on the photoresist film by the spin coating method.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-02-26 | 1993-08-28 | 1994-02-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-02-26 | 1997-08-28 | 1998-02-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-02-26 | 2001-08-28 | 2002-02-27 | $7700.00 | Window Closed / Lapsed |