US4239790A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of defining a photoresist layer
Assignee: Intersil Corp
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Filing: 1979-09-12
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Granted: 1980-12-16
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Expires: 1999-09-12
Abstract
Abstract The method entails vibrating the wafer during the exposure of the photoresist in order to eliminate standing waves which occur in layers parallel to the surface of the photoresist layer and which cause alternately exposed and unexposed layers of the photoresist to be present.
Inventors
- 👤 Wolfram A. Bosenberg
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 18:11
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70358; G03F7/20; G03F7/2002; G03F7/201
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
72 words
A method for defining a photoresist layer comprising the steps of: (a) applying a photoresist layer onto a substrate; (b) vibrating said substrate, the vibratory motion being along a single axis; and (c) exposing said photoresist layer with light having an optical axis substantially parallel to said single axis, the wavelength of said light being selected to expose said photoresist layer, and the amplitude of said vibratory motion being approximately one wavelength.
Claim 2
Independent Claim
72 words
A method for defining a photoresist layer comprising the steps of: (a) applying a photoresist layer onto a substrate; (b) vibrating said substrate, the vibratory motion being along a single axis; and (c) exposing said photoresist layer with light having an optical axis substantially parallel to said single axis, the wavelength of said light being selected to expose said photoresist layer, and the amplitude of said vibratory motion being approximately one wavelength.
Claim 3
Dependent Claim
15 words
The method of claim 1 wherein said light has a wavelength in the ultraviolet range.
Claim 4
Dependent Claim
18 words
The method of claim 2 wherein said amplitude of vibratory motion is between about 0.5 and 2.0 micrometers.
Claim 5
Dependent Claim
19 words
The method of claim 1 wherein said photoresist layer is applied onto a substantially planar surface of said substrate.
Claim 6
Dependent Claim
16 words
The method of claim 4 wherein said single axis is normal to said substantially planar surface.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-12-16 | 1984-06-16 | 1984-12-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-12-16 | 1988-06-16 | 1988-12-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-12-16 | 1992-06-16 | 1992-12-16 | $7700.00 | Window Closed / Lapsed |