Fabrication of rectangular relief profiles in photoresist

Claim 2

In a master recording for use to form a stamper for embossing two of three subtractive primary colors in a single surface of a transparent plastic sheet in the fabrication of diffractive, subtractive filters, said master recording comprising a substrate supporting a developed photoresist layer which layer has a given maximum thickness; said layer defining a predetermined rectangular relief-profile diffractive structure, the improvement; wherein said diffractive structure comprises a first diffraction grating having a first given depth corresponding to a first of said two primary colors of zero-order diffraction light and a second diffraction grating having a second given depth different from said first given depth corresponding to a second of said two primary colors of zero-order diffraction light, said second diffraction grating being at least partly superimposed on said first diffraction grating, and wherein said given maximum thickness of said developed photoresist layer is equal to the sum of said first and second given depths and the thickness of said developed photoresist at any point on the master recording is equal to the sum of the depths of the superimposed diffraction gratings at that point.

Claim 3

In a method for making a master recording for use to form a stamper for embossing two of three subtractive primary colors in a single surface of a transparent plastic sheet in the fabrication of diffractive, subtractive filters, the improvement comprising the steps of: exposing the surface of a layer of photoresist of a preselected thickness supported by a substrate to a first given amount of light spatially distributed in a first pattern to provide, upon development of said photoresist, a first rectangular relief-profile diffraction grating having a first given depth corresponding to a first of said two primary colors of zero-order diffraction light, and then exposing the surface of said layer of photoresist to a second given amount of light spatially distributed in a second pattern which is at least partly superimposed on said first pattern to provide, upon development of said photoresist, a second rectangular relief-profile diffraction grating having a second given depth different from said first given depth corresponding to a second of said two primary colors of zero-order diffraction light, said preselected thickness having that value which results in the maximum thickness of said layer of photoresist after development being equal to the sum of said first and second depths and the thickness of said developed photoresist at any point on the master recording being equal to the sum of the depths of the superimposed diffraction gratings at that point.

Claim 4

In a method for making a master recording for use to form a stamper for embossing two of three subtractive primary colors in a single surface of a transparent plastic sheet in the fabrication of diffractive, subtractive filters, the improvement comprising the steps of: exposing the surface of a layer of photoresist of a preselected thickness supported by a substrate to a first given amount of light spatially distributed in a first pattern to provide, upon development of said photoresist, a first rectangular relief-profile diffraction grating having a first given depth corresponding to a first of said two primary colors of zero-order diffraction light, and then exposing the surface of said layer of photoresist to a second given amount of light spatially distributed in a second pattern which is at least partly superimposed on said first pattern to provide, upon development of said photoresist, a second rectangular relief-profile diffraction grating having a second given depth different from said first given depth corresponding to a second of said two primary colors of zero-order diffraction light, said preselected thickness having that value which results in the maximum thickness of said layer of photoresist after development being equal to the sum of said first and second depths and the thickness of said developed photoresist at any point on the master recording being equal to the sum of the depths of the superimposed diffraction gratings at that point.

Claim 5

The improved method defined in claim 2, comprising the step of developing said photoresist after said second-mentioned exposure thereof.

Claim 6

The improved method of claim 2, comprising the step of spin-coating said substrate with a layer of photoresist of said preselected thickness prior to said first-mentioned exposure thereof.

Claim 7

The improved method defined in claim 2, wherein each of said steps of exposure comprise the step of illuminating said layer through an amplitude diffraction grating means in contact with said layer with decollimated light lying within a dihedral angle having an axis parallel to a line of said amplitude diffraction grating means, said dihedral angle extending from a certain oblique angular value on one side of the normal to the surface of said layer to substantially said certain oblique angular value on the other side of the normal to the surface of said layer.

Claim 8

The improved method defined in claim 5, wherein the step of illuminating comprises the step of rotating an illuminating beam of light during exposure about an axis parallel to a line of said amplitude diffraction grating means from said certain oblique angular value on said one side to substantially said certain oblique angular value on said other side.