Abstract In contact type photolithographic masking processes for fabricating planar structures, a photoresist is applied to a wafer and a mask is placed over the photoresist. Illumination through the mask, which has a pattern of opaque areas, produces a photochemical reaction in the photoresist which upon developing creates a duplicate of the mask pattern. However, the photoresist is conventionally applied by a spinning process and the rotation produces a build-up of the photoresist around the edges of the wafer. This build-up prevents the pattern portion of the mask from making good physical contact with the photoresist with a resultant decrease in reproducibility and accuracy of the fabricated pattern. A modified mask is formed with a channel corresponding to the peripheral build-up. The channel accepts the build-up so that good contact may be maintained between the photoresist and the patterned portion of the mask.
A process for photolithographic printing of a planar structure on a substrate wafer comprising the steps of: applying a photoresist material onto the surface of the substrate wafer to form a relatively flat portion and a build-up at the periphery of the wafer, forming a mask having a desired pattern thereon, cutting in the mask a channel corresponding to the peripheral build-up of the photoresist, placing the mask in contact with the relatively flat portion of the photoresist, the build-up being positioned within the channel, exposing the photoresist to light through the mask to form a pattern in the photoresist, and removing portions of the wafer surface in accordance with the pattern in the photoresist.
Claim 2
Dependent Claim
115 words
A process for photolithographic printing of a planar structure on a substrate wafer comprising the steps of: applying a photoresist material onto the surface of the substrate wafer to form a relatively flat portion and a build-up at the periphery of the wafer, forming a mask having a desired pattern thereon, cutting in the mask a channel corresponding to the peripheral build-up of the photoresist, placing the mask in contact with the relatively flat portion of the photoresist, the build-up being positioned within the channel, exposing the photoresist to light through the mask to form a pattern in the photoresist, and removing portions of the wafer surface in accordance with the pattern in the photoresist.
Claim 3
Dependent Claim
48 words
A process in accordance with claim 1 wherein the desired pattern is formed on the mask by deposition of a material opaque at the frequency of the exposing light, and the step of cutting the channel in the mask includes mechanically grinding the mask to produce the channel.
Claim 4
Dependent Claim
26 words
A process in accordance with claim 2 wherein the desired pattern formed on the mask is formed on the mask by deposition of a metal oxide.
Claim 5
Dependent Claim
25 words
A process in accordance with claim 2 wherein the desired pattern formed on the mask is formed on the mask by deposition of a metal.
Claim 6
Dependent Claim
54 words
A process in accordance with claim 1 wherein the wafer surface is rectangular and the step of cutting a channel in the mask includes cutting a plurality of intersecting linear grooves to form the channel which defines a rectangle corresponding to the photoresist buildup at the periphery of the rectangular surface of the wafer.