Semiconductor device and manufacturing method thereof

Claim 2

A semiconductor device comprising: a semiconductor substrate having a region doped with impurity of an conductivity type differing from that of said semiconductor substrate, the impurity-doped region including a relatively deep portion intruding into the semiconductor substrate and a relatively shallow portion; an insulation layer having a window through which at least part of said relatively deep portion of said impurity-doped region is exposed; a silicide layer formed on said relatively deep portion of said impurity-doped region, the relatively deep portion and the silicide layer being substantially aligned with said window; and at least two electrodes each directly contacting said silicide layer, one of said electrodes being mainly formed of a same main component material as said semiconductor substrate.

Claim 3

A semiconductor device according to claim 1, wherein said semiconductor device includes an insulated gate field effect transistor (IGFET), said impurity-doped region constituting one of source/drain regions of said IGFET.

Claim 4

A semiconductor device according to claim 1, wherein said semiconductor device includes at least two IGFETs, and said one electrode is connected to a source/drain region of one of said IGFETs and serves as a gate electrode of the other IGFET.

Claim 5

A semiconductor device according to claim 1, wherein said semiconductor substrate is silicon, and said one of said at least two electrodes is formed of polycrystalline silicon.

Claim 6

A semiconductor device according to claim 1, wherein said silicide layer extends over substantially the whole surface of said impurity-doped region.

Claim 7

A semiconductor device according to claim 4, wherein said polycrystalline electrodes extend over only part of said silicide layer.

Claim 8

A semiconductor device according to claim 1, wherein said window exposes only a portion of said impurity-doped region.

Claim 9

A semiconductor device according to claim 1, wherein at least one of said at least two electrodes is formed of metal, and at least one of said at least two electrodes is formed of polycrystalline silicon.

Claim 10

A semiconductor device according to claim 1, wherein said silicide is selected from the group consisting of molybdenum, tungsten, titanium and tantalum.

Claim 11

A semiconductor device according to claim 7, wherein said silicide layer extends only in the area substantially equal to the area exposed in said window.

Claim 12

A semiconductor device comprising: a semiconductor substrate having a region doped with impurity of a conductivity type differing from that of said semiconductor substrate, the impurity-doped region including a relatively deep portion intruding into the semiconductor substrate and a relatively shallow portion; an insulation layer having a window through which at least part of said relatively deep portion of said impurity-doped region is exposed; a silicide layer formed on said relatively deep portion of said impurity-doped region, said relatively deep portion and said silicide layer having substantially a same shape, in plan view, as said window; and at least two electrodes each directly contacting said silicide layer, one of said electrodes being mainly formed of a same main component material as said semiconductor substrate, said electrodes having a low connection resistance in the interconnection therebetween and a low contact resistance in the contact between each of the electrodes and the impurity-doped region, as compared to the connection and contact resistances without a silicide layer between the at least two electrodes and the impurity-doped region.

Claim 13

A semiconductor device comprising: a semiconductor substrate having a region doped with impurity of a conductivity type differing from that of said semiconductor substrate, the impurity-doped region including a relatively deep portion intruding into the semiconductor substrate and a relatively shallow portion; an insulation layer having a window through which at least part of said relatively deep portion of said impurity-doped region is exposed; a silicide layer formed on said relatively deep portion of said impurity-doped region, said relatively deep portion and said silicide layer having substantially a same shape, in plan view, as said window; and at least two electrodes each directly contacting said silicide layer, one of said electrodes being mainly formed of a same main component material as said semiconductor substrate, said electrodes having a low connection resistance in the interconnection therebetween and a low contact resistance in the contact between each of the electrodes and the impurity-doped region, as compared to the connection and contact resistances without a silicide layer between the at least two electrodes and the impurity-doped region.

Claim 14

A semiconductor device according to claim 11, wherein said semiconductor device includes an insulated gate field effect transistor (IGFET), said impurity-doped region constituting one of source/drain regions of said IGFET.

Claim 15

A semiconductor device according to claim 11, wherein said semiconductor device includes at least two IGFETs, and said one electrode is connected to a source/drain region of one of said IGFETs and serves as a gate electrode of the other IGFET.

Claim 16

A semiconductor device according to claim 11, wherein said semiconductor substrate is silicon and said one of at least two electrodes is formed of polycrystalline silicon.

Claim 17

A semiconductor device according to claim 11, wherein said silicide layer extends over substantially the whole surface of said impurity-doped region.

Claim 18

A semiconductor device according to claim 14, wherein said polycrystalline electrodes extends over only part of said silicide layer.

Claim 19

A semiconductor device according to claim 11, wherein said window exposes only a portion of said impurity-doped region.

Claim 20

A semiconductor device according to claim 11, wherein at least one of said at least two electrodes is formed of metal, and at least one of said at least electrodes is formed of polycrystalline silicon.

Claim 21

A semiconductor device according to claim 11, wherein said silicide is selected from the group consisting of molybdenum, tungsten, titanium and tantalum.

Claim 22

A semiconductor device according to claim 17, wherein said silicide layer extends only in the area substantially equal to the area exposed in said window.

Claim 23

A semiconductor device according to claim 1, wherein each of the at least two electrodes directly contact the silicide only over the relatively deep portion of the impurity-doped region.

Claim 24

A semiconductor device according to claim 1, wherein the semiconductor device is a field effect transistor, the relatively shallow portion being a source or drain region of the field effect transistor, and the relatively deep portion being a portion for connection of the at least two electrodes to the source or drain region.

Claim 25

A semiconductor device according to claim 1, wherein the relatively deep portion is a portion for connection of the at least two electrodes to the impurity-doped region.