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US4896295A Expired / Lapsed US ⏱️ 0.0 years remaining

Eprom memory cell with two symmetrical half-cells and separate floating gates

Assignee: STMicroelectronics SRL
•
Filing: 1988-03-14
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Granted: 1990-01-23
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Expires: 2008-03-14
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Abstract

Abstract An EPROM memory cell including a source, a drain, a floating gate and a control gate with interposed dielectric oxide is made up of two symmetrical half-cells having the drain and the control gate in common, the sources physically separated but electrically connected with each other and the floating gates separated physically and electrically.

Inventors

  • 👤 Giuseppe Corda

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 15:35
CPC Classifications
G; G11; G11C; G11C16/00; G11C16/02; G11C16/04; G11C16/0408; G11C16/0441; H; H10; H10B; H10B69/00; H10D; H10D30/00; H10D30/60; H10D30/68; H10D30/681

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 138 words
An EPROM memory cell matrix comprising a silicon substrate; a plurality of parallel drain lines formed on said substrate; a plurality of parallel source lines formed on said substrate and alternating with said drain lines; floating gate areas spanning said drain lines and source lines; a plurality of parallel control gate lines arranged perpendicularly to said drain and source lines and superimposed on and self-aligned with said floating gate areas; and oxide areas electrically separating said drain lines, said source lines, said floating gate areas, and said control gate lines; wherein all of said source lines are electrically connected together so that each cell of said matrix comprises two symmetrical half-cells having a drain and a control gate in common, with respective sources being separated physically but connected electrically and respective floating gates being separated physically and electrically.
Claim 2
Dependent Claim 138 words
An EPROM memory cell matrix comprising a silicon substrate; a plurality of parallel drain lines formed on said substrate; a plurality of parallel source lines formed on said substrate and alternating with said drain lines; floating gate areas spanning said drain lines and source lines; a plurality of parallel control gate lines arranged perpendicularly to said drain and source lines and superimposed on and self-aligned with said floating gate areas; and oxide areas electrically separating said drain lines, said source lines, said floating gate areas, and said control gate lines; wherein all of said source lines are electrically connected together so that each cell of said matrix comprises two symmetrical half-cells having a drain and a control gate in common, with respective sources being separated physically but connected electrically and respective floating gates being separated physically and electrically.
Claim 3
Dependent Claim 25 words
The memory cell matrix in accordance with claim 1 wherein said source lines, drain lines, and control gate lines are equally spaced from each other.

References Cited (Backward Citations)

US4355375A Cited
US4639893A Cited
US4792925A Cited
US4774202A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1993-01-22 1993-07-24 1994-01-23 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1997-01-22 1997-07-24 1998-01-23 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2001-01-22 2001-07-24 2002-01-23 $7700.00 Window Closed / Lapsed

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