Internal reactor for chemical vapor deposition

Claim 2

A chemical vapor deposition reactor comprising means for enclosing a reaction chamber, means for heating the reaction chamber, and at least one internal reactor disposed within the enclosing means, the internal reactor comprising: first containing means for containing a first solid precursor material; second containing means disposed within the first containing means for containing a second solid precursor material; first gas inlet means for directing at least one precursor gas, reactive with the solid precursor materials to produce at least two first reactant gases, from a source outside the enclosing means to both the first and second containing means; and gas outlet means to allow the at least two first reactant gases to flow from the first and second containing means to react with one or more additional reactants in the reactant chamber; wherein the relative positions of the first and second containing means and the heating means are selected to permit reaction temperatures both within the reaction chamber and within the first and second containing means suitable for reactions occurring therein.

Claim 3

A chemical vapor deposition reactor comprising: means for enclosing a reaction chamber; means for heating the reaction chamber; an internal reactor disposed within the enclosing means and comprising: first containing means for containing a first solid precursor material; second containing means within the first containing means for containing a second solid precursor material; first gas inlet means for directing at least one precursor gas, reactive with the solid precursor materials to produce at least two first reactant gases, from a source outside the enclosing means to both the first and second containing means; and first gas outlet means to allow the at least two first reactant gases to flow from both the first and second containing means into the reaction chamber; second gas inlet means for directing at least one second reactant gas from a source outside the enclosing means into the reaction chamber to react with the first reactant gases; and second gas outlet means to permit discharge of gases from the reaction chamber; wherein the relative positions of the containing means and the heating means are selected to permit reaction temperatures both within the reaction chamber and within the containing means suitable for reactions occurring therein.

Claim 4

A chemical vapor deposition reactor comprising: means for enclosing a reaction chamber; means for heating the reaction chamber; an internal reactor disposed within the enclosing means and comprising: first containing means for containing a first solid precursor material; second containing means within the first containing means for containing a second solid precursor material; first gas inlet means for directing at least one precursor gas, reactive with the solid precursor materials to produce at least two first reactant gases, from a source outside the enclosing means to both the first and second containing means; and first gas outlet means to allow the at least two first reactant gases to flow from both the first and second containing means into the reaction chamber; second gas inlet means for directing at least one second reactant gas from a source outside the enclosing means into the reaction chamber to react with the first reactant gases; and second gas outlet means to permit discharge of gases from the reaction chamber; wherein the relative positions of the containing means and the heating means are selected to permit reaction temperatures both within the reaction chamber and within the containing means suitable for reactions occurring therein.

Claim 5

A reactor in accordance with claim 2 wherein the first gas outlet means operationally communicates with the second gas inlet means for flow of the at least two first reactant gases and the at least one second reactant gas into the reaction chamber.

Claim 6

A reactor in accordance with claim 3 wherein the first gas outlet means and the second gas inlet means each comprise a tube, the smaller of the tubes being disposed within the larger of the tubes.

Claim 7

A reactor in accordance with claim 4 wherein the tubes are coaxially disposed, and the larger of the tubes extends downstream a sufficient length beyond the smaller of the tubes to provide at least some mixing of the at least two first reactant gases and the at least one second reactant gas within the larger of the tubes.

Claim 8

A reactor in accordance with claim 5 further comprising gas distributor means covering the downstream end of the larger of the tubes.

Claim 9

An internal reactor to produce at least two first reactant gases for a chemical vapor deposition reaction within a reaction chamber of a chemical vapor deposition reactor comprising means for enclosing the reaction chamber and means for heating the reaction chamber, the internal reactor comprising: first containing means for containing a first solid precursor material; second containing means disposed within the first containing means for containing a second solid precursor material; gas inlet means for directing at least one precursor gas, reactive with the solid precursor materials to produce the first reactant gases, from a source outside the enclosing means to both the first and second containing means; and gas outlet means to allow the first reactant gases to flow from the first and second containing means to react with at least one second reactant in the reactant chamber; wherein the internal reactor is positionable within the enclosing means at a position relative to the heating means selected to permit temperature control within the first and second containing means at a level suitable for production of the first reactant gases.

Claim 10

An internal reactor to produce at least two first reactant gases for a chemical vapor deposition reaction within a reaction chamber of a chemical vapor deposition reactor comprising means for enclosing the reaction chamber and means for heating the reaction chamber, the internal reactor comprising: first containing means for containing a first solid precursor material; second containing means disposed within the first containing means for containing a second solid precursor material; gas inlet means for directing at least one precursor gas, reactive with the solid precursor materials to produce the first reactant gases, from a source outside the enclosing means to both the first and second containing means; and gas outlet means to allow the first reactant gases to flow from the first and second containing means to react with at least one second reactant in the reactant chamber; wherein the internal reactor is positionable within the enclosing means at a position relative to the heating means selected to permit temperature control within the first and second containing means at a level suitable for production of the first reactant gases.

Claim 11

An internal reactor in accordance with claim 7, wherein the gas outlet means operationally communicates with a second gas inlet means arranged to direct the at least one second reactant in gaseous form from a source outside the reactor to the reaction chamber, for flow of the at least two first reactant gases into the reaction chamber.

Claim 12

An internal reactor in accordance with claim 7, further comprising gas distributor means upstream of the solid precursor material.

Claim 13

An internal reactor in accordance with claim 7, further comprising screening means downstream of the solid precursor materials to contain the solid precursor materials within the first and second containing means while permitting gas flow therefrom.

Claim 14

An internal reactor in accordance with claim 9, further comprising: screening means downstream of the solid precursor materials to contain the solid precursor materials within the first and second containing means while permitting gas flow therefrom; and a sleeve extending at least from the gas distributor means to the screening means to isolate the first and second containing means from the solid precursor materials, and formed from a materials selected to perform at least one of the functions of protection of the first and second containing means from chemical attack and further control of the temperature within the first and second containing means.