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US4609562A Expired / Lapsed US ⏱️ 0.0 years remaining

Apparatus and method for depositing coating onto porous substrate

Assignee: Siemens Energy Inc
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Filing: 1984-12-20
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Granted: 1986-09-02
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Expires: 2004-12-20
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Abstract

Abstract Disclosed is an apparatus for forming a chemically vapor deposited coating on a porous substrate where oxygen from a first gaseous reactant containing a source of oxygen permeates through the pores of the substrate to react with a second gaseous reactant that is present on the other side of the substrate. The apparatus includes means for controlling the pressure and flow rate of each gaseous reactant, a manometer for measuring the difference in pressure between the gaseous reactants on each side of the substrate, and means for changing the difference in pressure between the gaseous reactants. Also disclosed is a method of detecting and closing cracks in the coating by reducing the pressure difference between the two gaseous reactants whenever the pressure difference falls suddenly after gradually rising, then again increasing the pressure difference on the two gases. The attack by the by-products of the reaction on the substrate are reduced by maintaining the flow rate of the first reactant through the pores of the substrate.

Inventors

  • 👤 Arnold O. Isenberg
  • 👤 Gregory E. Zymboly

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 21:31
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C04; C04B; C04B41/00; C04B41/45; C04B41/50; C04B41/5025; C23C16/22; C23C16/30; C23C16/40; C23C16/405; C23C16/52; H; H01; H01M; H01M8/00; H01M8/10; H01M8/12; H01M8/124; H01M8/1246; H01M8/1253; Y; Y02; Y02E; Y02E60/00; Y02E60/30; Y02E60/50; Y02P; Y02P70/00; Y02P70/50

Claims Analysis

Total Claims: 19
Claim 1
Independent Claim 151 words
In an apparatus for forming a chemically and electrochemically vapor deposited coating on a porous substrate where oxygen from a first gaseous reactant containing a source of oxygen permeates through the pores of said substrate to react with a second metal halide gaseous reactant that is present on the other side of said substrate, forming a metal oxide coating on said substrate, the improvement which comprises (1) means for controlling the pressure and flow rate of at least one gaseous reactant; (2) a manometer for measuring the difference in pressure between said gaseous reactants; (3) conduit means connecting one side of said manometer to said first gaseous reactant on one side of said porous substrate; (4) conduit means connecting the other side of said manometer to said second gaseous reactant on said other side of said porous substrate; and (5) means for changing said difference in pressure between said gaseous reactants.
Claim 2
Dependent Claim 151 words
In an apparatus for forming a chemically and electrochemically vapor deposited coating on a porous substrate where oxygen from a first gaseous reactant containing a source of oxygen permeates through the pores of said substrate to react with a second metal halide gaseous reactant that is present on the other side of said substrate, forming a metal oxide coating on said substrate, the improvement which comprises (1) means for controlling the pressure and flow rate of at least one gaseous reactant; (2) a manometer for measuring the difference in pressure between said gaseous reactants; (3) conduit means connecting one side of said manometer to said first gaseous reactant on one side of said porous substrate; (4) conduit means connecting the other side of said manometer to said second gaseous reactant on said other side of said porous substrate; and (5) means for changing said difference in pressure between said gaseous reactants.
Claim 3
Dependent Claim 12 words
An apparatus according to claim 1 wherein said coating is stabilized zirconia.
Claim 4
Dependent Claim 37 words
An apparatus according to claim 2 wherein said first gaseous reactant is selected from the group consisting of water, carbon dioxide, oxygen, and mixtures thereof, and said second gaseous reactant comprises zirconium chloride doped with yttrium chloride.
Claim 5
Dependent Claim 45 words
An apparatus according to claim 2 wherein said first gaseous reactant is selected from the group consisting of water, oxygen, carbon dioxide, and mixtures thereof, said second gaseous reactant is selected from the group consisting of lanthanum chloride, chromous chloride, chromic chloride, and magnesium chloride.
Claim 6
Dependent Claim 16 words
An apparatus according to claim 1 wherein said substrate is a tube closed at one end.
Claim 7
Dependent Claim 50 words
An apparatus according to claim 5 wherein said means for controlling said pressure and flow rate are a seal at the open end of said tube having apertures for admitting said first gaseous reactant, and an enclosure surrounding said tube having means for admitting and releasing said second gaseous reactant.
Claim 8
Dependent Claim 43 words
An apparatus according to claim 1 wherein said means for changing said difference in pressure between said gaseous reactants is a conduit connecting said two sides of said substrate and a valve which controls the flow of said first reactant through said conduit.
Claim 9
Dependent Claim 34 words
An apparatus according to claim 1 wherein said first and second gaseous reactants are diluted with an inert carrier gas at a volume ratio of about 1 to 0.1 to about 1 to 10.
Claim 10
Dependent Claim 24 words
An apparatus according to claim 8 wherein said inert carrier gas is selected from the group consisting of argon, helium, nitrogen, and mixtures thereof.
Claim 11
Dependent Claim 19 words
An apparatus according to claim 1 including means for controlling the pressure and flow rate of each gaseous reactant.
Claim 12
Independent Claim 162 words
An apparatus for forming a chemically and electrochemically vapor deposited coating on a porous substrate comprising (1) a sealed enclosure for said substrate; (2) means for sealing one side of said substrate from the other; (3) means for passing a first gaseous reactant containing a source of oxygen over one side of said substrate; (4) means for controlling the pressure and flow rate of said first gaseous reactant over said one side; (5) means for passing a second gaseous reactant over the other side of said substrate; (6) means for controlling the pressure and flow rate of said second gaseous reactant over said other side; (7) conduit means between said one side of said substrate and said other side of said substrate; (8) means for controlling the flow of said first gaseous reactant through said conduit means; and (9) manometer means in said conduit means for measuring the difference in pressure between said one side of said substrate and said other side.
Claim 13
Independent Claim 162 words
An apparatus for forming a chemically and electrochemically vapor deposited coating on a porous substrate comprising (1) a sealed enclosure for said substrate; (2) means for sealing one side of said substrate from the other; (3) means for passing a first gaseous reactant containing a source of oxygen over one side of said substrate; (4) means for controlling the pressure and flow rate of said first gaseous reactant over said one side; (5) means for passing a second gaseous reactant over the other side of said substrate; (6) means for controlling the pressure and flow rate of said second gaseous reactant over said other side; (7) conduit means between said one side of said substrate and said other side of said substrate; (8) means for controlling the flow of said first gaseous reactant through said conduit means; and (9) manometer means in said conduit means for measuring the difference in pressure between said one side of said substrate and said other side.
Claim 14
Dependent Claim 138 words
In a chemical and electrochemical vapor deposition process for forming a ceramic coating on a ceramic substrate wherein a first gaseous reactant on one side of said substrate permeates through pores in said substrate and reacts with a second gaseous reactant that is present on the other side of said substrate, closing said pores by forming said ceramic coating on said other side, a method of detecting the presence of breaks in said ceramic coating and of closing them, comprising (A) measuring the difference in pressure between said gaseous reactants on each side of said substrate; (B) maintaining a higher pressure on said first gaseous reactant than on said second gaseous reactant; and (C) when said measurement of the difference in pressure increases then decreases, reducing then increasing the difference between the pressures on said two gaseous reactants.
Claim 15
Dependent Claim 138 words
In a chemical and electrochemical vapor deposition process for forming a ceramic coating on a ceramic substrate wherein a first gaseous reactant on one side of said substrate permeates through pores in said substrate and reacts with a second gaseous reactant that is present on the other side of said substrate, closing said pores by forming said ceramic coating on said other side, a method of detecting the presence of breaks in said ceramic coating and of closing them, comprising (A) measuring the difference in pressure between said gaseous reactants on each side of said substrate; (B) maintaining a higher pressure on said first gaseous reactant than on said second gaseous reactant; and (C) when said measurement of the difference in pressure increases then decreases, reducing then increasing the difference between the pressures on said two gaseous reactants.
Claim 16
Dependent Claim 93 words
In a chemical and electrochemical vapor deposition process for forming a ceramic coating on a ceramic substrate wherein a first gaseous reactant on one side of said substrate passes through pores in said substrate and reacts with a second gaseous reactant that is present on the other side of said substrate to form said ceramic coating and by-products which damage said substrate, a method of reducing the damage to said substrate from said by-products comprising maintaining a pressure difference of said first reactant across said pores of at least 0.1 mm of Hg.
Claim 17
Dependent Claim 93 words
In a chemical and electrochemical vapor deposition process for forming a ceramic coating on a ceramic substrate wherein a first gaseous reactant on one side of said substrate passes through pores in said substrate and reacts with a second gaseous reactant that is present on the other side of said substrate to form said ceramic coating and by-products which damage said substrate, a method of reducing the damage to said substrate from said by-products comprising maintaining a pressure difference of said first reactant across said pores of at least 0.1 mm of Hg.
Claim 18
Dependent Claim 104 words
In a chemical and electrochemical vapor deposition process for forming a ceramic coating on a porous substrate at elevated temperatures wherein a first gaseous reactant which includes a source of oxygen on one side of said substrate passes through pores in said substrate and reacts with a second gaseous substrate that is present on the other side of said substrate to form said ceramic coating, a method of preventing said porous substrate from cracking when said substrate is cooled, comprising maintaining a partial pressure of oxygen on said first gaseous reactant as said substrate is cooled of at least about 1 mm of Hg.
Claim 19
Dependent Claim 104 words
In a chemical and electrochemical vapor deposition process for forming a ceramic coating on a porous substrate at elevated temperatures wherein a first gaseous reactant which includes a source of oxygen on one side of said substrate passes through pores in said substrate and reacts with a second gaseous substrate that is present on the other side of said substrate to form said ceramic coating, a method of preventing said porous substrate from cracking when said substrate is cooled, comprising maintaining a partial pressure of oxygen on said first gaseous reactant as said substrate is cooled of at least about 1 mm of Hg.

References Cited (Backward Citations)

US4154192A Cited
US4287224A Cited
US4371587A Cited
US4487787A Cited
US4374163A Cited
US4501777A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1989-09-01 1990-03-03 1990-09-02 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1993-09-01 1994-03-03 1994-09-02 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1997-09-01 1998-03-03 1998-09-02 $7700.00 Window Closed / Lapsed

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