US4889827A
Expired / Lapsed
US
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Method for the manufacture of a MESFET comprising self aligned gate
Assignee: TRIQUENT HUNGARY HOLDING Ltd
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Filing: 1988-09-22
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Granted: 1989-12-26
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Expires: 2008-09-22
Abstract
Abstract A method for the manufacture of a MESFET comprising a gate that is self-aligned both with respect to the source and drain regions as well as with respect to the appertaining metallizations, whereby a first metal layer (21), a first dielectric layer (31), and a first lacquer mask layer are applied following doping of the carrier substrate. A trench producing an outer recess in the doping layer (11) is formed by anisotropic etching. A second dielectric layer is isotropically deposited and is anisotropically re-etched except for spacers (51/52) whereby an inner recess (double recess) is produced in the doping layer and, finally, the gate metal (22) is applied.
Inventors
- 👤 Josef Willer
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 17:51
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/01; H10D30/061; H10D30/0612; H10D64/00; H10D64/01; H10D64/012; H10D64/0124; H10D64/0125; Y; Y10; Y10S; Y10S148/00; Y10S148/139; Y10S148/14; Y10S148/168
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
258 words
A method for the manufacture of a MESFET having a self-aligned gate comprising a substrate of semiconductor material, a first metal layer, a second metal layer as a gate metal, a first dielectric layer, a first spacer, and a second spacer, employing implantation technique, curing process, mask technique, anisotropic etching technique, and lift-off technique, the method including the steps of: forming a doping layer with selective implantation and subsequent curing at the surface of the substrate; a first metal layer, composed of a metal employable for ohmic contact, is applied surface-wide on said doping layer; a first dielectric layer is applied on the metal layer; a first lacquer mask layer is applied on the dielectric layer; a trench is etched out with anisotropic etching in the region left free by the first lacquer mask layer, the trench being etched out through the first dielectric layer and through the first metal layer down into the doping layer of the substrate so that an outer recess of the substrate surface derives in this doping layer; the trench is etched to such a depth into the doping layer of the substrate that, taking the doping profile of the doping layer into consideration, the prescribed minimum breakdown voltage for the gate to be manufactured is assured; a second dielectric layer is applied with isotropic deposition onto a surface structured in the recited way; the second dielectric layer is etched away with anisotropic etching except for a first spacer and a second spacer; and a second metal layer is applied as gate metal.
Claim 2
Independent Claim
258 words
A method for the manufacture of a MESFET having a self-aligned gate comprising a substrate of semiconductor material, a first metal layer, a second metal layer as a gate metal, a first dielectric layer, a first spacer, and a second spacer, employing implantation technique, curing process, mask technique, anisotropic etching technique, and lift-off technique, the method including the steps of: forming a doping layer with selective implantation and subsequent curing at the surface of the substrate; a first metal layer, composed of a metal employable for ohmic contact, is applied surface-wide on said doping layer; a first dielectric layer is applied on the metal layer; a first lacquer mask layer is applied on the dielectric layer; a trench is etched out with anisotropic etching in the region left free by the first lacquer mask layer, the trench being etched out through the first dielectric layer and through the first metal layer down into the doping layer of the substrate so that an outer recess of the substrate surface derives in this doping layer; the trench is etched to such a depth into the doping layer of the substrate that, taking the doping profile of the doping layer into consideration, the prescribed minimum breakdown voltage for the gate to be manufactured is assured; a second dielectric layer is applied with isotropic deposition onto a surface structured in the recited way; the second dielectric layer is etched away with anisotropic etching except for a first spacer and a second spacer; and a second metal layer is applied as gate metal.
Claim 3
Dependent Claim
20 words
The method of claim 1 wherein the second metal layer is initially applied surface-wide and is subsequently structured by etching.
Claim 4
Dependent Claim
85 words
The method of claim 1 wherein the gate metal is applied with lift-off technique in such a fashion that: a second lacquer mask layer is first applied; a second metal layer is applied by directed deposition, whereby a first portion of the second metal layer forms the gate metallization and a second portion of the second metal layer is situated on the second lacquer mask layer; and the second portion of the second metal layer is lifted off together with the second lacquer mask layer.
Claim 5
Dependent Claim
13 words
The method of claim 1 wherein the substrate is a III-V semiconductor material.
Claim 6
Dependent Claim
13 words
The method of claim 1 wherein silicon dioxide is deposited as a dielectric.
Claim 7
Dependent Claim
10 words
The method of claim 1 wherein the substrate is GaAs.
Claim 8
Dependent Claim
29 words
The method of claim 1 wherein lattice damages that may have arisen in the semiconductor material are cured by additional tempering steps before the deposition of the gate metal.
Claim 9
Dependent Claim
52 words
The method of claim 1 wherein following the anisotropic etching of the second dielectric layer the doping layer of the substrate is etched deeper between the first and second spacers for setting the threshold voltage of the transistor, so that an inner recess of the substrate surface derives in the doping layer.
Claim 10
Dependent Claim
13 words
The method of claim 3 wherein the substrate is a III-V semiconductor material.
Claim 11
Dependent Claim
13 words
The method of claim 3 wherein silicon dioxide is deposited as a dielectric.
Claim 12
Dependent Claim
10 words
The method of claim 3 wherein the substrate is GaAs.
Claim 13
Dependent Claim
29 words
The method of claim 3 wherein lattice damages that may have arisen in the semiconductor material are cured by additional tempering steps before the deposition of the gate metal.
Claim 14
Dependent Claim
52 words
The method of claim 3 wherein following the anisotropic etching of the second dielectric layer the doping layer of the substrate is etched deeper between the first and second spacers for setting the threshold voltage of the transistor, so that an inner recess of the substrate surface derives in the doping layer.
Claim 15
Independent Claim
201 words
A method for the manufacture of a MESFET having a self-aligned gate comprising the steps of: forming a doping layer with selective implantation and subsequent curing at a surface of a semiconductor material substrate; a first metal layer, composed of a metal employable for ohmic contact, is applied surface-wide on said doping layer; a first dielectric layer is applied on the metal layer; a first lacquer mask layer is applied on the dielectric layer; a trench is etched out with anisotropic etching in a region that does not include the first lacquer mask layer, the trench being etched out through the first dielectric layer and through the first metal layer down into the doping layer of the substrate creating an outer recess of the substrate in the doping layer; the trench is etched to such a depth into the doping layer of the substrate that a prescribed minimum breakdown voltage for the gate to be manufactured is assured; a second dielectric layer is applied with isotropic deposition onto a so structured surface; the second dielectric layer is etched away with anisotropic etching except for a first spacer and a second spacer; and a second metal layer is applied as gate metal.
Claim 16
Independent Claim
201 words
A method for the manufacture of a MESFET having a self-aligned gate comprising the steps of: forming a doping layer with selective implantation and subsequent curing at a surface of a semiconductor material substrate; a first metal layer, composed of a metal employable for ohmic contact, is applied surface-wide on said doping layer; a first dielectric layer is applied on the metal layer; a first lacquer mask layer is applied on the dielectric layer; a trench is etched out with anisotropic etching in a region that does not include the first lacquer mask layer, the trench being etched out through the first dielectric layer and through the first metal layer down into the doping layer of the substrate creating an outer recess of the substrate in the doping layer; the trench is etched to such a depth into the doping layer of the substrate that a prescribed minimum breakdown voltage for the gate to be manufactured is assured; a second dielectric layer is applied with isotropic deposition onto a so structured surface; the second dielectric layer is etched away with anisotropic etching except for a first spacer and a second spacer; and a second metal layer is applied as gate metal.
Claim 17
Dependent Claim
20 words
The method of claim 14 wherein the second metal layer is initially applied surface-wide and is subsequently structured by etching.
Claim 18
Dependent Claim
85 words
The method of claim 14 wherein the gate metal is applied with lift-off technique in such a fashion that: a second lacquer mask layer is first applied; a second metal layer is applied by directed deposition, whereby a first portion of the second metal layer forms the gate metallization and a second portion of the second metal layer is situated on the second lacquer mask layer; and the second portion of the second metal layer is lifted off together with the second lacquer mask layer.
Claim 19
Dependent Claim
13 words
The method of claim 14 wherein the substrate is a III-V semiconductor material.
Claim 20
Dependent Claim
13 words
The method of claim 14 wherein silicon dioxide is deposited as a dielectric.
Claim 21
Dependent Claim
29 words
The method of claim 14 wherein lattice damages that may have arisen in the semiconductor material are cured by additional tempering steps before the deposition of the gate metal.
Claim 22
Dependent Claim
52 words
The method of claim 14 wherein following the anisotropic etching of the second dielectric layer the doping layer of the substrate is etched deeper between the first and second spacers for setting the threshold voltage of the transistor, so that an inner recess of the substrate surface derives in the doping layer.
References Cited (Backward Citations)
JPS5376771A
Cited
JPS57145377A
Cited
US4551905A
Cited
US4472872A
Cited
JPS6199380A
Cited
US4616400A
Cited
EP0237826A2
Cited
US4774206A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-12-25 | 1993-06-26 | 1993-12-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-12-25 | 1997-06-26 | 1997-12-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-12-25 | 2001-06-26 | 2001-12-26 | $7700.00 | Window Closed / Lapsed |