Patent US4885055A successfully refreshed from Google Patents.
US4885055A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Layered devices having surface curvature and method of constructing same
Assignee: Brigham Young University
•
Filing: 1987-08-21
•
Granted: 1989-12-05
•
Expires: 2007-08-21
Abstract
Abstract A method of treating a substrate having first and second sides with corresponding oppositely facing first and second surfaces, to produce curvature in the first surface. The method includes the steps of removing material, according to a predetermined pattern, from the second side of the substrate, and applying a stress-producing film of material to at least one surface of the substrate to thereby cause the substrate to bend to produce the desired curvature in the first surface.
Inventors
- 👤 Richard C. Woodbury
- 👤 Raymond T. Perkins
- 👤 James M. Thorne
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 06:28
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/0005; G02; G02B; G02B3/00; G02B5/00; G02B5/08; G02B5/10
Claims Analysis
Total Claims: 31
Claim 1
Independent Claim
79 words
A method of treating a substrate having first and second sides with corresponding oppositely facing first and second surfaces, to produce curvature in the first surface, said method including the steps of: (a) removing material, according to a preselected pattern, from the second side of the substrate; and (b) applying a stress-producing film of material to at least one surface of the substrate to thereby cause the substrate to bend to produce the desired curvature in the first surface.
Claim 2
Independent Claim
79 words
A method of treating a substrate having first and second sides with corresponding oppositely facing first and second surfaces, to produce curvature in the first surface, said method including the steps of: (a) removing material, according to a preselected pattern, from the second side of the substrate; and (b) applying a stress-producing film of material to at least one surface of the substrate to thereby cause the substrate to bend to produce the desired curvature in the first surface.
Claim 3
Dependent Claim
28 words
A method as in claim 1 wherein step (a) comprises etching material from the second side of the substrate using a mask prepared to define the desired pattern.
Claim 4
Dependent Claim
21 words
A method as in claim 1 wherein step (a) comprises abraiding the second side of the substrate to remove the material.
Claim 5
Dependent Claim
21 words
A method as in claim 1 wherein step (a) comprises removing material to form a patterned monolith of the remaining material.
Claim 6
Dependent Claim
25 words
A method as in claim 4 wherein step (a) comprises removing material from said second side to form a series of generally parallel, side-by-side grooves.
Claim 7
Dependent Claim
29 words
A method as in claim 5 for producing a concave curvature on said first surface, wherein step (b) comprises applying a tensile stress producing material to said first surface.
Claim 8
Dependent Claim
20 words
A method as in claim 6 wherein said material is silicon nitride and wherein said substrate is a silicon wafer.
Claim 9
Dependent Claim
29 words
A method as in claim 5 for producing a concave curvature on said first surface, wherein step (b) comprises applying a compressive stress producing material to said second surface.
Claim 10
Dependent Claim
20 words
A method as in claim 8 wherein said material is silicon dioxide and wherein said substrate is a silicon wafer.
Claim 11
Dependent Claim
29 words
A method as in claim 5 for producing a convex curvature on said first surface, wherein step (b) comprises applying a compressive stress producing material to said first surface.
Claim 12
Dependent Claim
29 words
A method as in claim 5 for producing a convex curvature on said first surface, wherein step (b) comprises applying a tensile stress producing material to said second surface.
Claim 13
Dependent Claim
37 words
A method as in claim 5 for producing a concave curvature on said first surface, wherein step (b) comprises applying a tensile stress-producing material to said first surface and compressive stress producing material to said second surface.
Claim 14
Dependent Claim
37 words
A method as in claim 5 for producing a convex curvature on said first surface, wherein step (b) comprises applying a tensile stress-producing material to said second surface and a compressive stress-producing material to said first surface.
Claim 15
Dependent Claim
18 words
A method as in claim 5 further comprising the step of filling the grooves with a potting material.
Claim 16
Dependent Claim
14 words
A method as in claim 14 wherein said potting material is a polymeric adhesive.
Claim 17
Dependent Claim
37 words
A method as in claim 5 wherein said substrate is a crystalline material, and wherein step (a) comprises etching the second side of the substrate generally along the traces of the [111] planes on said second surface.
Claim 18
Dependent Claim
15 words
A method as in claim 1 wherein said substrate is composed of a single crystal.
Claim 19
Dependent Claim
13 words
A method as in claim 17 wherein said substrate is a silicon wafer.
Claim 20
Dependent Claim
13 words
A method as in claim 17 wherein said substrate is a germanium wafer.
Claim 21
Dependent Claim
15 words
A method as in claim 1 wherein said substrate is composed of an amorphous material.
Claim 22
Dependent Claim
12 words
A method as in claim 20 wherein said amorphous material is glass.
Claim 23
Dependent Claim
14 words
A method as in claim 20 wherein said amorphous material is a photoresist material.
Claim 24
Dependent Claim
15 words
A method as in claim 1 further including the step of polishing said first surface.
Claim 25
Dependent Claim
21 words
A method as in claim 1 further including the step of applying a film of reflective material to said first surface.
Claim 26
Dependent Claim
18 words
A method as in claim 1 further including the step of applying multiple layers of x-ray reflective materials.
Claim 27
Dependent Claim
38 words
A method as in claim 1 wherein the substrate is composed of a single crystal and is bent to produce a curvature in the first surface sufficient to enable use of the substrate as a Bragg angle diffractor.
Claim 28
Independent Claim
79 words
A method of producing curvature on a working surface of a substrate having said working surface and another oppositely facing surface, said method including the steps of: (a) coating at least the working surface of the substrate with a stress-producing film of material; and (b) removing substrate material in a predetermined pattern from a side of the substrate opposite the working surface to allow the film to bend the substrate and cause the desired curvature of the working surface.
Claim 29
Independent Claim
79 words
A method of producing curvature on a working surface of a substrate having said working surface and another oppositely facing surface, said method including the steps of: (a) coating at least the working surface of the substrate with a stress-producing film of material; and (b) removing substrate material in a predetermined pattern from a side of the substrate opposite the working surface to allow the film to bend the substrate and cause the desired curvature of the working surface.
Claim 30
Dependent Claim
20 words
A method as in claim 27 wherein step (b) comprises etching material from the substrate according to a mask pattern.
Claim 31
Dependent Claim
83 words
A method as in claim 28 wherein step (a) comprises coating both of said surfaces of the substrate with a stress-producing, etchant-resistant film of material, and wherein step (b) comprises: applying a photoresist film to said opposite side; removing portions of the photoresist film defined by the mask pattern; removing from said opposite side of the substrate said etchant-resistant film of material not covered by the remaining photoresist film; and etching material from the substrate not covered by said etchant-resistant film of material.
References Cited (Backward Citations)
US3772102A
Cited
US3904274A
Cited
US4155631A
Cited
US4299445A
Cited
US4298247A
Cited
JPS5844710A
Cited
US4714668A
Cited
US4426440A
Cited
US4524127A
Cited
JPS6021525A
Cited
US4598039A
Cited
US4724043A
Cited
US4684565A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-12-04 | 1993-06-05 | 1993-12-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-12-04 | 1997-06-05 | 1997-12-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-12-04 | 2001-06-05 | 2001-12-05 | $7700.00 | Window Closed / Lapsed |