Electron-beam exposure apparatus

Claim 1

An electron-beam exposure apparatus for exposing a substrate by an electron-beam in which beam position data in an X-axis direction and in a Y-axis direction which are supplied from a pattern data storing means or a pattern data generating means, are applied to an electron-beam deflection means (21, 22) after digital-to-analog conversion, comprising: means (33) for removing correction data which can be expressed as a cubic function, correction data storing means (10) for storing correction data other than data which can be expressed by a cubic function, adding means (17, 18) for adding the correction data from the correction data storing means to beam position data in both the X- and Y-axis directions; digital-to-analog converting means (19, 20) for subjecting output signals from the adding means to digital-to-analog conversion; and an analog arithmetic operation means (35) for subjecting outputs from the digital-to-analog converting means to analog correction based on either a deflection correction control signal (36) or a predetermined cubic-function, wherein the electron-beam deflection is corrected.