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Molding processing using a reproducible molding die

Assignee: Canon Inc
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Filing: 1988-12-22
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Granted: 1989-10-24
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Expires: 2008-12-22
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Abstract

Abstract A reproducible molding die including a base structure having an unevenness pattern, and a cleaning layer disposed on the surface of the base structure having the unevenness pattern, wherein the cleaning layer is removable while substantially retaining the unevenness pattern of the base structure. By using above-mentioned molding die, a possible molding residue left in a molding step can easily be removed together with the cleaning layer.

Inventors

  • 👤 Hiroyuki Imataki
  • 👤 Mizuho Hiraoka
  • 👤 Tomoyuki Tamura
  • 👤 Tetsuya Satoh

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 22:29
CPC Classifications
B; B29; B29C; B29C33/00; B29C33/56; B29C33/70; B29C33/72; B29K; B29K2905/00; B29K2905/08; B29K2909/00; B29K2909/08; B29L; B29L2017/00; B29L2017/001; B29L2017/003; Y; Y10; Y10S; Y10S425/00; Y10S425/81

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 73 words
A molding process, comprising: providing a reproducible molding die comprising a base structure having an evenness pattern, and a cleaning layer disposed on the surface of the base structure having said unevenness pattern; molding a product by means of said molding die, while leaving molding residue on the molding die; and removing said cleaning layer together with the residue from the molding die while substantially retaining said unevenness pattern of the base structure.
Claim 2
Dependent Claim 73 words
A molding process, comprising: providing a reproducible molding die comprising a base structure having an evenness pattern, and a cleaning layer disposed on the surface of the base structure having said unevenness pattern; molding a product by means of said molding die, while leaving molding residue on the molding die; and removing said cleaning layer together with the residue from the molding die while substantially retaining said unevenness pattern of the base structure.
Claim 3
Dependent Claim 25 words
A process according to claim 1, wherein a cleaning layer is again formed on the molding die from which said cleaning layer has been removed.
Claim 4
Dependent Claim 15 words
A process according to claim 1, wherein said cleaning layer is removed by an etchant.
Claim 5
Dependent Claim 20 words
A process according to claim 1, wherein a protective layer is disposed between said base structure and said cleaning layer.
Claim 6
Dependent Claim 32 words
A process according to claim 1, wherein said base structure comprises a substrate and convexities disposed thereon which constitute such unevenness pattern and comprise a material different from that of the substrate.
Claim 7
Dependent Claim 20 words
A process according to claim 5, wherein said substrate comprises glass and said convexities of the unevenness pattern comprise chromium.

References Cited (Backward Citations)

US4408319A Cited
US4297312A Cited
US4482511A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-10-23 1993-04-24 1993-10-24 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-10-23 1997-04-24 1997-10-24 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-10-23 2001-04-24 2001-10-24 $7700.00 Window Closed / Lapsed

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