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US4875989A Expired / Lapsed US ⏱️ 0.0 years remaining

Wafer processing apparatus

Assignee: Texas Instruments Inc
•
Filing: 1988-12-05
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Granted: 1989-10-24
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Expires: 2008-12-05
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Abstract

Abstract A processing apparatus and method for edge-preferential processing of partially fabricated integrated circuit wafers or of other substantially flat and thin workpieces. A plasma remote from the workpiece is used to generate activated species, and a baffle which is in proximity to the wafer face but not in contact with it is used to direct the stream of activated species. This module can be set up to perform both edge bead removal and bake of spun-on photoresist.

Inventors

  • 👤 Cecil J. Davis
  • 👤 Robert T. Matthews
  • 👤 Lee M. Loewenstein
  • 👤 Joe V. Abernathy
  • 👤 Timothy A. Wooldridge

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 01:43
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; G; G03; G03F; G03F7/00; G03F7/16; G03F7/168

Claims Analysis

Total Claims: 19
Claim 1
Independent Claim 116 words
An apparatus for processing of wafers comprising: (a) a vacuum processing chamber; (b) a wafer support within said vacuum processing chamber, said wafer support being capable of supporting a wafer; (c) an edge directing gas distribution device comprising a funnel-shaped distributor and a conical baffle concentrically positioned within said distributor to form an annulus for selectively directing the flow of process gases toward the circumference of the wafer; (d) a device for generating free radicals which is remote from said processing chamber and supplying the free radicals to the gas flow direction device; (e) a heating device within said vacuum processing chamber; whereby photoresist beads near the edge of the wafer can be selectively etched away.
Claim 2
Independent Claim 116 words
An apparatus for processing of wafers comprising: (a) a vacuum processing chamber; (b) a wafer support within said vacuum processing chamber, said wafer support being capable of supporting a wafer; (c) an edge directing gas distribution device comprising a funnel-shaped distributor and a conical baffle concentrically positioned within said distributor to form an annulus for selectively directing the flow of process gases toward the circumference of the wafer; (d) a device for generating free radicals which is remote from said processing chamber and supplying the free radicals to the gas flow direction device; (e) a heating device within said vacuum processing chamber; whereby photoresist beads near the edge of the wafer can be selectively etched away.
Claim 3
Dependent Claim 84 words
The apparatus of claim 1, further including a load lock connected to the adjacent vacuum processing chamber by a vacuum port, and wherein said vacuum port is also controlled by a computer control system for generating an output signal and wherein said control system is programmed to prevent opening of said vacuum port until said output signal has indicated that substantially no particulate has been present in the space within the interior of said processing chamber for at least a predetermined period of time.
Claim 4
Dependent Claim 27 words
The apparatus of claim 1, further comprising an environmental and vacuum control device for maintaining a vacuum in said processing chamber and for removal of any particulate.
Claim 5
Dependent Claim 26 words
The apparatus of claim 1, wherein the wafer is supported in a manner such that a side on which circuit components are to formed faces downward.
Claim 6
Dependent Claim 20 words
The apparatus of claim 1, wherein said heating device is a resistively heated susceptor which provides a maximum specific power.
Claim 7
Dependent Claim 25 words
The apparatus of claim 1, wherein said heating device is a radiant heat source which provides maximum specific power at wavelengths in the visible range.
Claim 8
Dependent Claim 16 words
The apparatus of claim 6, wherein said radiant heat source comprises a plurality of incandescent lamps.
Claim 9
Dependent Claim 19 words
The apparatus of claim 6 further including radiant heat source reflectors cooled by contact with a water cooled housing.
Claim 10
Dependent Claim 18 words
The apparatus of claim 6, further comprising a transparent vacuum wall separating said heat source from the wafer.
Claim 11
Dependent Claim 28 words
The apparatus of claim 9, wherein said vacuum wall is sealed to said process chamber by a radially elastically expandable metallic seal which includes a deformable soft portion.
Claim 12
Dependent Claim 12 words
The apparatus of claim 6, wherein said reflectors are coated with gold.
Claim 13
Dependent Claim 27 words
The apparatus of claim 1, wherein the gas flow direction device is a cone whose tip faces the gas discharge tube and whose base faces the wafer.
Claim 14
Dependent Claim 20 words
The apparatus of claim 12, said cone has a passage formed from the perpendicular to its base through its tip.
Claim 15
Dependent Claim 24 words
The apparatus of claim 12, wherein said baffle having a concave surface formed around the periphery of the location of a wafer during processing.
Claim 16
Dependent Claim 23 words
The apparatus of claim 1, wherein the gas flow direction device comprises a substantially solid cone with several standoffs on its conical surface.
Claim 17
Dependent Claim 15 words
The apparatus of claim 15, wherein the gas flow direction device is fabricated of aluminum.
Claim 18
Dependent Claim 18 words
The apparatus of claim 16, wherein the aluminum is anodized over its entire surface except for its base.
Claim 19
Dependent Claim 18 words
The apparatus of claim 16, wherein the aluminum is coated over at least a part of its surface.

References Cited (Backward Citations)

US3765763A Cited
US4298443A Cited
US4401054A Cited
US4718976A Cited
US4599135A Cited
US4664747A Cited
US4687544A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-10-23 1993-04-24 1993-10-24 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-10-23 1997-04-24 1997-10-24 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-10-23 2001-04-24 2001-10-24 $7700.00 Window Closed / Lapsed

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