Apparatus comprising a high-vacuum chamber

Claim 2

Apparatus comprising a high-vacuum system, comprising: an evacuable bakeable chamber and at least one cryopump communicating with the chamber such that gas can be removed from the chamber, the cryopump comprising a primary pumping stage that is maintained, during normal operation of the cryopump, at a temperature T p substantially below room temperature, characterized in that the apparatus further comprises: (a) means for conducting a cryogenic fluid adjacent the primary pumping stage of the cryopump, the conducting means having relatively high thermal conductivity; and (b) means for thermally conductively connecting the primary pumping stage of the cryopump to the conducting means, such that during bake-out of the chamber the primary pumping stage can be maintained at a temperature that is not substantially higher than T p .

Claim 3

The apparatus of claim 1, wherein the conducting means is adapted to receive cryogenic fluid from a source external to the cryopump and external to the vacuum system.

Claim 4

The apparatus of claim 2, wherein: (a) the conducting means comprises a copper tube; and (b) the thermally conductively connecting means comprises at least one copper mounting block connected to the copper tube.

Claim 5

The apparatus of claim 3, wherein the copper tube is configured substantially in the shape of a ring.

Claim 6

The apparatus of claim 4, wherein the cryogenic fluid is liquid nitrogen.

Claim 7

The apparatus of claim 5, further comprising: (a) at least one low-temperature valve for controlling the flow of liquid nitrogen through the copper tube; and (b) at least one valve for controlling the flow of purge gas for expelling residual coolant from the copper tube.

Claim 8

The apparatus of claim 1, wherein the cryopump comprises the means for conducting the cryogenic fluid.

Claim 9

Apparatus comprising an evacuable chamber and at least one cryopump for removing gas from the chamber, the cryopump comprising a mounting flange and a primary pumping stage, the primary pumping stage further comprising a primary condensor array, characterized in that the apparatus further comprises: (a) a mounting ring having first and second faces, the first face being adapted for sealingly attaching to the mounting flange of the cryopump and the second face being adapted for sealingly attaching to the evacuable chamber; (b) a copper tube for conducting liquid nitrogen adjacent the primary condensor array, the copper tube having first and second ends and being configured substantially in the shape of a ring; (c) at least one low-temperature valve for controlling the flow of liquid nitrogen through the copper tube; (d) at least one purge valve for controlling the flow of purge gas for expelling residual liquid nitrogen from the copper tube; (e) at least one copper mounting block mounted to the copper tube and to the primary condensor array for thermally conductively attaching the copper tube to the primary condensor array; (f) a conduit for conducting liquid nitrogen from the low-temperature valve and purge gas from the purge valve through the mounting ring to the first end of the copper tube; and (g) a conduit for conducting liquid nitrogen and purge gas from the second end of the copper tube through the mounting ring.

Claim 10

Apparatus comprising an evacuable chamber and at least one cryopump for removing gas from the chamber, the cryopump comprising a mounting flange and a primary pumping stage, the primary pumping stage further comprising a primary condensor array, characterized in that the apparatus further comprises: (a) a mounting ring having first and second faces, the first face being adapted for sealingly attaching to the mounting flange of the cryopump and the second face being adapted for sealingly attaching to the evacuable chamber; (b) a copper tube for conducting liquid nitrogen adjacent the primary condensor array, the copper tube having first and second ends and being configured substantially in the shape of a ring; (c) at least one low-temperature valve for controlling the flow of liquid nitrogen through the copper tube; (d) at least one purge valve for controlling the flow of purge gas for expelling residual liquid nitrogen from the copper tube; (e) at least one copper mounting block mounted to the copper tube and to the primary condensor array for thermally conductively attaching the copper tube to the primary condensor array; (f) a conduit for conducting liquid nitrogen from the low-temperature valve and purge gas from the purge valve through the mounting ring to the first end of the copper tube; and (g) a conduit for conducting liquid nitrogen and purge gas from the second end of the copper tube through the mounting ring.