Multilayer pulsed-current electrodeposition process

Claim 2

A process for electrodeposition a multilayer deposit on an electrically conductive substrate from a single electrodeposition bath containing copper ions and zinc ions for electrodepositing brass-alloy material, the deposit comprising a sequence of essentially repeating groups of layers each group of layers comprising a layer of first electrodeposited brass-alloy material and a layer of a second electrodeposited brass-alloy material, the first electrodeposited brass-alloy material being a distinct material from the second electrodeposited brass-alloy material, the process comprising the steps of: (a) immersing the substrate in the electrodeposition bath; (b) passing a charge burst of a first pulsed electric current through the electrodeposition bath to the substrate, the first pulsed electric current having a first pulsed-on/off waveform and a first peak current density effective to electrodeposit the first electrodeposited brass-alloy material, the duration of the charge burst of the first pulsed electric current being effective to cause a layer of the first electrodeposited brass-alloy material of a desired thickness to be deposited; (c) passing a charge burst of a second electric current through the electrodeposition bath to the substrate, the second electric current having a second waveform and a second current density effective to electrodeposit the second electrodeposited brass-alloy material, at least one of the second waveform and the second current density differing respectively from the first waveform and the first current density, the duration of the charge burst of the second electric current being effective to cause a layer of the second electrodeposited brass-alloy material of a desired thickness to be deposited; and (d) repeating steps (b) and (c) a plurality of times to deposit the sequence of essentially repeating groups of layers, each group comprising a layer of the first electrodeposited brass-alloy material and a layer of the second electrodeposited brass-alloy material.

Claim 3

The process according to claim 1 in which the second electric current is a pulsed electric current, the second waveform being a pulsed-on/off waveform.

Claim 4

The process according to claim 2 in which the first pulsed electric current is made up of current pulses having a pulse width in the range of from about 1 msec to about 100 msec and a pulse spacing in the range of from about 1 msec to about 50 msec; and the second pulsed electric current is made up of current pulses having a pulse width in the range of from about 1 msec to about 100 msec and a pulse spacing in the range of from about 1 msec to about 50 msec.

Claim 5

The process according to claim 3 in which the first pulsed electric current is effective to plate an alpha brass from the electrodeposition bath and the second electric current is effective to plate a beta brass from the electrodeposition bath.

Claim 6

The process according to claim 4 in which the first pulsed-on/off waveform is an essentially square waveform of about 1 msec on and about 1 msec off and the first peak current density is approximately 3 mA/cm 2 , and the second pulsed electric current has an essentially square waveform of about 1 msec on and about 1 msec off and a peak current density of approximately 100 mA/cm 2 .

Claim 7

The process according to claim 3 in which the first pulsed electric current is effective to plate a beta brass of a disordered crystal configuration from the electrodeposition bath and the second electric current is effective to plate a beta brass of an ordered crystal configuration from the electrodeposition bath.

Claim 8

The process according to claim 6 in which each layer of beta brass of the disordered crystal configuration is approximately 0.5 micrometer thick and each layer of beta brass of the ordered crystal configuration is about 0.25 micrometers thick.

Claim 9

The process according to claim 3 in which the first pulsed-on/off waveform is an essentially square waveform of about 1 msec on and about 1 msec off and the first peak current density is approximately 7 mA/cm 2 , and the second waveform is an essentially rectangular waveform of about 1 msec on and about 5 msec off and the second current density is approximately 100 mA/cm 2 .

Claim 10

The process according to claim 8 in which each layer produced by a charge burst of the first pulsed electric current is approximately 0.5 micrometers thick and each layer produced by a charge burst of a second electric current is approximately 0.25 micrometers thick.

Claim 11

A multilayer material comprising a sequence of essentially repeating groups of layers, each group of layers including a layer of an alpha brass and a layer of a beta brass, wherein the material is an electrodeposit produced by the process of claim 1.

Claim 12

A multilayer material comprising a sequence of essentially repeating groups layers, each group of layers including a layer of a beta brass in an ordered crystal configuration and a layer of a beta brass in a disordered crystal configuration, wherein the material is an electrodeposit produced by the process of claim 1.

Claim 13

A multilayer material comprising a sequence of essentially repeating groups of layers, each group of layers including a layer of an alpha brass and a layer of a beta brass.

Claim 14

A multilayer material comprising a sequence of essentially repeating groups of layers, each group of layers including a layer of an alpha brass and a layer of a beta brass.

Claim 15

A multilayer material comprising a sequence of essentially repeating groups of layers, each group of layers including a layer of a beta brass in an ordered crystal configuration and a layer of a beta brass in a disordered crystal configuration.

Claim 16

A multilayer material comprising a sequence of essentially repeating groups of layers, each group of layers including a layer of a beta brass in an ordered crystal configuration and a layer of a beta brass in a disordered crystal configuration.

Claim 17

A process for electrodepositing a multilayer deposit on an electrically conductive substrate from a single electrodeposition bath containing nickel ions and molybdenum ions for plating nickel-molybdenum-alloy material, the deposit comprising a sequence of essentially repeating groups of layers, each group of layers comprising a layer of a first electrodeposited nickel-molybdenum-alloy material and a layer of a second electrodeposited nickel-molybdenum-alloy material, the first electrodeposited nickel-molybdenum-alloy material being a distinct material from the second electrodeposited nickel-molybdenum-alloy material, the process comprising the steps of: (a) immersing the substrate in the electrodeposition bath; (b) passing a charge burst of a first pulsed electric current through the electrodeposition bath to the substrate, the first pulsed electric current having a first pulsed-on/off waveform and a first peak current density effective to electrodeposit the first electrodeposited nickel-molybdenum-alloy material, the duration of the charge burst of the first pulsed electric current being effective to cause a layer of the first electrodeposited nickel-molybdenum-alloy material of a desired thickness to be deposited; (c) passing a charge burst of a second electric current through the electrodeposition bath to the substrate, the second electric current having a second waveform and a second current density effective to electrodeposit the second electrodeposited nickel-molybdenum-alloy material, at least one of the second waveform and the second current density differing respectively from the first waveform and the first current density, the duration of the charge burst of the second electric current being effective to cause a layer of the second electrodeposited nickel-molybdenum-alloy material of a desired thickness to be deposited; and (d) repeating steps (b) and (c) a plurality of times to deposit the sequence of essentially repeating groups of layers, each group comprising a layer of the first electrodeposited nickel-molybdenum-alloy material and a layer of the second electrodeposited nickel-molybdenum-alloy material.

Claim 18

A process for electrodepositing a multilayer deposit on an electrically conductive substrate from a single electrodeposition bath containing nickel ions and molybdenum ions for plating nickel-molybdenum-alloy material, the deposit comprising a sequence of essentially repeating groups of layers, each group of layers comprising a layer of a first electrodeposited nickel-molybdenum-alloy material and a layer of a second electrodeposited nickel-molybdenum-alloy material, the first electrodeposited nickel-molybdenum-alloy material being a distinct material from the second electrodeposited nickel-molybdenum-alloy material, the process comprising the steps of: (a) immersing the substrate in the electrodeposition bath; (b) passing a charge burst of a first pulsed electric current through the electrodeposition bath to the substrate, the first pulsed electric current having a first pulsed-on/off waveform and a first peak current density effective to electrodeposit the first electrodeposited nickel-molybdenum-alloy material, the duration of the charge burst of the first pulsed electric current being effective to cause a layer of the first electrodeposited nickel-molybdenum-alloy material of a desired thickness to be deposited; (c) passing a charge burst of a second electric current through the electrodeposition bath to the substrate, the second electric current having a second waveform and a second current density effective to electrodeposit the second electrodeposited nickel-molybdenum-alloy material, at least one of the second waveform and the second current density differing respectively from the first waveform and the first current density, the duration of the charge burst of the second electric current being effective to cause a layer of the second electrodeposited nickel-molybdenum-alloy material of a desired thickness to be deposited; and (d) repeating steps (b) and (c) a plurality of times to deposit the sequence of essentially repeating groups of layers, each group comprising a layer of the first electrodeposited nickel-molybdenum-alloy material and a layer of the second electrodeposited nickel-molybdenum-alloy material.

Claim 19

The process according to claim 14 in which the second electric current has an essentially constant current density.

Claim 20

The process according to claim 15 in which the layer of nickel-molybdenum alloy deposited by each charge burst of first pulsed electric current has an average crystal grain size which is greater than the average crystal grain size of the nickel-molybdenum alloy deposited by each charge burst of the second electric current.

Claim 21

A multilayer material comprising a sequence of essentially repeating groups of layers, each group of layers including a layer of a nickel-molybdenum alloy having crystal grains of first average size and a layer of a nickel-molybdenum alloy having crystal grains of a second average size different from the first average size, wherein the material is an electrodeposit produced by the process of claim 14.

Claim 22

A multilayer material comprising a sequence of essentially repeating groups of layers, each group of layers including a layer of a nickel-molybdenum alloy having crystal grains of first average size and a layer of a nickel-molybdenum alloy having crystal grains of a second average size different from the first average size.

Claim 23

A multilayer material comprising a sequence of essentially repeating groups of layers, each group of layers including a layer of a nickel-molybdenum alloy having crystal grains of first average size and a layer of a nickel-molybdenum alloy having crystal grains of a second average size different from the first average size.