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US3886053A Expired / Lapsed US ⏱️ 0.0 years remaining

Programmable pulse electroplating process

Assignee: Individual
•
Filing: 1973-11-01
•
Granted: 1975-05-27
•
Expires: 1993-11-01
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Abstract

Abstract An improved electroplating process is achieved by pulsing the current through an electrolyte containing a chromium plating solution generating hydrogen at the surface of a workpiece while simultaneously performing honing operation, to enable the hydrogen to escape intermittently during the reduced current periods to avoid the build-up of stress and to provide a softer plating coating adjacent to the workpiece, and, to thereafter, decrease the duration of the reduced current periods to retain the hydrogen and thus to increase the hardness of the outer layers of the plating where necessary to provide a heavy duty wearing surface.

Inventors

  • 👤 James M Leland

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 18:13
CPC Classifications
C; C25; C25D; C25D5/00; C25D5/22; C25D5/627; Y; Y10; Y10S; Y10S204/00; Y10S204/09; Y10S428/00; Y10S428/922; Y10S428/9335; Y10S428/934; Y10S428/935; Y10T; Y10T428/00; Y10T428/12; Y10T428/12493

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 167 words
A METHOD OF CONTROLLING THE PLATING HARDNESS IN A HONEFORMING PROCESS IN WHICH THE SURFACE OF A METAL WORKPIECE IS CATHODICALLY ELECTROPLATED IN AN ELECTROLYTIC CHROMIUM PLATING SOLUTION GENERATING HYDROGEN AT THE WORKPIECE SURFACE, WITH A TOOL HAVING A HONING SURFACE MOVABLE RELATIVE TO AND IN ENGAGEMENT WITH THE WORKPIECE COMPRISING THE STEPS OF: APPLYING A DC CURRENT THROUGH SAID ELECTROLYTIC SOLUTION; INTERRUPTING THE FLOW OF CURRENT THROUGH SAID SOLUTION TO PROVIDE ALTERNATE DEPOSITION PERIODS AND NON-DEPOSITION PERIODS OF PREDETERMINED DURATION; GRADUALLY DECREASING THE DURATION OF THE NON-DEPOSITION PERIODS DURING THE PLATING PROCESS; WHEREBY DURING THE DEPOSITION PERIOD A LAYER OF CHROMIUM IS DEPOSITED ON THE WORK SURFACE SIMULTANEOUSLY WITH THE HONING OPERATION, AND DURING THE NON-DEPOSITION PERIOD A PREDETERMINED AMOUNT OF THE HYDROGEN IS ALLOWED TO ESCAPE TO CONTROL THE HARDNESS OF THE CHROMIUM APPLIED TO THE SURFACE OF THE WORKPIECE AND TO REDUCE THE STRESS BETWEEN THE PLATING AND THE WORKPIECE, THE HARDNESS OF THE PLATING INCREASING AS THE DURATION OF THE NONDEPOSITION PERIOD DECREASES.
Claim 2
Independent Claim 167 words
A METHOD OF CONTROLLING THE PLATING HARDNESS IN A HONEFORMING PROCESS IN WHICH THE SURFACE OF A METAL WORKPIECE IS CATHODICALLY ELECTROPLATED IN AN ELECTROLYTIC CHROMIUM PLATING SOLUTION GENERATING HYDROGEN AT THE WORKPIECE SURFACE, WITH A TOOL HAVING A HONING SURFACE MOVABLE RELATIVE TO AND IN ENGAGEMENT WITH THE WORKPIECE COMPRISING THE STEPS OF: APPLYING A DC CURRENT THROUGH SAID ELECTROLYTIC SOLUTION; INTERRUPTING THE FLOW OF CURRENT THROUGH SAID SOLUTION TO PROVIDE ALTERNATE DEPOSITION PERIODS AND NON-DEPOSITION PERIODS OF PREDETERMINED DURATION; GRADUALLY DECREASING THE DURATION OF THE NON-DEPOSITION PERIODS DURING THE PLATING PROCESS; WHEREBY DURING THE DEPOSITION PERIOD A LAYER OF CHROMIUM IS DEPOSITED ON THE WORK SURFACE SIMULTANEOUSLY WITH THE HONING OPERATION, AND DURING THE NON-DEPOSITION PERIOD A PREDETERMINED AMOUNT OF THE HYDROGEN IS ALLOWED TO ESCAPE TO CONTROL THE HARDNESS OF THE CHROMIUM APPLIED TO THE SURFACE OF THE WORKPIECE AND TO REDUCE THE STRESS BETWEEN THE PLATING AND THE WORKPIECE, THE HARDNESS OF THE PLATING INCREASING AS THE DURATION OF THE NONDEPOSITION PERIOD DECREASES.
Claim 3
Dependent Claim 19 words
The method of claim 1 wherein the duration of the deposition periods is substantially constant throughout the plating process.
Claim 4
Dependent Claim 25 words
The method of claim 2 wherein the deposition period is not substantially longer than the time necessary to deposit one complete monolayer of the chromium.
Claim 5
Dependent Claim 33 words
The method of claim 1 wherein the non-deposition periods are gradually decreased to approach zero during the progression of the plating process to obtain the maximum hardness desired on the outer plating surface.
Claim 6
Dependent Claim 14 words
The method of claim 1 wherein the electroplating process utilizes only one plating bath.

References Cited (Backward Citations)

US2421863A Cited
US2706170A Cited
US3042592A Cited
US3232854A Cited
US3318786A Cited
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US3804725A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1978-05-26 1978-11-25 1979-05-27 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1982-05-26 1982-11-25 1983-05-27 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1986-05-26 1986-11-25 1987-05-27 $7700.00 Window Closed / Lapsed

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