US4861729A
Expired / Lapsed
US
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Method of doping impurities into sidewall of trench by use of plasma source
Assignee: Panasonic Holdings Corp
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Filing: 1987-08-24
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Granted: 1989-08-29
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Expires: 2007-08-24
Abstract
Abstract A method in which in order to dope impurities, with excellent controllability, into a sidewall of a trench formed in a semiconductor substrate, plasma is generated in a gas including the impurities and the semiconductor substrate is disposed in or near the plasma, so that the impurities may be doped into the sidewall of the trench uniformly and at high precision of concentration control; wherein one of a duluted B 2 H 6 gas and diluted AsH 3 gas is chosen as the gas of the plasma, whereby one of B and As as the impurities directly enters the sidewall of the trench without first passing through a film.
Inventors
- 👤 Genshu Fuse
- 👤 Takashi Hirao
- 👤 Takashi Ohzone
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 18:09
CPC Classifications
H; H10; H10P; H10P32/00; H10P32/10; H10P32/12; H10P32/1204
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
101 words
A method of doping impurities into a sidewall of a trench of a semiconductor substrate, comprising: selectively forming said trench in said semiconductor substrate; disposing said substrate in a plasma of a gas containing diluted doping impurities or in the vicinity of said plasma, and doping said impurities at least into the sidewall of said trench, wherein one of a diluted B 2 H 6 gas and diluted AsH 3 gas is chosen as the gas of the plasma, whereby one of B and As as the impurities directly enters the sidewall of the trench without first passing through a film.
Claim 2
Independent Claim
101 words
A method of doping impurities into a sidewall of a trench of a semiconductor substrate, comprising: selectively forming said trench in said semiconductor substrate; disposing said substrate in a plasma of a gas containing diluted doping impurities or in the vicinity of said plasma, and doping said impurities at least into the sidewall of said trench, wherein one of a diluted B 2 H 6 gas and diluted AsH 3 gas is chosen as the gas of the plasma, whereby one of B and As as the impurities directly enters the sidewall of the trench without first passing through a film.
Claim 3
Dependent Claim
25 words
An impurity doping method as set forth in claim 1, wherein a channel stopper of an integrated circuit is formed in said sidewall by doping.
Claim 4
Dependent Claim
22 words
An impurity doping method as set forth in claim 1, wherein an insulator for device isolation is buried inside said doped trench.
Claim 5
Dependent Claim
20 words
An impurity doping method as set forth in claim 2, wherein said integrated circuit is composed of MOS integrated circuit.
Claim 6
Independent Claim
127 words
A method of doping impurities into a semiconductor substrate comprising: selectively forming a trench at a part of a negative conductive type semiconductor substrate; forming one of electrode regions of a storage capacitor by doping impurities at least into sidewall of said trench by disposing said substrate in or near a plasma containing a diluted impurity gas of the opposite conductive type of said substrate; and forming a MOS transistor in a part of said substrate in the vicinity of said trench; wherein one of a diluted B 2 H 6 gas and diluted AsH 3 gas is chosen as the gas of the plasma, whereby one of B and As as the impurities directly enters the sidewall of the trench without first passing through a film.
Claim 7
Independent Claim
127 words
A method of doping impurities into a semiconductor substrate comprising: selectively forming a trench at a part of a negative conductive type semiconductor substrate; forming one of electrode regions of a storage capacitor by doping impurities at least into sidewall of said trench by disposing said substrate in or near a plasma containing a diluted impurity gas of the opposite conductive type of said substrate; and forming a MOS transistor in a part of said substrate in the vicinity of said trench; wherein one of a diluted B 2 H 6 gas and diluted AsH 3 gas is chosen as the gas of the plasma, whereby one of B and As as the impurities directly enters the sidewall of the trench without first passing through a film.
Claim 8
Dependent Claim
38 words
An impurity doping method as set forth in claim 5, wherein a region of the same conductive type as said substrate forms a junction capacity of said electrode region, in a part of the substrate in the trench.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-08-28 | 1993-02-27 | 1993-08-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-08-28 | 1997-02-27 | 1997-08-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-08-28 | 2001-02-27 | 2001-08-29 | $7700.00 | Window Closed / Lapsed |