Magnetron deposition of ceramic oxide-superconductor thin films

Claim 1

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter greater than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the one or more sputtered ternary metal materials to form the film of metal oxide ceramic materials.

Claim 2

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter greater than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the one or more sputtered ternary metal materials to form the film of metal oxide ceramic materials.

Claim 3

A method for deposition a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter greater than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising a ternary mixture of metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron such that the metal oxide ceramic materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate.

Claim 4

A method for deposition a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter greater than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising a ternary mixture of metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron such that the metal oxide ceramic materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate.

Claim 5

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, each having a cylindrical extraction grid coaxially positioned with respect to the substrate, each having a cylindrical anode of diameter greater than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, each having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, each cylindrical cathode comprising a single elemental metal material, and each of said tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a sputter gas including oxygen and one or more inert gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons such that the elemental metal materials comprising the cylindrical cathodes are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; and subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the substrate to form the film of metal oxide ceramic materials.

Claim 6

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, each having a cylindrical extraction grid coaxially positioned with respect to the substrate, each having a cylindrical anode of diameter greater than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, each having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, each cylindrical cathode comprising a single elemental metal material, and each of said tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a sputter gas including oxygen and one or more inert gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons such that the elemental metal materials comprising the cylindrical cathodes are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; and subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the substrate to form the film of metal oxide ceramic materials.

Claim 7

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials.

Claim 8

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials.

Claim 9

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron such that the metal oxide ceramic materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate.

Claim 10

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron such that the metal oxide ceramic materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate.

Claim 11

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons each having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, each having a cylindrical extraction grid coaxially positioned with respect to the substrate, each having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, each having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, each cylindrical cathode comprising a single elemental metal material, and each of said plurality of tandem cylindrical magetrons having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a sputter gas that includes oxygen and one or more inert gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons such that the elemental metal materials comprising the cylindrical cathodes are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; and subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the substrate to form the film of metal oxide ceramic materials.

Claim 12

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons each having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, each having a cylindrical extraction grid coaxially positioned with respect to the substrate, each having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, each having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, each cylindrical cathode comprising a single elemental metal material, and each of said plurality of tandem cylindrical magetrons having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a sputter gas that includes oxygen and one or more inert gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons such that the elemental metal materials comprising the cylindrical cathodes are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; and subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the substrate to form the film of metal oxide ceramic materials.

Claim 13

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical anode coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the one or more sputtered metal materials to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 14

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical anode coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the one or more sputtered metal materials to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 15

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical anode coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a sputter gas that includes oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal oxide ceramic materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 16

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical anode coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a sputter gas that includes oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal oxide ceramic materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 17

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, each having a cylindrical anode coaxially positioned with respect to the substrate, each having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, each of the cylindrical cathodes comprising a single elemental metal material, and each of the plurality of tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons into a plasma region of the plurality of tandem cylindrical magnetrons to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more inert gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons and the disc-shaped cold cathode such that the elemental metal materials of the cylindrical cathodes are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the substrate to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 18

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, each having a cylindrical anode coaxially positioned with respect to the substrate, each having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, each of the cylindrical cathodes comprising a single elemental metal material, and each of the plurality of tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons into a plasma region of the plurality of tandem cylindrical magnetrons to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more inert gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons and the disc-shaped cold cathode such that the elemental metal materials of the cylindrical cathodes are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the substrate to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 19

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter greater than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 20

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter greater than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 21

A method for deposition a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter greater than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode o diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas that comprises oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal oxide ceramic materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 22

A method for deposition a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter greater than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode o diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas that comprises oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal oxide ceramic materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 23

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, each having a cylindrical extraction grid coaxially positioned with respect to the substrate, each having a cylindrical anode of diameter greater than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, each having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, each cylindrical cathode comprising a single elemental metal material, and each of said tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons into a plasma region of the plurality of tandem cylindrical magnetrons to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more rare gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons and the disc-shaped cold cathode such that the elemental metal materials of the cylindrical cathodes are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the substrate to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 24

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, each having a cylindrical extraction grid coaxially positioned with respect to the substrate, each having a cylindrical anode of diameter greater than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, each having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, each cylindrical cathode comprising a single elemental metal material, and each of said tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons into a plasma region of the plurality of tandem cylindrical magnetrons to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more rare gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons and the disc-shaped cold cathode such that the elemental metal materials of the cylindrical cathodes are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the substrate to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 25

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 26

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 27

A method for deposition a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas that comprises oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal oxide ceramic materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 28

A method for deposition a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, having a cylindrical extraction grid coaxially positioned with respect to the substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, said cylindrical cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas that comprises oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal oxide ceramic materials of the cylindrical cathode are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 29

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, each having a cylindrical extraction grid coaxially positioned with respect to the substrate, each having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, each having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, each cylindrical cathode comprising a single elemental metal material, and each of said tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons into a plasma region of the plurality of tandem cylindrical magnetrons to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more rare gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons and the disc-shaped cold cathode such that the elemental metal materials of the cylindrical cathodes are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the substrate to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 30

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the outer surface of a substrate, the method comprising: introducing a substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the substrate, each having a cylindrical extraction grid coaxially positioned with respect to the substrate, each having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the substrate, each having a cylindrical cathode of diameter greater than that of the cylindrical anode and coaxially positioned with respect to the substrate and the cylindrical anode, each cylindrical cathode comprising a single elemental metal material, and each of said tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical cathode and coaxially positioned with respect to the substrate, the cylindrical extraction grid, the cylindrical cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons into a plasma region of the plurality of tandem cylindrical magnetrons to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more rare gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons and the disc-shaped cold cathode such that the elemental metal materials of the cylindrical cathodes are sputtered therefrom and deposited uniformly onto the outer surface of the substrate; subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the substrate to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 31

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical substrate but greater than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials.

Claim 32

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical substrate but greater than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials.

Claim 33

A method for deposition a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical substrate but greater than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron such that the metal oxide ceramic materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the substrate.

Claim 34

A method for deposition a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical substrate but greater than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron such that the metal oxide ceramic materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the substrate.

Claim 35

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, each having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, each having a cylindrical anode of diameter smaller than that of the cylindrical substrate but greater than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, each having a post cathode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, each post cathode comprising a single elemental metal material, and each of said tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a sputter gas including oxygen and one or more inert gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons such that the elemental metal materials comprising the post cathodes are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; and subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the cylindrical substrate to form the film of metal oxide ceramic materials.

Claim 36

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, each having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, each having a cylindrical anode of diameter smaller than that of the cylindrical substrate but greater than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, each having a post cathode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, each post cathode comprising a single elemental metal material, and each of said tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a sputter gas including oxygen and one or more inert gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons such that the elemental metal materials comprising the post cathodes are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; and subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the cylindrical substrate to form the film of metal oxide ceramic materials.

Claim 37

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials.

Claim 38

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials.

Claim 39

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron such that the metal oxide ceramic materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate.

Claim 40

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron such that the metal oxide ceramic materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate.

Claim 41

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons each having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, each having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, each having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, each having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, each post cathode comprising a single elemental metal material, and each of said plurality of tandem cylindrical magetrons having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a sputter gas that includes oxygen and one or more inert gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons such that the elemental metal materials comprising the post cathodes are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; and subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the substrate to form the film of metal oxide ceramic materials.

Claim 42

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons each having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, each having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, each having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, each having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, each post cathode comprising a single elemental metal material, and each of said plurality of tandem cylindrical magetrons having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a sputter gas that includes oxygen and one or more inert gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons such that the elemental metal materials comprising the post cathodes are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; and subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the substrate to form the film of metal oxide ceramic materials.

Claim 43

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 44

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 45

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the post cathode and coaxially positioned with respect to the cylindrical substrate, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a sputter gas that includes oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal oxide ceramic materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 46

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the post cathode and coaxially positioned with respect to the cylindrical substrate, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a sputter gas that includes oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal oxide ceramic materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 47

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, each having a cylindrical anode of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, each having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, each of the post cathodes comprising a single elemental metal material, and each of the plurality of tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons into a plasma region of the plurality of tandem cylindrical magnetrons to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more inert gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons and the disc-shaped cold cathode such that the elemental metal materials of the post cathodes are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the cylindrical substrate to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the plurality of cylindrical magnetrons such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 48

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, each having a cylindrical anode of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, each having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, each of the post cathodes comprising a single elemental metal material, and each of the plurality of tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons into a plasma region of the plurality of tandem cylindrical magnetrons to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more inert gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons and the disc-shaped cold cathode such that the elemental metal materials of the post cathodes are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the cylindrical substrate to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the plurality of cylindrical magnetrons such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 49

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical substrate but greater than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 50

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical substrate but greater than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 51

A method for deposition a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of said cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical substrate but greater than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the coaxial substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas that comprises oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal oxide ceramic materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 52

A method for deposition a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of said cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical substrate but greater than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the coaxial substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas that comprises oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal oxide ceramic materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 53

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, each having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, each having a cylindrical anode of diameter smaller than that of the cylindrical substrate but greater than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, each having a post cathode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, each post cathode comprising a single elemental metal material, and each of said tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons into a plasma region of the plurality of tandem cylindrical magnetrons to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more rare gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons and the disc-shaped cold cathode such that the elemental metal materials of the cylindrical cathodes are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the cylindrical substrate to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the plurality of cylindrical magnetrons such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 54

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, each having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, each having a cylindrical anode of diameter smaller than that of the cylindrical substrate but greater than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, each having a post cathode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, each post cathode comprising a single elemental metal material, and each of said tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons into a plasma region of the plurality of tandem cylindrical magnetrons to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more rare gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons and the disc-shaped cold cathode such that the elemental metal materials of the cylindrical cathodes are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the cylindrical substrate to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the plurality of cylindrical magnetrons such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 55

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that or the cylindrical anode and coaxially positioned with respect tot he cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 56

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that or the cylindrical anode and coaxially positioned with respect tot he cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the cylindrical magnetron such that the metal materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate and such that a cylindrical magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the sputtered metal materials to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 57

A method for deposition a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas that comprises oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal oxide ceramic materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 58

A method for deposition a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a cylindrical magnetron having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, said post cathode comprising at least three metal oxide ceramic materials, and having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the cylindrical magnetron into a plasma region of the cylindrical magnetron to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas that comprises oxygen and one or more inert gases; applying operating voltages to the elements of the cylindrical magnetron and the disc-shaped cold cathode such that the metal oxide ceramic materials of the post cathode are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 59

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, each having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, each having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, each having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, each post cathode comprising a single elemental metal material, and each of said tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons into a plasma region of the plurality of tandem cylindrical magnetrons to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more rare gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons and the disc-shaped cold cathode such that the elemental metal materials of the post cathodes are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the cylindrical substrate to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 60

A method for depositing a superconducting thin film of metal oxide ceramic materials onto the inner surface of a cylindrical substrate, the method comprising: introducing a cylindrical substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem cylindrical magnetrons, each having a longitudinal axis substantially coincident with a longitudinal axis of the cylindrical substrate, each having a cylindrical extraction grid of diameter smaller than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, each having a cylindrical anode of diameter smaller than that of the cylindrical extraction grid and coaxially positioned with respect to the cylindrical substrate, each having a post cathode of diameter smaller than that of the cylindrical anode and coaxially positioned with respect to the cylindrical substrate and the cylindrical anode, each post cathode comprising a single elemental metal material, and each of said tandem cylindrical magnetrons having a cylindrical solenoid of diameter greater than that of the cylindrical substrate and coaxially positioned with respect to the cylindrical substrate, the cylindrical extraction grid, the post cathode, and the cylindrical anode; injecting a beam of energetic electrons created by a disc-shaped cold cathode positioned proximate to one end of the plurality of tandem cylindrical magnetrons into a plasma region of the plurality of tandem cylindrical magnetrons to sustain a magnetron discharge; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more rare gases; applying operating voltages to the elements of the plurality of tandem cylindrical magnetrons and the disc-shaped cold cathode such that the elemental metal materials of the post cathodes are sputtered therefrom and deposited uniformly onto the inner surface of the cylindrical substrate; subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the cylindrical substrate to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film by causing impingement upon the deposited superconducting thin film by a disc-shaped beam of electrons produced by a ring-shaped cold cathode positioned proximate to one end of the cylindrical magnetron such that crystallites therein are aligned with respect to a desired direction of anisotropic properties in response to a magnetic field created by the cylindrical solenoid.

Claim 61

A method for depositing a superconducting thin film of metal oxide ceramic materials onto a surface of a wide area planar substrate, the method comprising: introducing a planar substrate to be coated into a vacuum chamber apparatus that includes a planar magnetron having a normal axis substantially coincident with a normal axis of the planar substrate, having a planar extraction grid positioned parallel to the planar substrate, having a planar anode positioned parallel to the planar substrate, having a planar cathode positioned parallel to the planar substrate, said planar cathode comprising at least three metal materials, and having a magnetic field means positioned parallel to the planar substrate for directing a focused magnetic field onto a surface of the planar substrate to be coated; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the planar magnetron such that the metal materials of the planar cathode are sputtered therefrom and deposited uniformly onto the surface of the planar substrate to be coated and such that a planar magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the one or more sputtered ternary metal materials to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film such that crystallites therein are aligned with respect to a desired direction of anisotropic properties by causing impingement upon the deposited superconducting thin film by a line-shaped beam of electrons produced by a line-shaped cold cathode positioned parallel to the planar substrate.

Claim 62

A method for depositing a superconducting thin film of metal oxide ceramic materials onto a surface of a wide area planar substrate, the method comprising: introducing a planar substrate to be coated into a vacuum chamber apparatus that includes a planar magnetron having a normal axis substantially coincident with a normal axis of the planar substrate, having a planar extraction grid positioned parallel to the planar substrate, having a planar anode positioned parallel to the planar substrate, having a planar cathode positioned parallel to the planar substrate, said planar cathode comprising at least three metal materials, and having a magnetic field means positioned parallel to the planar substrate for directing a focused magnetic field onto a surface of the planar substrate to be coated; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising an inert gas and a reactive gas mixture comprising at least oxygen; applying operating voltages to the elements of the planar magnetron such that the metal materials of the planar cathode are sputtered therefrom and deposited uniformly onto the surface of the planar substrate to be coated and such that a planar magnetron plasma dissociates the reactive gas mixture into oxygen atoms to enhance oxidation of the one or more sputtered ternary metal materials to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film such that crystallites therein are aligned with respect to a desired direction of anisotropic properties by causing impingement upon the deposited superconducting thin film by a line-shaped beam of electrons produced by a line-shaped cold cathode positioned parallel to the planar substrate.

Claim 63

A method for depositing a superconducting thin film of metal oxide ceramic materials onto a surface of a wide area planar substrate, the method comprising: introducing a planar substrate to be coated into a vacuum chamber apparatus that includes a planar magnetron having a normal axis substantially coincident with a normal axis of the planar substrate, having a planar extraction grid positioned parallel to the planar substrate, having a planar anode positioned parallel to the planar substrate, having a planar cathode positioned parallel to the planar substrate, said planar cathode comprising at least three metal oxide materials, and having a magnetic field means positioned parallel to the planar substrate for directing a focused magnetic field onto a surface of the planar substrate to be coated; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more inert gases; applying operating voltages to the elements of the planar magnetron such that the metal oxide materials of the planar cathode are sputtered therefrom and deposited uniformly onto the surface of the planar substrate to be coated; and thermally annealing the deposited superconducting thin film such that crystallites therein are aligned with respect to a desired direction of anisotropic properties by causing impingement upon the deposited superconducting thin film by a line-shaped beam of electrons produced by a line-shaped cold cathode positioned parallel to the planar substrate.

Claim 64

A method for depositing a superconducting thin film of metal oxide ceramic materials onto a surface of a wide area planar substrate, the method comprising: introducing a planar substrate to be coated into a vacuum chamber apparatus that includes a planar magnetron having a normal axis substantially coincident with a normal axis of the planar substrate, having a planar extraction grid positioned parallel to the planar substrate, having a planar anode positioned parallel to the planar substrate, having a planar cathode positioned parallel to the planar substrate, said planar cathode comprising at least three metal oxide materials, and having a magnetic field means positioned parallel to the planar substrate for directing a focused magnetic field onto a surface of the planar substrate to be coated; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more inert gases; applying operating voltages to the elements of the planar magnetron such that the metal oxide materials of the planar cathode are sputtered therefrom and deposited uniformly onto the surface of the planar substrate to be coated; and thermally annealing the deposited superconducting thin film such that crystallites therein are aligned with respect to a desired direction of anisotropic properties by causing impingement upon the deposited superconducting thin film by a line-shaped beam of electrons produced by a line-shaped cold cathode positioned parallel to the planar substrate.

Claim 65

A method for depositing a superconducting thin film of metal oxide ceramic materials onto a surface of a wide area planar substrate, the method comprising: introducing a planar substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem planar magnetrons, each having a normal axis substantially coincident with a normal axis of the planar substrate, each having a planar extraction grid positioned parallel to the planar substrate, each having a planar anode positioned parallel to the planar substrate, each having a planar cathode positioned parallel to the planar substrate, each planar cathode comprising a single elemental metal material, and each of said tandem planar magnetrons having a magnetic field means for positioned parallel to the planar substrate for directing a focused magnetic field onto a surface of the planar substrate to be coated; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more inert gases; applying operating voltages to the elements of the plurality of tandem planar magnetrons such that the elemental metal materials of the planar cathodes cathodes are sputtered therefrom and deposited uniformly onto the surface of the planar substrate to be coated; subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the surface to be coated of the planar substrate to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film such that crystallites therein are aligned with respect to a desired direction of anisotropic properties by causing impingement upon the deposited superconducting thin film by a line-shaped beam of electrons produced by a line-shaped cold cathode positioned parallel to the planar substrate.

Claim 66

A method for depositing a superconducting thin film of metal oxide ceramic materials onto a surface of a wide area planar substrate, the method comprising: introducing a planar substrate to be coated into a vacuum chamber apparatus that includes a plurality of tandem planar magnetrons, each having a normal axis substantially coincident with a normal axis of the planar substrate, each having a planar extraction grid positioned parallel to the planar substrate, each having a planar anode positioned parallel to the planar substrate, each having a planar cathode positioned parallel to the planar substrate, each planar cathode comprising a single elemental metal material, and each of said tandem planar magnetrons having a magnetic field means for positioned parallel to the planar substrate for directing a focused magnetic field onto a surface of the planar substrate to be coated; establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere including a sputter gas comprising oxygen and one or more inert gases; applying operating voltages to the elements of the plurality of tandem planar magnetrons such that the elemental metal materials of the planar cathodes cathodes are sputtered therefrom and deposited uniformly onto the surface of the planar substrate to be coated; subsequently establishing a controlled gas atmosphere within the vacuum chamber apparatus, the controlled gas atmosphere comprising a rare gas-oxygen atmosphere to plasma oxidize the elemental metal materials deposited onto the surface to be coated of the planar substrate to form the film of metal oxide ceramic materials; and thermally annealing the deposited superconducting thin film such that crystallites therein are aligned with respect to a desired direction of anisotropic properties by causing impingement upon the deposited superconducting thin film by a line-shaped beam of electrons produced by a line-shaped cold cathode positioned parallel to the planar substrate.