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US4840865A Expired / Lapsed US ⏱️ 0.0 years remaining

Liquid developer for electrostatic photography

Assignee: Fujifilm Holdings Corp
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Filing: 1986-12-29
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Granted: 1989-06-20
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Expires: 2006-12-29
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Abstract

Abstract A liquid developer for electrostatic photography is disclosed, comprising a non-aqueous solvent having electrical resistivity of not less than 10 9 Ω.cm and a dielectric constant of not more than 3.5 having dispersed therein at least a resin, wherein said resin is a copolymer resin obtained by subjecting a solution containing (A) at least one of monofunctional monomer which is soluble in said solvent but insolubilized upon polymerization and (B) at least one of monomers having at least two polar groups and/or polar linking groups represented by formula (I): ##STR1## wherein V, Y, R 1 , R 2 , X 1 , X 2 , a 1 , and a 2 are defined in the specification, to a polymerization reaction in the presence of a resin which is soluble in said solvent and contains no graft group polymerizable with said monomers. The developer is excellent in dispersion stability, redispersibility and fixing properties and is capable of producing a master plate for offset printing having excellent ink sensitivity and printing durability.

Inventors

  • 👤 Eiichi Kato
  • 👤 Shigeyuki Dan
  • 👤 Hiroshi Ishibashi
  • 👤 Kazuo Ishii
  • 👤 Hidefuji Sera

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 07:42
CPC Classifications
G; G03; G03G; G03G9/00; G03G9/08; G03G9/12; G03G9/13

Claims Analysis

Total Claims: 15
Claim 1
Independent Claim 420 words
A liquid developer for electrostatic photography comprising a non-aqueous solvent having electrical resistivity of not less than 10 9 Ω·cm and a dielectric constant of not more than 3.5 having dispersed therein at least one resin, wherein said resin is a copolymer resin obtained by subjecting a solution containing (A) at least one of monofunctional monomer which is soluble in said solvent but insolubilized upon polymerization and (B) at least one of monomers having at least two polar groups and/or polar linking groups represented by formula (I): ##STR16## wherein V represents --O--, ##STR17## --SO 2 --, --CONH--, --SO 2 NH--, ##STR18## wherein W represents a hydrocarbon residue or --R 1 -X 1 -- m--R 2 -X 2 -- n Y; Y represents a hydrogen atom, a hydrocarbon residue having from 1 to 18 carbon atoms, or a hydrocarbon residue having from 1 to 18 carbon atoms which is substituted with a halogen atom, --OH, --CN, --NH 2 , --COOH, --SO 3 H or PO 3 H; X 1 and X 2 each represents --O--, --S--, --CO--, --CO 2 --, ##STR19## --NHCO 2 --or --NHCONH--, wherein Y 1 , Y 2 , Y 3 , Y 4 and Y 5 each has the same meaning as Y; R 1 and R 2 each represents a substituted or unsubstituted hydrocarbon residue having from 1 to 18 carbon atoms which may contain a moiety of ##STR20## in its main chain, wherein X 3 and X 4 each has the same meaning as X 1 and X 2 ; R 4 represents a substituted or unsubstituted hydrocarbon residue having from 1 to 18 carbon atoms; and Y 6 has the same meaning as Y; a 1 and a 2 each represents a hydrogen atom, a hydrocarbon residue, --COOZ or --COOZ having a hydrocarbon residue attached at the carbonyl, wherein Z represents a hydrogen atom or a substituted or unsubstituted hydrocarbon residue; and m, n and p each represents O or an integer of from 1 to 4, to a polymerization reaction in the presence of a resin which is soluble in said solvent and contains no graft group polymerizable with said monomers, and wherein said at least one of monofunctional monomer which is soluble in said solvent but insolubilized upon polymerization and said at least one monomer having at least two polar groups and/or polar linking groups from particles and said particles have absorbed to the surface thereof as an outer particle resin said resin which contains no graft group polymerizable with said monomers.
Claim 2
Dependent Claim 420 words
A liquid developer for electrostatic photography comprising a non-aqueous solvent having electrical resistivity of not less than 10 9 Ω·cm and a dielectric constant of not more than 3.5 having dispersed therein at least one resin, wherein said resin is a copolymer resin obtained by subjecting a solution containing (A) at least one of monofunctional monomer which is soluble in said solvent but insolubilized upon polymerization and (B) at least one of monomers having at least two polar groups and/or polar linking groups represented by formula (I): ##STR16## wherein V represents --O--, ##STR17## --SO 2 --, --CONH--, --SO 2 NH--, ##STR18## wherein W represents a hydrocarbon residue or --R 1 -X 1 -- m--R 2 -X 2 -- n Y; Y represents a hydrogen atom, a hydrocarbon residue having from 1 to 18 carbon atoms, or a hydrocarbon residue having from 1 to 18 carbon atoms which is substituted with a halogen atom, --OH, --CN, --NH 2 , --COOH, --SO 3 H or PO 3 H; X 1 and X 2 each represents --O--, --S--, --CO--, --CO 2 --, ##STR19## --NHCO 2 --or --NHCONH--, wherein Y 1 , Y 2 , Y 3 , Y 4 and Y 5 each has the same meaning as Y; R 1 and R 2 each represents a substituted or unsubstituted hydrocarbon residue having from 1 to 18 carbon atoms which may contain a moiety of ##STR20## in its main chain, wherein X 3 and X 4 each has the same meaning as X 1 and X 2 ; R 4 represents a substituted or unsubstituted hydrocarbon residue having from 1 to 18 carbon atoms; and Y 6 has the same meaning as Y; a 1 and a 2 each represents a hydrogen atom, a hydrocarbon residue, --COOZ or --COOZ having a hydrocarbon residue attached at the carbonyl, wherein Z represents a hydrogen atom or a substituted or unsubstituted hydrocarbon residue; and m, n and p each represents O or an integer of from 1 to 4, to a polymerization reaction in the presence of a resin which is soluble in said solvent and contains no graft group polymerizable with said monomers, and wherein said at least one of monofunctional monomer which is soluble in said solvent but insolubilized upon polymerization and said at least one monomer having at least two polar groups and/or polar linking groups from particles and said particles have absorbed to the surface thereof as an outer particle resin said resin which contains no graft group polymerizable with said monomers.
Claim 3
Dependent Claim 267 words
A liquid developer as in claim 1, wherein V represents --O--, ##STR21## --CONH--, or ##STR22## wherein W represents a substituted or unsubstituted alkyl group having from 1 to 16 total carbon atoms, a substituted or unsubstituted alkenyl group having from 2 to 16 total carbon atoms, a substituted or unsubstituted alicyclic group having from 5 to 18 total carbon atoms, or --R 1 --X 1 -- m --R 2 -X 2 -- n --Y; Y represents a hydrogen atom, an aliphatic group having from 1 to 16 total carbon atoms, or an aliphatic group having from 1 to 16 total carbon atoms which is substituted with a halogen atom, --OH, --CN, or --COOH; X 1 and X 2 each represents --O--, --S--, --CO--, ##STR23## wherein Y 2 and Y 3 each has the same meaning as Y; R 1 and R 2 each represents a substituted or unsubstituted hydrocarbon residue having from 1 to 12 carbon atoms, which may contain a moiety of ##STR24## in its main chain, wherein X 3 and X 4 each has the same meaning as X 1 and X 2 ; R 4 represents a substituted or unsubstituted alkylene, alkenylene or aralkyl group having up to 12 carbon atoms; and Y 6 has the same meaning as Y; a 1 and a 2 each represents a hydrogen atom, a methyl group, --COOZ or --CH 2 COOZ, wherein Z represents a hydrogen atom, or an alkyl, alkenyl, aralkyl or cycloalkyl group having up to 18 carbon atoms; and m, n and p each represents O or an integer of from 1 to 3.
Claim 4
Dependent Claim 33 words
A liquid developer as in claim 1, wherein the total number of atoms constituting V, R 1 , X 1 , R 2 , X 2 , and Y is at least 8.
Claim 5
Dependent Claim 28 words
A liquid developer as in claim 1, wherein the monomer (B) is present in an amount of from 0.05 to 30% by weight based on the monomer (A).
Claim 6
Dependent Claim 28 words
A liquid developer as in claim 4, wherein the monomer (B) is present in an amount of from 0.05 to 5% by weight based on the monomer (A).
Claim 7
Dependent Claim 36 words
A liquid developer as in claim 1, wherein the monomers (A) and (B) are present in a total amount of from 5 to 80 parts by weight per 100 parts by weight of said non-aqueous solvent.
Claim 8
Dependent Claim 36 words
A liquid developer as in claim 6, wherein the monomers (A) and (B) are present in a total amount of from 10 to 50 parts by weight per 100 parts by weight of said non-aqueous solvent.
Claim 9
Dependent Claim 38 words
A liquid developer as in claim 1, wherein said soluble resin is used in an amount of from 1 to 100 parts by weight per 100 parts by weight of the sum of the monomers (A) and (B).
Claim 10
Dependent Claim 26 words
A liquid developer for electrostatic photography as claimed in claim 1, wherein at least one of m and n represents an integer of 1 to 3.
Claim 11
Dependent Claim 43 words
A liquid developer for electrostatic photography as claimed in claim 1, wherein Y represents a hydrocarbon residue having from 1 to 18 carbon atoms or a hydrocarbon residue having 1 to 18 carbon atoms which is substituted with a halogen atom or --CN.
Claim 12
Dependent Claim 43 words
A liquid developer for electrostatic photography as claimed in claim 9, wherein Y represents a hydrocarbon residue having from 1 to 18 carbon atoms or a hydrocarbon residue having 1 to 18 carbon atoms which is substituted with a halogen atom or --CN.
Claim 13
Dependent Claim 32 words
A liquid developer for electrostatic photography as claimed in claim 11, wherein the monomer (B) is present in an amount of from 0.05 to 5% by weight based on the monomer (A).
Claim 14
Independent Claim 420 words
A method of preparing a liquid developer for electrostatic photography comprising a non-aqueous solvent having electrical resistivity of not less than 10 9 Ω·cm and a dielectric constant of not more than 3.5 having dispersed therein at least one resin, which method comprises subjecting a solution containing (A) at least one of monofunctional monomer which is soluble in said solvent but insolubilized upon polymerization and (B) at least one of monomers having at least two polar groups and/or polar linking groups represented by formula (I): ##STR25## wherein V represents --O--, ##STR26## --SO 2 --, --CONH--, --SO 2 NH--, ##STR27## wherein W represents a hydrocarbon residue or --R 1 -X 1 -- m --R 2 -X 2 -- n --Y; Y represents a hydrogen atom, a hydrocarbon residue having from 1 to 18 carbon atoms, or a hydrocarbon residue having from 1 to 18 carbon atoms which is substituted with a halogen atom, --OH, [--CH] --CN, --NH 2 , --COOH, --SO 3 H or PO 3 H; X 1 and X 2 each represents --O--, --S--, --CO--, --CO 2 --, ##STR28## --NHCO 2 --or --NHCONH--, wherein Y 1 , Y 2 , Y 3 , Y 4 and Y 5 each has the same meaning as Y; R 1 and R 2 each represents a substituted or unsubstituted hydrocarbon residue having from 1 to 18 carbon atoms which may contain a moiety of ##STR29## in its main chain, wherein X 3 and X 4 each has the same meaning as X 1 and X 2 ; R 4 represents a substituted or unsubstituted hydrocarbon residue having from 1 to 18 carbon atoms; and Y 6 has the same meaning as Y; a 1 and a 2 each represents a hydrogen atom, a hydrocarbon residue, --COOZ or --COOZ having a hydrocarbon residue attached at the carbonyl, wherein Z represents a hydrogen atom or a substituted or unsubstituted hydrocarbon residue; and m, n and p each represents O or an integer of from 1 to 4, to a polymerization reaction in the presence of a resin which is soluble in said solvent and contains no graft group polymerizable with said monomers, and wherein said at least one of monofunctional monomer which is soluble in said solvent but insolubilized upon polymerization and said at least one monomer having at least two polar groups and/or polar linking groups from particles and said particles have absorbed to the surface thereof as an outer particle resin said resin which contains no graft group polymerizable with said monomers.
Claim 15
Independent Claim 420 words
A method of preparing a liquid developer for electrostatic photography comprising a non-aqueous solvent having electrical resistivity of not less than 10 9 Ω·cm and a dielectric constant of not more than 3.5 having dispersed therein at least one resin, which method comprises subjecting a solution containing (A) at least one of monofunctional monomer which is soluble in said solvent but insolubilized upon polymerization and (B) at least one of monomers having at least two polar groups and/or polar linking groups represented by formula (I): ##STR25## wherein V represents --O--, ##STR26## --SO 2 --, --CONH--, --SO 2 NH--, ##STR27## wherein W represents a hydrocarbon residue or --R 1 -X 1 -- m --R 2 -X 2 -- n --Y; Y represents a hydrogen atom, a hydrocarbon residue having from 1 to 18 carbon atoms, or a hydrocarbon residue having from 1 to 18 carbon atoms which is substituted with a halogen atom, --OH, [--CH] --CN, --NH 2 , --COOH, --SO 3 H or PO 3 H; X 1 and X 2 each represents --O--, --S--, --CO--, --CO 2 --, ##STR28## --NHCO 2 --or --NHCONH--, wherein Y 1 , Y 2 , Y 3 , Y 4 and Y 5 each has the same meaning as Y; R 1 and R 2 each represents a substituted or unsubstituted hydrocarbon residue having from 1 to 18 carbon atoms which may contain a moiety of ##STR29## in its main chain, wherein X 3 and X 4 each has the same meaning as X 1 and X 2 ; R 4 represents a substituted or unsubstituted hydrocarbon residue having from 1 to 18 carbon atoms; and Y 6 has the same meaning as Y; a 1 and a 2 each represents a hydrogen atom, a hydrocarbon residue, --COOZ or --COOZ having a hydrocarbon residue attached at the carbonyl, wherein Z represents a hydrogen atom or a substituted or unsubstituted hydrocarbon residue; and m, n and p each represents O or an integer of from 1 to 4, to a polymerization reaction in the presence of a resin which is soluble in said solvent and contains no graft group polymerizable with said monomers, and wherein said at least one of monofunctional monomer which is soluble in said solvent but insolubilized upon polymerization and said at least one monomer having at least two polar groups and/or polar linking groups from particles and said particles have absorbed to the surface thereof as an outer particle resin said resin which contains no graft group polymerizable with said monomers.

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-06-19 1992-12-19 1993-06-20 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-06-19 1996-12-19 1997-06-20 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-06-19 2000-12-19 2001-06-20 $7700.00 Window Closed / Lapsed

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