Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
221 words
A photocathode having internal amplification, comprising: first electrode means located to receive photons and adapted for receiving a first voltage, for transmitting therethrough said received photons; absorption layer means, adjacent said first electrode means and comprising a P-type semiconductor material having a forbidden bank of sufficiently small width to cause photons received through said first electrode means to be converted into electron-hole pairs; at least one ionization-inducted electron multiplication layer means, adjacent said absorption layer means, and comprising two sub-layers of an N-type semiconductor material having respectively two different compositions at an interface therebetween, for causing, when said multiplication layer means is biased, the electrons received from said absorption layer means to be accelerated and for causing the holes received from said absorption layer means to be accelerated less than said electrons; a transport layer, adjacent said ionization induced electron multiplication layer means, and formed of the same material as said absorption layer; second electrode means, adjacent said transport layer, for receiving a second voltage to cause said photocathode to be biased, for transmitting therethrough accelerated electrons received from said multiplication layer means through said transport layer; and emission layer means adjacent said second electrode means and comprising a material which produces negative electron affinity for causing accelerated electrons received from said second electrode means to be emitted into a vacuum.
Claim 2
Dependent Claim
221 words
A photocathode having internal amplification, comprising: first electrode means located to receive photons and adapted for receiving a first voltage, for transmitting therethrough said received photons; absorption layer means, adjacent said first electrode means and comprising a P-type semiconductor material having a forbidden bank of sufficiently small width to cause photons received through said first electrode means to be converted into electron-hole pairs; at least one ionization-inducted electron multiplication layer means, adjacent said absorption layer means, and comprising two sub-layers of an N-type semiconductor material having respectively two different compositions at an interface therebetween, for causing, when said multiplication layer means is biased, the electrons received from said absorption layer means to be accelerated and for causing the holes received from said absorption layer means to be accelerated less than said electrons; a transport layer, adjacent said ionization induced electron multiplication layer means, and formed of the same material as said absorption layer; second electrode means, adjacent said transport layer, for receiving a second voltage to cause said photocathode to be biased, for transmitting therethrough accelerated electrons received from said multiplication layer means through said transport layer; and emission layer means adjacent said second electrode means and comprising a material which produces negative electron affinity for causing accelerated electrons received from said second electrode means to be emitted into a vacuum.
Claim 3
Dependent Claim
49 words
A photocathode according to claim 1, wherein said multiplication layer means comprises a first sublayer having a thickness of 0.05 micron and comprising Ga 0 .9 Al 0 .1 As, and a second sublayer having a thickness of 0.05 micron and comprising Ga 0 .7 Al 0 .3 As.
Claim 4
Dependent Claim
44 words
A photocathode according to claim 1 wherein each sublayer of said ionization-induced electron multiplication layer comprises an N-type semiconductor material having a composition which varies continuously so as to ensure that its forbidden bandwidth increases in a direction in which the electrons are transmitted.
Claim 5
Dependent Claim
40 words
A photocathode according to claim 3, wherein each said sublayer comprises Ga 1-x Al x As where x varies linearly from 0.3 to 0 in the direction in which the electrons are transmitted and has a thickness of 0.03 micron.
Claim 6
Dependent Claim
62 words
A photocathode according to claim 3, wherein each said sublayer comprises In x Ga 1-x As 1-y P y where x and y vary in such a manner as to ensure that the N-type semiconductor material of said each sublayer is lattice-matched with the P-type semiconductor material of said absorption layer means, and said each sublayer has a thickness of 0.03 micron.
Claim 7
Dependent Claim
78 words
A photocathode according to claim 1, further comprising layer barrier means, disposed within said second electrode means, for reducing hole current and comprising a P-type semiconductor material having a forbidden band which is greater than the forbidden band of the absorption layer means, a thickness of said barrier layer means being sufficiently small to permit the passage of electrons by tunnel effect with high probability while being sufficiently large to stop the greater part of the hole current.
Claim 8
Dependent Claim
29 words
A photocathode according to claim 6, wherein said barrier layer means comprises a layer of Ga 0 .6 Al 0 .4 As having a thickness smaller than 0.0045 micron.
Claim 9
Dependent Claim
19 words
A photocathode according to claim 1 wherein said sublayers comprise N-type semiconductor material having respectively two different homogenous compositions.
Claim 10
Dependent Claim
48 words
A photocathode according to claim 8 wherein a first one of said sublayer comprises Ga 0 .9 Al 0 As having a thickness of 0.05 micron, and wherein a second one of said sublayers comprises Ga 0 .7 Al 0 .3 As having a thickness of 0.05 micron.
Claim 11
Dependent Claim
17 words
A photocathode as in claim 1 further comprising a negative electron affinity layer, covering said transport layer.