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Field-effect transistor and the same associated with an optical semiconductor device

Assignee: NEC Corp
•
Filing: 1988-01-05
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Granted: 1989-05-09
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Expires: 2008-01-05
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Abstract

Abstract A field-effect transistor comprises a semi-insulating InP substrate, a strained buffer layer of Al X Ga 1-X As grown on the substrate, and an active layer of GaAs. The active layer is eased in regard to the influence of the lattice mismatching between the active layer and substrate. Such a field-effect transistor is associated with an optical device in a monolithic manner on a common semi-insulating InP substrate.

Inventors

  • 👤 Kensuke Kasahara
  • 👤 Tomoji Terakado
  • 👤 Yasumasa Inomoto
  • 👤 Akira Suzuki
  • 👤 Tomohiro Itoh

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 01:59
CPC Classifications
H; H10; H10F; H10F39/00; H10F39/10; H10F39/103; H10D; H10D30/00; H10D30/80; H10D30/87; H10D62/00; H10D62/10; H10D62/17; H10D62/351; H10D62/357; H10H; H10H29/00; H10H29/10; H10P; H10P14/00; H10P14/20; H10P14/29; H10P14/2901; H10P14/2902; H10P14/2905; H10P14/2907; H10P14/2909; H10P14/32; H10P14/3202; H10P14/3214; H10P14/3218; H10P14/3221; H10P14/34; H10P14/3402; H10P14/3414; H10P14/3421; H01; H01S; H01S5/00; H01S5/02; H01S5/026; H01S5/0261

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 75 words
A field-effect transistor comprising, a semi-insulating InP substrate, a strained buffer layer grown on said semi-insulating InP substrate, an active layer of GaAs grown on said strained buffer layer, a gate electrode for controlling said active layer, and source and drain electrodes which are in ohmic contact with said active layer, wherein the presence of said strained buffer layer reduces the influence of the lattice mismatching between said active layer and said semi-insulating InP substrate.
Claim 2
Dependent Claim 75 words
A field-effect transistor comprising, a semi-insulating InP substrate, a strained buffer layer grown on said semi-insulating InP substrate, an active layer of GaAs grown on said strained buffer layer, a gate electrode for controlling said active layer, and source and drain electrodes which are in ohmic contact with said active layer, wherein the presence of said strained buffer layer reduces the influence of the lattice mismatching between said active layer and said semi-insulating InP substrate.
Claim 3
Dependent Claim 34 words
A field-effect transistor according to claim 1, wherein said GaAs of said active layer is n-type, and said strained buffer layer is of Al X Ga 1-X As where X is zero to one.
Claim 4
Dependent Claim 15 words
A field-effect transistor according to claim 1, wherein said strained buffer layer is of GaAs.
Claim 5
Dependent Claim 15 words
A field-effect transistor according to claim 1, wherein said strained buffer layer is of AlAs.
Claim 6
Dependent Claim 17 words
A field-effect transistor according to claim 1, wherein said strained buffer layer is of a super-lattice layer.
Claim 7
Dependent Claim 66 words
A field-effect transistor associated with an optical device comprising, a semi-insulating InP substrate, a field-effect transistor consisting of GaAs system semiconductor including AlGaAs, and an optical device consisting of InP system semiconductor including InGaAs and InGaAsP which are respectively provided in a monolithic state on said semi-insulating InP substrate, and a strained buffer layer which is positioned between said semi-insulating InP substrate and said field-effect transistor.
Claim 8
Dependent Claim 66 words
A field-effect transistor associated with an optical device comprising, a semi-insulating InP substrate, a field-effect transistor consisting of GaAs system semiconductor including AlGaAs, and an optical device consisting of InP system semiconductor including InGaAs and InGaAsP which are respectively provided in a monolithic state on said semi-insulating InP substrate, and a strained buffer layer which is positioned between said semi-insulating InP substrate and said field-effect transistor.
Claim 9
Dependent Claim 68 words
A field-effect transistor associated with an optical device according to claim 6, wherein said strained buffer layer is of Al X Ga 1-X As, where X is zero to one, and said field-effect transistor includes an active layer of GaAs grown on said strained buffer layer, a gate electrode for controlling said active layer, and source and drain electrodes which are in ohmic contact with said active layer.
Claim 10
Dependent Claim 61 words
A field-effect transistor associated with an optical device according to claim 6, wherein said strained buffer layer is of a GaAs layer, and said field-effect transistor includes an active layer of GaAs grown on said strained buffer layer, a gate electrode for controlling said active layer, and a source and drain electrodes which are in ohmic contact with said active layer.

References Cited (Backward Citations)

US4017332A Cited
US4593304A Cited
JPS59125657A Cited
US4670767A Cited
US4719498A Cited
US4719155A Cited
JPS61191063A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-05-08 1992-11-07 1993-05-09 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-05-08 1996-11-07 1997-05-09 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-05-08 2000-11-07 2001-05-09 $7700.00 Window Closed / Lapsed

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