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US4822449A Expired / Lapsed US ⏱️ 0.0 years remaining

Heat transfer control during crystal growth

Assignee: Massachusetts Institute of Technology
•
Filing: 1987-06-10
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Granted: 1989-04-18
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Expires: 2007-06-10
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Abstract

Abstract Heat transfer from the surface of a crystal during crystal growth is controlled by surrounding the crystal with plural coaxial heat transfer modules. The heat transfer modules are stacked along the crystal axis. Each module includes apparatus for monitoring a temperature drop across a radially extending gradient region of the module. A heating element in the module responsive to the temperature drop controls heat transfer through the module which is equal to the heat transfer from the crystal surface at the axial location of the module. The control system also controls heat transfer from the top of the crystal by controlling the temperature to which the crystal top radiates. Control of heat transfer from the crystal surface prevents excessive thermal stress experienced by the crystal solid during growth reducing the presence of massive dislocation networks.

Inventors

  • 👤 Shahryar Motakef

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-08 14:41
CPC Classifications
C; C30; C30B; C30B15/00; C30B15/14; Y; Y10; Y10T; Y10T117/00; Y10T117/10; Y10T117/1004; Y10T117/1008

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 79 words
Method for growing a crystal from a melt comprising controlling the heat flux from the crystal surface so that the thermal stress levels are maintained below the critical resolved shear stress value of the crystal matrix by monitoring radial heat flux from the crystal and, responsive to the monitored heat flux, by controlling the as-monitored radial heat flux in the growioog crystal, and by simultaneously monitoring and controlling the temperature to which the top of the growing crystal radiates.
Claim 2
Dependent Claim 79 words
Method for growing a crystal from a melt comprising controlling the heat flux from the crystal surface so that the thermal stress levels are maintained below the critical resolved shear stress value of the crystal matrix by monitoring radial heat flux from the crystal and, responsive to the monitored heat flux, by controlling the as-monitored radial heat flux in the growioog crystal, and by simultaneously monitoring and controlling the temperature to which the top of the growing crystal radiates.
Claim 3
Dependent Claim 56 words
The method of claim 1 wherein controlling the heat transfer from the crystal comprises surrounding the crystal with plural coaxial heat transfer modules stacked along the crystal axis, monitoring a temperature drop across a radially extending gradient region of the module, and energizing a heating element within the module to control heat transfer through the module.
Claim 4
Dependent Claim 10 words
The method of claim 1 wherein the crystal is GaAs.
Claim 5
Dependent Claim 12 words
The method of claim 1 wherein the crystal is a III-V crystal.
Claim 6
Dependent Claim 14 words
The method of claim 1 wherein the crystal is grown by the Czochralski technique.

References Cited (Backward Citations)

US4000977A Cited
US4248645A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-04-17 1992-10-17 1993-04-18 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-04-17 1996-10-17 1997-04-18 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-04-17 2000-10-17 2001-04-18 $7700.00 Window Closed / Lapsed

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