US4808682A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Copolymers having o-nitrocarbinol ester groups, production of two-layer resists, and fabrication of semiconductor components
Assignee: BASF SE
•
Filing: 1988-01-12
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Granted: 1989-02-28
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Expires: 2008-01-12
Abstract
Abstract Copolymers useful in particular for producing two-layer resists and fabricating semiconductor devices contain from 5 to 50 mol % of monomers having o-nitrocarbinol ester groups, from 95 to 50 mol % of an olefinically unsaturated silicon-containing organic compound, from 0 to 20 mol % of an olefinically unsaturated carboxylic acid and from 0 to 25 mol % of other copolymerizable monomers.
Inventors
- 👤 Reinhold Schwalm
- 👤 Horst Binder
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 02:10
CPC Classifications
C; C08; C08F; C08F220/00; C08F220/02; C08F220/10; C08F220/26; C08F230/00; C08F230/04; C08F230/08; C08F230/085; G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; G03F7/09; G03F7/095
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
174 words
A copolymer containing as copolymerized units (a) from 5 to 50 mol % of one or more compounds of the general formula (I) ##STR8## where A is an aromatic or hetaromatic, substituted or unsubstituted ring system of 5 to 14 ring members, X is hydrogen, alkyl of 1 to 8 carbon atoms or substituted or unsubstituted aryl or aralkyl, and Y is an ethylenically unsaturated radical of 2 to 6 carbon atoms, (b) from 95 to 50 mol % of one or more copolymerizable olefinically unsaturated silicon-containing organic compounds, (c) from 0 to 20 mol % of one or more copolymerizable olefinically unsaturated carboxylic acids of 3 to 6 carbon atoms, (d) from 0 to 25 mol % of one or more further olefinically unsaturated, copolymerizable organic compounds other than (a), (b) and (c), whose homopolymers are transparent within the wavelength region from 250 to 400 nm, with the proviso that the sum of the percentages mentioned under (a) to (d) is 100 and the copolymer has a silicon content of >6% by weight.
Claim 2
Dependent Claim
174 words
A copolymer containing as copolymerized units (a) from 5 to 50 mol % of one or more compounds of the general formula (I) ##STR8## where A is an aromatic or hetaromatic, substituted or unsubstituted ring system of 5 to 14 ring members, X is hydrogen, alkyl of 1 to 8 carbon atoms or substituted or unsubstituted aryl or aralkyl, and Y is an ethylenically unsaturated radical of 2 to 6 carbon atoms, (b) from 95 to 50 mol % of one or more copolymerizable olefinically unsaturated silicon-containing organic compounds, (c) from 0 to 20 mol % of one or more copolymerizable olefinically unsaturated carboxylic acids of 3 to 6 carbon atoms, (d) from 0 to 25 mol % of one or more further olefinically unsaturated, copolymerizable organic compounds other than (a), (b) and (c), whose homopolymers are transparent within the wavelength region from 250 to 400 nm, with the proviso that the sum of the percentages mentioned under (a) to (d) is 100 and the copolymer has a silicon content of >6% by weight.
Claim 3
Dependent Claim
22 words
A copolymer as claimed in claim 1, wherein the radical Y in the general formula (I) is one of the radicals ##STR9##
Claim 4
Dependent Claim
25 words
A copolymer as claimed in claim 1, wherein, in the general formula (I), A is phenyl, X is methyl and Y is a ##STR10## group.
Claim 5
Dependent Claim
35 words
A copolymer as claimed in claim 1, wherein the parent carbinol to the o-nitrocarbinol ester group of the formula (I) is o-nitrobenzyl alcohol, nitro- 6-chlorobenzyl alcohol, 2-nitro-4-cyanobenzyl alcohol, α-methyl-o-nitrobenzyl alcohol, α-phenyl-o-nitrobenzyl alcohol or α-(o-nitrophenyl)-o-nitrobenzyl alcohol.
Claim 6
Dependent Claim
35 words
A copolymer as claimed in claim 1, wherein the o-nitrocarbinol ester of the general formula (I) is an ester of acrylic acid, of methacrylic acid, of maleic acid, of fumaric acid or of crotonic acid.
Claim 7
Dependent Claim
22 words
A copolymer as claimed in claim 1, wherein the copolymerizable olefinically unsaturated silicon-containing compound (b) is a derivative or styrene or α-methylstyrene.
Claim 8
Dependent Claim
17 words
A copolymer as claimed in claim 6, wherein the copolymerizable olefinically unsaturated silicon-containing compound (b) is 4-trimethylsilylstyrene.
Claim 9
Dependent Claim
23 words
A copolymer as claimed in claim 1, wherein the copolymerizable olefinically unsaturated silicon-containing compound (b) is a derivative of acrylic or methacrylic acid.
Claim 10
Dependent Claim
39 words
A copolymer as claimed in claim 8, wherein the copolymerizable olefinically unsaturated silicon-containing compound (b) comprises one or more silicon-containing monomers selected from the group consisting of trimethylsilyl methacrylate, trimethylsilylmethyl methacrylate, 3-methacryloyloxypropylbis(trimethylsiloxy)methylsilane , 3-methacryloyloxypropylpentamethyldisiloxane, 3-methacryloyloxypropyltris(trimethylsiloxy)silane, 3-methacryloyloxypropyltrimethoxysilane and 2-(trimethylsilyl)ethyl methacrylate.
Claim 11
Dependent Claim
19 words
A copolymer as claimed in claim 1, which contains as component (c) acrylic or methacrylic acid as copolymerized units.
Claim 12
Dependent Claim
35 words
A copolymer as claimed in claim 1, which contains as component (d) an ester of acrylic or methacrylic acid with a monoalkanol of 1 to 8 carbon atoms and/or a hydroxyalkyl (meth)acrylate as copolymerized units.
Claim 13
Dependent Claim
29 words
A process for preparing a copolymer as claimed in claim 1, which comprises polymerizing the compounds mentioned under (a) to (d) in the presence of a free radical initiator.
Claim 14
Dependent Claim
34 words
A process for producing a two-layer resist, which comprises using as the lower layer a polymer which is degradable in oxygen plasma and as the upper layer a copolymer as claimed in claim 1.
Claim 15
Dependent Claim
36 words
A process for producing a two-layer resist as claimed in claim 13, wherein the copolymer as claimed in claim 1 is structured and the pattern is transferred into the lower layer by means of a plasma.
Claim 16
Dependent Claim
15 words
A process as claimed in claim 14, wherein the plasma used is an oxygen plasma.
Claim 17
Dependent Claim
58 words
A process for fabricating a semiconductor device by applying a light-sensitive material to a substrate, subjecting said light-sensitive material to imagewise exposure, aqueous alkaline development and further development by means of a plasma, and completing fabrication of the semiconductor device in a conventional manner, which comprises using as the light-sensitive material a copolymer as claimed in claim 1.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-02-28 | 1992-08-29 | 1993-02-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-02-28 | 1996-08-29 | 1997-02-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-02-28 | 2000-08-29 | 2001-02-28 | $7700.00 | Window Closed / Lapsed |