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US4801993A Expired / Lapsed US ⏱️ 0.0 years remaining

Monolithic semiconductor structure of a heterojunction bipolar transistor and a laser

Assignee: Individual
•
Filing: 1987-02-04
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Granted: 1989-01-31
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Expires: 2007-02-04
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Abstract

Abstract This structure comprises a heterostructure formed from first, second and third stacked semiconductor layer, the first and third layers being of N-GaAlAs having a forbidden band width at least equal to that of the materials forming the second layer constituting the active layer of the structure, said second layer being formed from a super-lattice having thin layers of P-GaAs and thin layers of P-GaAlAs in alternating form and oriented parallel to the first and third layers, a N region extending at least from one face to the other of the third layer defining with the latter the PN junction of the laser and means for supplying the laser and transistor with current.

Inventors

  • 👤 David Ankri
  • 👤 Jean-Francois Palmier

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 05:36
CPC Classifications
H; H10; H10H; H10H29/00; H10H29/10; H01; H01S; H01S5/00; H01S5/02; H01S5/026; H01S5/0261; H01S5/06; H01S5/062; H01S5/06203

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 256 words
A monolithic semiconductor structure forming both a bipolar heterojunction transistor and a laser structure, comprising a heterostructure having a first, second and third semiconductor superimposed layers, the first and third layers constituting respectively the collector and the emitter of the transistor and being produced from a first and second III-V materials having a first type of conductivity and the second layer, which is placed between the first and third layers and constitutes the active layer of the laser structure and the base of the transistor, having a second conductivity type differing from the first type and being a super-lattice consisting of first series of GaAs parallel layers having an identical thickness and of a second series of parallel Ga 1-y Al y As layers with 0<y<1 having an identical thickness b satisfying the relation 1.2<b √w<1.9, in which w represents the difference of the conduction energies between GaAs and Ga 1-y Al y As, the layers of said first and second series alternating, the forbidden band widths of said first and second materials being at least equal to the one of Ga 1-y Al y As layers of said super-lattice which defines confinement zones of the carriers solely for the laser structure, oriented parallel to the first and third layers; a first region extending at least from one face to the other of the third layer and having the second conductivity type, said firsr region defining with the third layer the junction of the laser; and means for supplying current to the laser and the transistor.
Claim 2
Dependent Claim 256 words
A monolithic semiconductor structure forming both a bipolar heterojunction transistor and a laser structure, comprising a heterostructure having a first, second and third semiconductor superimposed layers, the first and third layers constituting respectively the collector and the emitter of the transistor and being produced from a first and second III-V materials having a first type of conductivity and the second layer, which is placed between the first and third layers and constitutes the active layer of the laser structure and the base of the transistor, having a second conductivity type differing from the first type and being a super-lattice consisting of first series of GaAs parallel layers having an identical thickness and of a second series of parallel Ga 1-y Al y As layers with 0<y<1 having an identical thickness b satisfying the relation 1.2<b √w<1.9, in which w represents the difference of the conduction energies between GaAs and Ga 1-y Al y As, the layers of said first and second series alternating, the forbidden band widths of said first and second materials being at least equal to the one of Ga 1-y Al y As layers of said super-lattice which defines confinement zones of the carriers solely for the laser structure, oriented parallel to the first and third layers; a first region extending at least from one face to the other of the third layer and having the second conductivity type, said firsr region defining with the third layer the junction of the laser; and means for supplying current to the laser and the transistor.
Claim 3
Dependent Claim 46 words
A semiconductor structure according to claim 1, wherein a second region extending at least from one face to the other of the third layer and having the second conductivity type is provided, said second region serving as an electric contact for the base of the transistor.
Claim 4
Dependent Claim 61 words
A semiconductor structure according to claim 1, wherein a fourth semiconductor layer is provided between the second and third layers and whose composition varies gradually, so that at the interface between the fourth and third layers it has the composition of the third layer and at the interface between the fourth and second layers the surface composition of the second layer.
Claim 5
Dependent Claim 62 words
A semiconductor structure according to claim 1, wherein a fifth semiconductor layer is inserted between the second and first layers and whose composition varies gradually, so that at the interface between the fifth and second layers it has the surface composition of the second layer and at the interface between the fifth and first layers the surface composition of the first layer.
Claim 6
Dependent Claim 47 words
A semiconductor structure according to claim 1, wherein the first layer is made of a type N Ga 1-x Al x As with 0≦x≦1, the third layer being made from type N Ga 1-t Al t As with 0≦t≦1, and the second material being of P type.
Claim 7
Dependent Claim 13 words
A semiconductor structure according to claim 1, wherein y satisfies the relation 0≦y≦0.45.
Claim 8
Dependent Claim 25 words
A semiconductor structure according to claim 1, wherein the second material contains a number of dopants of the second type larger than the first material.
Claim 9
Dependent Claim 28 words
A semiconductor structure according to claim 4, wherein the second region extends from the upper surface of the third layer to the lower surface of the fifth layer.
Claim 10
Dependent Claim 28 words
A semiconductor structure according to claim 3 wherein the first region extends from the upper surface of the third layer to the lower surface of the fourth layer.
Claim 11
Dependent Claim 55 words
A semiconductor structure according to claim 1, wherein a semiconductor substrate on which are epitaxied the semiconductor layers and a sixth semiconductor layer in contact with the third layer serving as an electric contact are provided, said sixth layer being produced from a material having a forbidden band width below that of the third material.

References Cited (Backward Citations)

US3982207A Cited
JPS58142574A Cited
EP0129477A1 Cited
EP0166593A2 Cited
DE3605130A1 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-01-31 1992-08-01 1993-01-31 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-01-31 1996-08-01 1997-01-31 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-01-31 2000-08-01 2001-01-31 $7700.00 Window Closed / Lapsed

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