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Patent US4786359A successfully refreshed from Google Patents.
US4786359A
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Xenon enhanced plasma etch
Assignee: Motorola Solutions Inc
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Filing: 1987-06-24
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Granted: 1988-11-22
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Expires: 2007-06-24
Abstract
Abstract A plasma etch process and apparatus is disclosed in which a gas mixture comprises CF 3 Br, xenon or krypton, and oxygen. The plasma reactor includes a sacrificial element, preferably in the form of a graphite ring, on the lower electrode of a parallel plate reactor.
Inventors
- 👤 Mark M. Stark
- 👤 Shu Nakajima
- 👤 Roger B. Lachenbruch
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 09:16
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/32431; H01J37/32532; H01J37/3255; H10; H10P; H10P50/00; H10P50/20; H10P50/24; H10P50/242; H01J2237/00; H01J2237/32; H01J2237/33; H01J2237/334; H01J2237/3343; H01J2237/3347
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
55 words
A process for etching a silicon wafer comprising the steps of: providing a gas mixture comprising CF 3 Br and xenon or krypton; contacting said wafer with a plasma formed from said mixture; and eroding a carbon bearing object with said plasma for at least a portion of the time said plasma contacts said wafer.
Claim 2
Dependent Claim
55 words
A process for etching a silicon wafer comprising the steps of: providing a gas mixture comprising CF 3 Br and xenon or krypton; contacting said wafer with a plasma formed from said mixture; and eroding a carbon bearing object with said plasma for at least a portion of the time said plasma contacts said wafer.
Claim 3
Dependent Claim
20 words
The process as set forth in claim 1 wherein said gas mixture is supplied at a pressure of 0.1-0.7 torr.
Claim 4
Dependent Claim
23 words
The process as set forth in claim 1 wherein said mixture comprises approximately equal flows of CF 3 Br and xenon or krypton.
Claim 5
Dependent Claim
14 words
The process as set forth in claim 1 wherein said mixture further comprises oxygen.
Claim 6
Dependent Claim
30 words
The process as set forth in claim 4 wherein the flow of oxygen is equal to or greater than the combined flows of CF 3 Br and xenon or krypton.
References Cited (Backward Citations)
JPS5812583A
Cited
JPS5856338A
Cited
US4375385A
Cited
US4547260A
Cited
US4592801A
Cited
US4468285A
Cited
JPS617632A
Cited
US4615764A
Cited
US4582581A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-11-22 | 1992-05-23 | 1992-11-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-11-22 | 1996-05-23 | 1996-11-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-11-22 | 2000-05-23 | 2000-11-22 | $7700.00 | Window Closed / Lapsed |