Patent US4783371A successfully refreshed from Google Patents.
US4783371A
Expired / Lapsed
US
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Photomask material
Assignee: Mitsubishi Electric Corp
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Filing: 1986-03-06
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Granted: 1988-11-08
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Expires: 2006-03-06
Abstract
Abstract A silicide film of oxidized transition metal 3 formed on a transparent substrate 1 has a low reflectance and in consequence, a high resolution can be obtained and dry etching thereof can be easily done. In addition, since said silicide film 3 has good adhesion to a transparent substrate 1, fine patterns therein do not peel off at the time of rinsing the mask.
Inventors
- 👤 Yaichiro Watakabe
- 👤 Shuichi Matsuda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 23:13
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/54; G03F1/50; Y; Y10; Y10S; Y10S148/00; Y10S148/019; Y10S148/147; Y10T; Y10T428/00; Y10T428/23907; Y10T428/2395
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
28 words
A photomask material suitable for use in manufacturing a semiconductor device, comprising: a transparent substrate; and a silicide film of oxidized transition metal formed on said transparent substrate.
Claim 2
Dependent Claim
28 words
A photomask material suitable for use in manufacturing a semiconductor device, comprising: a transparent substrate; and a silicide film of oxidized transition metal formed on said transparent substrate.
Claim 3
Dependent Claim
30 words
A photomask material as set forth in claim 1 wherein: said silicide film comprises an oxidized transition metal selected from a group including molybdenum (Mo), tantalum (Ta) and tungsten (W).
Claim 4
Dependent Claim
16 words
A phtotmask material as set forth in claim 1, wherein: said transparent substrate comprises quartz glass.
Claim 5
Dependent Claim
15 words
A photomask material as set forth in claim 1, wherein: said transparent substrate comprises sapphire.
Claim 6
Dependent Claim
16 words
A photomask material as set forth in claim 2, wherein: said transparent substrate comprises quartz glass.
Claim 7
Dependent Claim
15 words
A photomask material as set forth in claim 2, wherein: said transparent substrate comprises sapphire.
Claim 8
Dependent Claim
20 words
A photomask material according to claim 1, wherein: said silicide of an oxidized transition metal is a plasma sputtered film.
Claim 9
Dependent Claim
24 words
A photomask material according to claim 1, wherein: said silicide of an oxidized transition metal is a sputtered film deposited by an argon plasma.
Claim 10
Dependent Claim
36 words
A photomask material according to claim 1, wherein: said silicide of an oxidized transition metal is a sputtered film deposited by an argon-oxygen plasma containing Argon (Ar) and oxygen (O 2 ) in a predetermined ratio.
Claim 11
Dependent Claim
22 words
A photomask material according to claim 9, wherein: said ratio of Ar to O 2 is within the range 20:1 to 50:1.
Claim 12
Dependent Claim
68 words
A photomask material according to claim 9, wherein: said ratio of Ar to O 2 in said plasma is selected such that the deposited film of said silicide of an oxidized transition metal has a composition defined by MSi 2 O x , wherein x is in the range 0.1 to 1 and M represents a transition metal selected from a group that includes molybdenum, tantalum and tungsten.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-11-08 | 1992-05-09 | 1992-11-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-11-08 | 1996-05-09 | 1996-11-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-11-08 | 2000-05-09 | 2000-11-08 | $7700.00 | Window Closed / Lapsed |