EP0073136A1
Expired / Lapsed
EP
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Photomask material
Assignee: Konica Minolta Inc
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Filing: 1982-08-18
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Granted: —
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Expires: 2002-08-18
Abstract
Abstract There is disclosed a photomask material comprising a ' substrate, and at least one layer containing mixture of a metal oxide and a metal nitride or at least one metal nitride layer provided on the substrate, and the photomask material may comprise a substrate and a mask layer provided on the substrate, the mask layer consisting of a layer containing a lower metal oxide and/or a lower metal nitride, and a layer containing a mixture of a higher oxide and a higher nitride of the same metal or a higher metal nitride layer of the same metal. The photomask material of the present invention ex- hib i ts excellent resistance to the cleaning solutions and can be used repeatedly.
Inventors
- 👤 Takashi Hatano
- 👤 Akira Maruyama
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-07 23:15
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/54
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
33 words
A photomask material comprising a substrate, and at least one layer containing a mixture of a metal oxide and a metal nitride or at least one metal nitride layer provided on said layer.
Claim 2
Dependent Claim
33 words
A photomask material comprising a substrate, and at least one layer containing a mixture of a metal oxide and a metal nitride or at least one metal nitride layer provided on said layer.
Claim 3
Dependent Claim
23 words
A photomask material according to Claim 1, wherein the metal oxide has an element ratio of metal to oxygen between 99:1 and 30:70.
Claim 4
Dependent Claim
23 words
A photomask material according to Claim 1, wherein the metal nitride has an element ratio of metal to nitrogen between 99:1 and 30:70.
Claim 5
Dependent Claim
30 words
A photomask material according to any of Claims 1 to 3, wherein the metal is at least one selected from the group consisting of chromium, titanium, molybdenum, tantalum and tungsten.
Claim 6
Dependent Claim
12 words
A photomask material according to Claim 4, wherein said metal is chromium.
Claim 7
Dependent Claim
69 words
A photomask material according to Claim 1, wherein the photomask material comprises a substrate and a mask layer provided on said substrate, said mask layer consisting of a layer containing a lower metal oxide and/or a lower metal nitride, and a layer containing a mixture of a higher oxide and a higher nitride of the same metal or a layer containing a higher metal nitride of the same metal.
Claim 8
Dependent Claim
26 words
A photomask material according to Claim 6, wherein said lower metal oxide has an element ratio of metal to oxygen between 99:1 (inclusive) and 50:50 (exclusive).
Claim 9
Dependent Claim
26 words
A photomask material according to Claim 6, wherein said lower metal nitride has an element ratio of metal to nitrogen between 99:1 (inclusive) and 75:25 (exclusive).
Claim 10
Dependent Claim
26 words
A photomask material according to Claim 6, wherein said higher metal oxide has an element ratio of metal to oxygen between 50:50 and 30:70 (inclusive, respectively).
Claim 11
Dependent Claim
25 words
A photomask material according to Claim 6, wherein said higher nitride has an element ratio of metal to nitrogen between 75:25 and 30:70 (inclusive, respectively).
Claim 12
Dependent Claim
31 words
ll. A photomask material according to any of Claims 6 to 10, wherein the metal is at least one selected from the group consisting of chromium, titanium, molybdenum, tantalum and tungsten.
Claim 13
Dependent Claim
12 words
A photomask material according to Claim 11, wherein said metal is chromium.
References Cited (Backward Citations)
DE2024822B2
Cited
US3975003A
Cited
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