Patent US4781945A successfully refreshed from Google Patents.
US4781945A
Expired / Lapsed
US
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Process for the formation of phosphosilicate glass coating
Assignee: Fujitsu Ltd
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Filing: 1987-06-23
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Granted: 1988-11-01
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Expires: 2007-06-23
Abstract
Abstract A coating of phosphosilicate glass is deposited on a substrate by a chemical vapor deposition method, using a reaction gas consisting of monosilane, phosphine, and oxygen, in admixture with ammonia gas. According to this deposition process, the undesirable formation and adhesion of particulate by-products such as SiO 2 , P 2 O 5 , and H 2 SiO 3 to the substrate surface can be effectively prevented, and the step coverage can be improved.
Inventors
- 👤 Masahide Nishimura
- 👤 Kanetake Takasaki
- 👤 Kenji Koyama
- 👤 Atsuhiro Tsukune
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 22:26
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/69; H10P14/692; H10P14/6921; H10P14/6922; H10P14/6923; C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/40; C23C16/401; H10P14/66; H10P14/668; H10P14/6681; H10P14/6682; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
69 words
A process for formation of a coating of phosphosilicate glass on a substrate by a chemical vapor deposition method, in which a reaction gas consisting of monosilane, phosphine and oxygen is introduced into a reaction chamber in admixture with ammonia gas, said ammonia gas being present in the reaction gas in an amount sufficient to inhibit formation of particulate by-products but insufficient to interfere with the desired CVD reaction.
Claim 2
Dependent Claim
69 words
A process for formation of a coating of phosphosilicate glass on a substrate by a chemical vapor deposition method, in which a reaction gas consisting of monosilane, phosphine and oxygen is introduced into a reaction chamber in admixture with ammonia gas, said ammonia gas being present in the reaction gas in an amount sufficient to inhibit formation of particulate by-products but insufficient to interfere with the desired CVD reaction.
Claim 3
Dependent Claim
22 words
A process according to claim 1, in which the reaction gas-providing gases are introduced separately or in combination into the reaction chamber.
Claim 4
Dependent Claim
32 words
A process according to claim 1 or 2, in which a volume ratio of ammonia gas to monosilane gas in the reaction gas is within the range of from 0.1 to 100.
Claim 5
Dependent Claim
26 words
A process according to of claim 1 in which the chemical vapor deposition reactions are carried out at a temperature of from 300 to 450° C.
Claim 6
Dependent Claim
15 words
A process according to claim 1 which is used in the production of semiconductor devices.
Claim 7
Dependent Claim
25 words
A process according to claim 2, in which the chemical vapor deposition reactions are carried out at a temperature of from 300 to 450° C.
Claim 8
Dependent Claim
25 words
A process according to claim 3, in hich the chemical vapor deposition reactions are carried out at a temperature of from 300 to 450° C.
Claim 9
Dependent Claim
15 words
A process according to claim 2 which is used in the production of semiconductor devices.
Claim 10
Dependent Claim
15 words
A process according to claim 3 which is used in the production of semiconductor devices.
Claim 11
Dependent Claim
15 words
A process according to claim 4 which is used in the production of semiconductor devices.
Claim 12
Dependent Claim
15 words
A process according to claim 6 which is used in the production of semiconductor devices.
Claim 13
Dependent Claim
15 words
A process according to claim 7 which is used in the production of semiconductor devices.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-11-01 | 1992-05-02 | 1992-11-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-11-01 | 1996-05-02 | 1996-11-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-11-01 | 2000-05-02 | 2000-11-01 | $7700.00 | Window Closed / Lapsed |