US4775203A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Optical scattering free metal oxide films and methods of making the same
Assignee: General Electric Co
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Filing: 1987-02-13
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Granted: 1988-10-04
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Expires: 2007-02-13
Abstract
Abstract Optically non-scattering films of titanium dioxide for use in optical elements are prepared by overcoating a non-scattering layer of titanium dioxide with an amorphous layer of silicon dioxide at a temperature which is below the crystallization temperature of the non-scattering film of titanium dioxide. Titanium dioxide and silicon dioxide layers can be deposited by a fusion chemical vapor deposition technique by pyrolytic decomposition of suitable precursors containing the necessary constituents of the respective film layers.
Inventors
- 👤 Himanshu B. Vakil
- 👤 John F. Ackerman
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 17:12
CPC Classifications
G; G02; G02B; G02B1/00; G02B1/10; C; C03; C03C; C03C17/00; C03C17/34; C03C17/3411; C03C17/3417; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/40; C23C16/401; C23C16/402; Y; Y10; Y10T; Y10T428/00; Y10T428/12; Y10T428/12493; Y10T428/12535; Y10T428/12542; Y10T428/12549
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
68 words
A method for preventing optical scattering resulting from crystallization of a thin film of titanium dioxide which comprises chemical vapor deposition of non-scattering titanium dioxide film by pyrolytic decomposition of a member selected from the group consisting of titanium tetraethoxide and titanium isopropoxide and overcoating the titanium dioxide film with a layer of amorphous silicon dioxide at a temperature below the crystallization temperature of the titanium dioxide film.
Claim 2
Independent Claim
68 words
A method for preventing optical scattering resulting from crystallization of a thin film of titanium dioxide which comprises chemical vapor deposition of non-scattering titanium dioxide film by pyrolytic decomposition of a member selected from the group consisting of titanium tetraethoxide and titanium isopropoxide and overcoating the titanium dioxide film with a layer of amorphous silicon dioxide at a temperature below the crystallization temperature of the titanium dioxide film.
Claim 3
Dependent Claim
19 words
The process of claim 1 wherein the amorphous silicon dioxide is deposited at a temperature below about 600° C.
Claim 4
Dependent Claim
12 words
The process of claim 1 which comprises pyrolytic decomposition of titanium tetraethoxide.
Claim 5
Dependent Claim
12 words
The process of claim 1 which comprises pyrolytic decomposition of titanium isopropoxide.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-10-04 | 1992-04-04 | 1992-10-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-10-04 | 1996-04-04 | 1996-10-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-10-04 | 2000-04-04 | 2000-10-04 | $7700.00 | Window Closed / Lapsed |