US4431708A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Annealed CVD molybdenum thin film surface
Assignee: United States Department of Energy
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Filing: 1979-12-19
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Granted: 1984-02-14
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Expires: 1999-12-19
Abstract
Abstract Molybdenum thin films deposited by pyrolytic decomposition of Mo(CO)6 attain, after anneal in a reducing atmosphere at temperatures greater than 700 DEG C., infrared reflectance values greater than reflectance of supersmooth bulk molybdenum. Black molybdenum films deposited under oxidizing conditions and annealed, when covered with an anti-reflecting coating, approach the ideal solar collector characteristic of visible light absorber and infrared energy reflector.
Inventors
- 👤 Gary E. Carver
- 👤 Bernhard O. Seraphin
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 04:20
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/56; F; F24; F24S; F24S70/00; F24S70/20; F24S70/225; F24S70/25; F24S70/30; Y; Y02; Y02E; Y02E10/00; Y02E10/40; Y10; Y10T; Y10T428/00; Y10T428/12; Y10T428/12493; Y10T428/12535; Y10T428/12576; Y10T428/12674; Y10T428/12771; Y10T428/12806; Y10T428/12826
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
91 words
A process for the manufacture of a highly reflective surface, comprising: (a) fabricating on a substrate a thin adherent film by chemical vapor deposition of Mo(CO) 6 at about atmospheric pressure of an inert carrier gas, said film showing a face centered cubic-MoOC structure under X-ray diffraction; (b) annealing said film in an atmosphere substantially devoid of oxygen at a temperature of at least 700° C. for a duration of at least 3 minutes; and (c) fabricating over said annealed film by chemical vapor deposition a layer of solar absorbing silicon.
Claim 2
Dependent Claim
91 words
A process for the manufacture of a highly reflective surface, comprising: (a) fabricating on a substrate a thin adherent film by chemical vapor deposition of Mo(CO) 6 at about atmospheric pressure of an inert carrier gas, said film showing a face centered cubic-MoOC structure under X-ray diffraction; (b) annealing said film in an atmosphere substantially devoid of oxygen at a temperature of at least 700° C. for a duration of at least 3 minutes; and (c) fabricating over said annealed film by chemical vapor deposition a layer of solar absorbing silicon.
Claim 3
Dependent Claim
17 words
The process of claim 1 wherein said film is fabricated at a temperature greater than 150° C.
Claim 4
Dependent Claim
13 words
The process of claim 1 wherein said annealing atmosphere consists of flowing helium.
Claim 5
Dependent Claim
17 words
The process of claim 1 where said film is annealed at a temperature greater than 750° C.
Claim 6
Dependent Claim
19 words
The process of claim 4 wherein said film is annealed at a temperature of 1000° C. for 15 minutes.
Claim 7
Dependent Claim
22 words
The process of claim 1 including passivating said annealed film with a layer of oxidation preventing sealing material before said film oxidizes.
Claim 8
Dependent Claim
23 words
The process of claim 1 including fabricating over said silicon by chemical vapor deposition an anti-reflecting layer of Si 3 N 4 .
Claim 9
Dependent Claim
11 words
A reflective surface manufactured according to the process of claim 1.
Claim 10
Dependent Claim
11 words
A laser reflector manufactured according to the process of claim 1.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-02-13 | 1987-08-15 | 1988-02-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-02-13 | 1991-08-15 | 1992-02-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-02-13 | 1995-08-15 | 1996-02-14 | $7700.00 | Window Closed / Lapsed |