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Patent US4764026A successfully refreshed from Google Patents.
US4764026A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Semiconductor wafer temperature measuring device and method
Assignee: Varian Medical Systems Inc
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Filing: 1986-07-07
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Granted: 1988-08-16
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Expires: 2006-07-07
Abstract
Abstract A probe having four spring-loaded tips contacts the backside of a semiconductor wafer in a processing machine. A current is induced across the outer tips and a voltage proportional to the sheet resistance of the wafer is measured across the inner tips. Wafer thickness is used to convert sheet resistance to bulk resistivity. Data on resistivity as a function of temperature is used to determine wafer temperature.
Inventors
- 👤 Ronald A. Powell
- 👤 Susan B. Felch
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 14:56
CPC Classifications
G; G01; G01R; G01R31/00; G01R31/28; G01R31/282; G01R31/2831; G01K; G01K13/00; G01K7/00; G01K7/16; G01K7/22
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
104 words
Apparatus for measuring an elevated temperature of a semiconductor wafer in situ in a wafer processing machine comprising: measurement means for measuring a sheet resistance of the wafer at temperatures in excess of a temperature corresponding to a maximum resistivity on a curve of resistivity versus temperature; computer means for storing a measurement of a wafer thickness for said wafer; data processing means for storing information from said measurement means in said computer means; and said computer means including means for calculating resistivity from the sheet resistance and the wafer thickness, said computer means including means for computing said elevated temperature from the resistivity.
Claim 2
Dependent Claim
104 words
Apparatus for measuring an elevated temperature of a semiconductor wafer in situ in a wafer processing machine comprising: measurement means for measuring a sheet resistance of the wafer at temperatures in excess of a temperature corresponding to a maximum resistivity on a curve of resistivity versus temperature; computer means for storing a measurement of a wafer thickness for said wafer; data processing means for storing information from said measurement means in said computer means; and said computer means including means for calculating resistivity from the sheet resistance and the wafer thickness, said computer means including means for computing said elevated temperature from the resistivity.
Claim 3
Dependent Claim
23 words
The apparatus of claim 1 in which said measurement means include a four-point probe means for measuring the sheet resistance having four points.
Claim 4
Dependent Claim
16 words
The apparatus of claim 2 in which said four-point probe means includes tips of refractory metal.
Claim 5
Dependent Claim
17 words
The apparatus of claim 3 in which said four-point probe means contacts a back of the wafer.
Claim 6
Dependent Claim
23 words
The apparatus of claim 4 in which the four points of said four-point probe means are arranged evenly spaced in a linear array.
Claim 7
Independent Claim
79 words
A method of measuring an elevated temperature of a semiconductor wafer in situ in a wafer processing machine comprising the steps of: measuring a thickness of the wafer; measuring a sheet resistance of the wafer at temperatures in excess of a temperature corresponding to a maximum resistivity on a curve of resistivity versus temperature; calculating a resistivity of the wafer from the sheet resistance and the wafer thickness; and calculating said elevated temperature of the wafer from the resistivity.
Claim 8
Independent Claim
79 words
A method of measuring an elevated temperature of a semiconductor wafer in situ in a wafer processing machine comprising the steps of: measuring a thickness of the wafer; measuring a sheet resistance of the wafer at temperatures in excess of a temperature corresponding to a maximum resistivity on a curve of resistivity versus temperature; calculating a resistivity of the wafer from the sheet resistance and the wafer thickness; and calculating said elevated temperature of the wafer from the resistivity.
Claim 9
Dependent Claim
20 words
The method of claim 6 wherein the step of measuring sheet resistance is made at the back of the wafer.
Claim 10
Dependent Claim
18 words
The method of claim 7 wherein the step of measuring sheet resistance is made with a four-point probe.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-08-16 | 1992-02-15 | 1992-08-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-08-16 | 1996-02-15 | 1996-08-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-08-16 | 2000-02-15 | 2000-08-16 | $7700.00 | Window Closed / Lapsed |