Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
301 words
A thyristor comprising, a semiconductor body having an n-emitter layer which is contacted by a cathode electrode, a p-base layer adjacent said n-emitter layer, an n-base layer adjacent said p-base layer, a p-emitter layer adjacent said n-base layer, an anode electrode in electrical contact with said p-emitter region, a biasing voltage connected between said cathode and anode electrode, said base layers separated from one another by pn-junctions, at least one first MIS structure serving as a controllable emitter-base short located at the edge of said n-emitter layer, said MIS structure comprising a p-conductive semiconductor region which is inserted into said n-emitter layer, a sub-region of said p-base layer, and said p-conductive semiconductor region formed with a first channel region lying therebetween and formed of an edgeside zone of said n-emitter layer, a first gate over said first channel region and separated from the boundary surface of the semiconductor body by a first insulating layer, said first gate (15) also covers said sub-region (12) of the p-base layer (2) and is insulated therefrom, a first voltage generator (23) connected between said cathode electrode (6) and said first gate (15), said first voltage generator generating a voltage which alternates between first and second voltage values, and said first voltage value lies below the threshold voltage of said first channel region (13); and said second voltage value is close to or exceeds the threshold turn on voltage of said sub-region (12) of said p-base layer and ignition of the thyristor occurs when the change from said first to said second voltage value occurs and the quenching of said thyrister occurs when the change from said second to said first voltage value occurs and the threshold voltage of the sub-region (12) of the p-base layer exceeds the threshold voltage of the first channel region (13).
Claim 2
Dependent Claim
301 words
A thyristor comprising, a semiconductor body having an n-emitter layer which is contacted by a cathode electrode, a p-base layer adjacent said n-emitter layer, an n-base layer adjacent said p-base layer, a p-emitter layer adjacent said n-base layer, an anode electrode in electrical contact with said p-emitter region, a biasing voltage connected between said cathode and anode electrode, said base layers separated from one another by pn-junctions, at least one first MIS structure serving as a controllable emitter-base short located at the edge of said n-emitter layer, said MIS structure comprising a p-conductive semiconductor region which is inserted into said n-emitter layer, a sub-region of said p-base layer, and said p-conductive semiconductor region formed with a first channel region lying therebetween and formed of an edgeside zone of said n-emitter layer, a first gate over said first channel region and separated from the boundary surface of the semiconductor body by a first insulating layer, said first gate (15) also covers said sub-region (12) of the p-base layer (2) and is insulated therefrom, a first voltage generator (23) connected between said cathode electrode (6) and said first gate (15), said first voltage generator generating a voltage which alternates between first and second voltage values, and said first voltage value lies below the threshold voltage of said first channel region (13); and said second voltage value is close to or exceeds the threshold turn on voltage of said sub-region (12) of said p-base layer and ignition of the thyristor occurs when the change from said first to said second voltage value occurs and the quenching of said thyrister occurs when the change from said second to said first voltage value occurs and the threshold voltage of the sub-region (12) of the p-base layer exceeds the threshold voltage of the first channel region (13).
Claim 3
Dependent Claim
248 words
A thyristor comprising a semiconductor body having an n-emitter layer which is contacted by a cathode electrode and having an adjacent p-base layer which has an adjacent n-base layer which has an adjacent p-emitter layer which is contacted by an anode electrode whereby the base layers are separated from one another by pn-junctions and at least one second MIS structure serving as a controllable emitter-base short provided at the edge of said p-emitter layer, said second MIS structure comprising an n-conductive semiconductor region which is inserted into said p-emitter layer, a subregion of said n-base layer and an intervening second channel region formed of an edge-side zone of said p-emitter layer, said second channel region covered by a second gate which is separated from the boundary surface of the semiconductor body by a second insulating layer, said second gate also covers the sub-region of said n-base layer and is insulated therefrom, a second voltage generator connected between the anode electrode and said second gate, said second voltage generator generating a voltage which alternates between third and fourth voltage values, said third voltage value lies above the threshold turn on voltage of the second channel region; said fourth voltage value is close to or exceeds the threshold turn on voltage of the sub-region of the n-base layer; and ignition of the thyristor occurs when the change from the third to the fourth voltage value occurs and quenching occurs when change from the fourth to the third voltage value occurs.
Claim 4
Dependent Claim
248 words
A thyristor comprising a semiconductor body having an n-emitter layer which is contacted by a cathode electrode and having an adjacent p-base layer which has an adjacent n-base layer which has an adjacent p-emitter layer which is contacted by an anode electrode whereby the base layers are separated from one another by pn-junctions and at least one second MIS structure serving as a controllable emitter-base short provided at the edge of said p-emitter layer, said second MIS structure comprising an n-conductive semiconductor region which is inserted into said p-emitter layer, a subregion of said n-base layer and an intervening second channel region formed of an edge-side zone of said p-emitter layer, said second channel region covered by a second gate which is separated from the boundary surface of the semiconductor body by a second insulating layer, said second gate also covers the sub-region of said n-base layer and is insulated therefrom, a second voltage generator connected between the anode electrode and said second gate, said second voltage generator generating a voltage which alternates between third and fourth voltage values, said third voltage value lies above the threshold turn on voltage of the second channel region; said fourth voltage value is close to or exceeds the threshold turn on voltage of the sub-region of the n-base layer; and ignition of the thyristor occurs when the change from the third to the fourth voltage value occurs and quenching occurs when change from the fourth to the third voltage value occurs.
Claim 5
Dependent Claim
74 words
A thyristor according to claim 1 or 2, characterized in that one of the emitter layers is composed of a plurality of emitter zones (1', 1", 1"') which are provided with respectively allocated parts (6', 6", 6"') of the electrode contacting the emitter layer, and these parts are electrically connected to one another and a plurality of MIS structures serving as controllable emitter-base shorts are respectively provided at the edges of the emitter zones.
Claim 6
Dependent Claim
29 words
A thyristor according to claim 3, characterized in that the emitter zones (1', 1", 1"') are elongated and extend generally parallel to one another over the entire thyristor surface.
Claim 7
Dependent Claim
37 words
A thyristor according to claim 3, characterized in that the emitter zones (1", 1"') are formed of circular rings and are arranged concentrically relative to one another and relative to the innermost, circularly fashioned emitter zone (1').
Claim 8
Dependent Claim
57 words
A thyristor according to claim 1, characterized in that the p-base layer (2) under the gates (15, 21) is more highly doped proceeding from the surface (11) of the semiconductor body down to a penetration depth which roughly corresponds to that of the n-emitter layer (1), and is more highly doped therein than in its remaining parts.
Claim 9
Dependent Claim
55 words
A thyristor according to claim 2 characterized in that the n-base layer in the region of the gates is more highly doped proceeding from the surface of the semiconductor body down to a penetration depth which roughly corresponds to that of the p-emitter layer, and is more highly doped therein than in its remaining parts.